J. Chem. Phys., Vol. 111, No. 17, 1 November 1999
Spectroscopy of oligomeric SiO species
7887
E. Energetic and kinetic relations within the
oligomerization process
more ionic bonding in the heterocubanelike Ge4O4 seems
plausible. However, the final aim of our investigations to
gain knowledge about the so far unknown structure of solid
SiO ͑Ref. 22͒ cannot be reached with matrix isolation spec-
troscopy, because it is impossible to make definite conclu-
sions on the basis of the structure of the obtainable small SiO
oligomeres. Furthermore there is another serious problem:
Though the D2d-symmetric Si4O4 molecule shows a certain
similarity to violet phosphorus—like in all types of phos-
phorus only threefold coordinated P-atoms are present—it
can be assumed that in solid SiO the Si-atoms are fourfold
and the O-atoms are twofold coordinated. This means, that
Si–Si bonding will be necessary and therefore no analogies
to simple AB lattice structures can be expected.
The oligomerization energies for the different SiO spe-
cies have been calculated with DFT methods. Since the con-
centration of monomeric SiO is high in the beginning of the
condensation process the energetic situation for the follow-
ing reactions shall be considered:
SiOϩSiO→Si2O2 ⌬EϭϪ201 kJ/mol,
SiOϩSi2O2→Si3O3 ⌬EϭϪ241 kJ/mol,
SiOϩSi3O3→Si4O4 ⌬EϭϪ166 kJ/mol.
From these values it is reasonable to assume that the concen-
tration of Si3O3 should be high, while that of Si2O2 should be
much lower and that of Si4O4 should represent a minimum.
However, it is important to mention that the observed con-
centrations do not represent the situation of a thermodynami-
cal equilibrium. As under the conditions of matrix isolation
the thermodynamic equilibrium is not reached, the formation
of the dimer should represent the final step, because the sub-
sequent formation of a rigid matrix will prevent a further
diffusion process of SiO. However, during deposition a fluid
like state exists in which SiO can diffuse and oligomerize to
form Si2O2 and eventually Si3O3, since the matrix becomes
smooth for a short time around the area of the high exother-
mic oligomerization process. After the reaction to Si3O3 the
pathway for the continuously condensed high temperature
molecule SiO is long and therefore the probability for the
formation of Si4O4 is drastically reduced. Its concentration
could only be increased by a higher deposition temperature.
Therefore the chances for the formation of larger oligomeres
than Si4O4 are slim. For these larger species matrix isolation
technique seems not to be a suitable preparation method.
ACKNOWLEDGMENTS
This work was supported by the Deutsche Forschungs-
gemeinschaft and in part by the Fonds der Chemischen In-
dustrie. We thank R. Ahlrichs for helpful discussions.
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