2
H. Xu et al. / Polymer xxx (2014) 1e5
2. Experimental
Current densityevoltage (JeV) characteristics were measured
with a DC voltage and current source/monitor (Advantest R6243) in
the dark and under AM1.5G simulated solar illumination at
100 mW cmꢀ2. The light intensity was corrected with a calibrated
silicon photodiode reference cell (Bunkoh-Keiki BS-520). The
external quantum efficiency (EQE) spectra were measured with a
digital electrometer (Advantest R8252) under monochromatic light
illumination from a 500 W xenon lamp (Thermo Oriel Model
66921) with optical cut filters and a monochromator (Thermo Oriel
Cornerstone). The illumination was carried out from the ITO side in
an N2 atmosphere at room temperature. At least 10 devices were
measured to ensure the reproducibility of the device performance.
2.1. Materials
Silicon naphthalocyanine bis(tri-n-hexylsilyl oxide) (SiNc6;
Aldrich) was employed without further purification. Silicon naph-
thalocyanine bis(n-decyldimethylsilyl oxide) (SiNc10) was synthe-
sized as follows. A mixture of silicon naphthalocyanine dihydroxide
SiNc(OH)2 (100 mg), n-decyldimethyl chlorosilane (142 mL), and dry
pyridine (10 mL) was refluxed for 6 h. After the solution obtained
had been allowed to cool, the solvent was evaporated and chloro-
form was added to the residue. The solution was washed with
saturated NaCl solution, and then dried over MgSO4. After the
evaporation of the solvent, the residue was purified by silica gel
column chromatography (toluene/hexane ¼ 1/1 (v/v) as eluent) to
3. Results and discussion
afford SiNc[OSi(CH3)2(n-C10H21)]2 (78 mg) as
(yield ¼ 51%).
a
green solid
The HOMO level was evaluated by the photoelectron yield
spectroscopy measurements of P3HT, N2200, SiNc6, and SiNc10
neat films. From the threshold energy in the cubic root of the
photoelectron yield plotted against the incident photon energy (see
the Supplementary Material), the ionization energy was estimated
to be 4.7 eV (P3HT), 5.9 eV (N2200), 5.5 eV (SiNc6), and 5.5 eV
(SiNc10). The LUMO level was evaluated from the optical bandgap
and the HOMO level. From the absorption spectrum and the pho-
toluminescence (PL) spectra of P3HT, SiNc6, SiNc10, and N2200
neat films (see the Supplementary Material), the optical bandgap
was estimated to be 2 eV (P3HT), 1.6 eV (N2200), 1.5 eV (SiNc6), and
1.5 eV (SiNc10). Therefore, the LUMO level was evaluated to be
2.7 eV (P3HT), 4.3 eV (N2200), 4.0 eV (SiNc6), and 4.0 eV (SiNc10).
As shown in Fig. 1, ternary blends of P3HT, N2200, and SiNc dyes
exhibit cascaded energy structures both in the HOMO and LUMO
levels when dye molecules are located at the donor/acceptor
interface of P3HT and N2200. The offset energy is more than 0.3 eV
both in HOMOeHOMO and LUMOeLUMO gap, which would be
large enough for efficient charge generation at the interface. This
energetic condition is an absolute requirement for efficient dye
sensitization in a longer wavelength region. Indeed, we reported
dye sensitization in P3HT/N2200/SiNc6 ternary solar cells previ-
ously [22]. As shown in the figure, SiNc10 has the same optoelec-
tronic properties as SiNc6 and therefore equivalent potential for
dye sensitization of P3HT/N2200 blend solar cells if blend
morphology is the same as well.
ꢀ
ꢁ
UVꢀvisibleðtolueneÞ:lmax ¼ 773nm ε ¼ 5:8ꢁ105 Mꢀ1 cmꢀ1
:
1H NMR (400 MHz, CDC13):
d
¼ 10.06 (s, 5,36-Nc, 8H), 8.59 (m,
1,4-Nc, 8H), 7.85 (m, 1,4-Nc, 8H),1.20 (m, 9-CH2, 4H),1.05 (m, 8-CH2,
4H), 0.95 (m, 7-CH2, 4H), 0.85 (t, 10-CH3, 6H), 0.65 (m, 6-CH2, 4H),
0.50 (m, 5-CH2, 4H), 0.15 (m, 4-CH2, 4H), ꢀ0.15 (m, 3-CH2,
4H), ꢀ1.10 (m, 2-CH2, 4H), ꢀ1.95 (m, 1-CH2, 4H), ꢀ2.60 (s, SiCH3,
12H).
2.2. Sample fabrication
The quartz, glass, or ITO-coated substrates were cleaned by
ultrasonication in toluene, acetone, and ethanol each for 15 min,
dried with N2, and cleaned with a UVeO3 cleaner for 30 min. For
photoluminescence (PL) quenching measurements, sample films
were spincoated on the cleaned quartz substrate. For photovoltaic
measurements,
poly
(3,4-ethylenedioxythiophene):poly(4-
styrenesulfonate) (PEDOT:PSS; H.C. Starck PH500) was spincoated
onto the cleaned ITO substrate at 3000 rpm and baked at 140 ꢂC for
10 min in air. Subsequently, a ternary blend film was spincoated
from a p-xylene solution of poly(3-hexylthiophene) (P3HT; Plex-
tronics Plexcore OS2100), poly{[N,N0-bis(2-octyldodecyl)-naph-
thalene-1,4,5,8-bis(dicarboximide)-2,6-diyl]-alt-5,50-(2,20-bithio-
phene)} (N2200; Polyera), and SiNc dyes (SiNc6 or SiNc10) onto the
PEDOT:PSS-coated ITO substrate. The thickness of each layer was
w40 nm (PEDOT:PSS) and w110 nm (the ternary blend active
layer). The ternary blend film was annealed at 140 ꢂC for 10 min in
an N2-filled glove box. Finally, a metal electrode of Ca/Al layer (15/
80 nm) was deposited on top of the active layer in sequence at
2.5 ꢁ 10ꢀ4 Pa. The effective device area was 0.07 cm2.
Fig. 2a and b show JeV characteristics of ternary blend solar cells
incorporating SiNc6 or SiNc10 with various dye loading
2.3. Measurements
The ionization potential of P3HT, N2200, SiNc6, and SiNc10 was
measured with a photoelectron yield spectrometer (Riken Keiki,
AC-3). All the neat films (ca. 60 nm) were fabricated by spin-coating
from a chlorobenzene solution on PEDOT:PSS-coated ITO sub-
strates. The threshold energy for the photoelectron emission was
estimated on the basis of the cubic root of the photoelectron yield
plotted against the incident photon energy (see the Supplementary
Material) as reported previously [23,24].
Absorption and PL spectra of the neat and blend films were
measured at room temperature with a spectrophotometer (Hitachi
UV-3500) and a fluorescence spectrophotometer (Hitachi F-4500),
respectively.
Fig. 1. Chemical structures and energy diagram of materials employed in this study:
P3HT, SiNc6, SiNc10, and N2200 from left to right. The figures represent the HOMO
(lower) and LUMO (upper) energy in electron volts.
j.polymer.2014.04.045