Journal of Organic Chemistry p. 552 - 558 (1981)
Update date:2022-08-02
Topics:
White, Emil H.
Lewis, Charles P.
Ribi, Max A.
Ryan, Thomas J.
The thermal decomposition of several N-alkyl-N-nitroso-4-toluenesulfonamides, N-alkyl-N-nitro-4-toluenesulfonamides, and N-alkyl-N'-(4-toluenesulfonyloxy)diimide N-oxides was undertaken to determine whether the basicity of the negatively charged counterion in deamination reactions was a reaction variable.The nitrososulfonamides decompose following first-order kinetics to give the corresponding esters with retention of configuration.The reaction characteristics are very similar to those of the N-nitrosocarboxamides, and the reaction mechanisms are presumably very similar also.The N-nitrosulfonamides required high temperatures for decomposition, and they gave an anomalous set of products: amide (by denitration) and olefins, but no nitrous oxide or toluenesulfonate esters.The N'-toluenesulfonoxydiimide N-oxides, isomeric to the nitrosulfonamides, proved to be surprisingly stable compounds; they decompose by first-order kinetics to yield the corresponding esters and nitrous oxide.
View MoreContact:+86-532-80762375
Address:No. 6, Hongkong Middle Road, Qingdao, China
Contact:0572-2722882
Address:1201,F3,xinghuibandao,
Contact:+86-21-56338808
Address:799 Dunhuang Road, Putuo
Jinan Trio PharmaTech Co., Ltd
Contact:86-531-88811783;+(0)13153010282
Address:2766 Yingxiu Road, Jinan High-Tech Zone, China
website:http://www.shengmaochem.com
Contact:86-27-82853423, 82819281
Address:Rm 202, A Unit Huaqiao Building No. 2, Lihuangpi Road, Wuhan, China
Doi:10.1016/0040-4020(94)01057-7
(1995)Doi:10.1021/jo01301a018
(1980)Doi:10.1039/C19680000154
(1968)Doi:10.1021/ja064601n
(2007)Doi:10.1039/f19848000359
(1984)Doi:10.1002/1522-2675(20001004)83:10<2738::AID-HLCA2738>3.0.CO;2-A
(2000)