Page 7 of 9
Dalton Transactions
DOI: 10.1039/C8DT01625A
selenide nanoparticles. The mild conditions required to get these
narrowꢀband gap semiconducting Cu2ꢀxSe NPs offered an easy
synthesis of n%Cu2ꢀxSeꢀTiO2 nanocomposites with different
Cu/Ti ratios, among which n = 0.1 and 0.3 mol% showed
improved photocatalysis in comparison to the commercial
13 L. Zhu, Y. Zhao, W. Zheng, N. Ba, G. Zhang, J. Zhang, X. Li, H.
Xiea and L. Bie, CrystEngComm, 2016, 18, 5202ꢀ5208.
14 S. Q. Lie, D. M. Wang, M. X. Gaoa and C. Z. Huang, Nanoscale,
6
7
7
8
8
9
9
5
0
5
0
5
0
5
2
014, 6, 10289–10296.
1
1
1
5 G. Tian, T. Zhao, J. Niu, H. Shen and L. S. Lia, RSC Adv., 2014, 4,
39547–39551.
6 W. Wang, L. Zhang, G. Chen, J. Jiang, T. Ding, J. Zuoa and Q. Yang,
CrystEngComm, 2015, 17, 1975–1981.
5
available TiO (P25) for the formic acid degradation under UV
2
irradiation. Additional studies are currently underway to optimize
the synthetic and experimental conditions to improve further the
photocatalytic activity of these nanocomposites.
7
(a) S. Mishra and S. Daniele, Chem. Rev., 2015, 115, 8379ꢀ8448; (b)
K. Soussi, S. Mishra, E. Jeanneau, J.ꢀM. M. Millet and S. Daniele,
Dalton Trans., 2017, 46, 13055–13064 ; (c) S. Mishra, E. Jeanneau,
M. Rolland and S. Daniele, RSC Adv., 2016, 6, 1738ꢀ1743; (d) S.
Mishra, E. Jeanneau, S. Mangematin, H. Chermette, M. Poor Kalhor,
G. Bonnefont, G. Fantozzi, S. Le Floch, S. Pailhes and S. Daniele,
Dalton Trans., 2015, 44, 6848ꢀ6862; (e) S. Mishra, V. Mendez, E.
Jeanneau, V. Caps and S. Daniele, Eur. J. Inorg. Chem., 2013, 500ꢀ
510; (f) S. Mishra, E. Jeanneau, M.ꢀH. Berger, J.ꢀF. Hochepied and S.
Daniele, Inorg. Chem., 2010, 49, 11184ꢀ11189; (g) S. Mishra, E.
Jeanneau, S. Daniele and V. Mendez, Dalton Trans., 2010, 39, 7440ꢀ
7443.
1
0
Conflicts of interest
There are no conflicts of interest to declare.
Acknowledgements
SG thanks the French ministry of higher education, research and
innovation for her PhD grant (doctoral school of chemistry,
Lyon). Authors also thank M. Aouine and L. Burel (electron
microscopic measurements), Dr. L. Cardenas (XPS), Y. Aizac
1
5
1
1
8
9
(a) H. Lu and R. L. Brutchey, Chem. Mater., 2017, 29, 1396−1403;
(b) S. Gupta, H. Joshi, N. Jain and A. K. Singh, J. Mol. Catal. A:
Chem., 2016, 423, 135–142; (c) R. K. Sharma, G. Kedarnath, V. K.
Jain, A. Wadawale, C. G. S. Pillai, M. Nalliath and B. Vishwanadh,
Dalton Trans., 2011, 40, 9194–9201; (d) M. Afzaal, M. A. Malik and
P. O’Brien, J. Mater. Chem., 2010, 20, 4031–4040.
(a) Y.ꢀP. Chang, A. L. Hector, W. Levason, G. Reid and J. Whittam,
Dalton Trans., 2018, 47, 2406ꢀ2414: (b) C. Gurnani, S. L. Hawken,
A. L. Hector, R. Huang, M. Jura, W. Levason, J. Perkins, G. Reid and
G. B. G. Stenning, Dalton Trans., 2018, 47, 2628ꢀ2637; (c) Y.ꢀP.
Chang, A. L. Hector, W. Levason and G. Reid, Dalton Trans., 2017,
46, 9824ꢀ9832; (d) K. George, C. H. de Groot, C. Gurnani, A. L.
Hector, R. Huang, M. Jura, W. Levason and G. Reid, Chem. Mater.,
(PXRD) and P. Mascunan (BET measurements) of IRCELYON.
We are grateful to Prof. S. Daniele for his constant
encouragement.
2
0
Notes and references
a
Univ Lyon, Université Claude Bernard Lyon 1, CNRS, IRCELYON-
UMR 5256, 2 avenue Albert Einstein, 69626 Villeurbanne, France
b
Univ Lyon, Université Claude Bernard Lyon 1, Centre de
2
3
3
4
4
5
5
6
5
0
5
0
5
0
5
0
Diffractométrie Henri Longchambon, 5 rue de La Doua, 69100
Villeurbanne, France
S. M.: e-mail, shashank.mishra@ircelyon.univ-lyon1.fr.
Fax: 33-472445399; Tel: 33 472445322.
2
013, 25, 1829ꢀ1836; (e) S. L. Benjamin, C. H. de Groot, C. Gurnani,
A. L. Hector, R. Huang, K. Ignatyev, W. Levason, S. J. Pearce, F.
Thomas and G. Reid, Chem. Mater., 2013, 25, 4719ꢀ4724; (f) C. H.
de Groot, C. Gurnani, A. L. Hector, R. Huang, M. Jura, W. Levason
and G. Reid, Chem. Mater., 2012, 24, 4442ꢀ4449; (g) A. L. Hector,
M. Jura, W. Levason, S. D. Reid and G. Reid, New J. Chem., 2009,
†
Electronic Supplementary Information (ESI) available: Powder XRD,
SEM, STEM, TEM and EDX of Cu2ꢀxSe and Cu2ꢀxSeꢀTiO composites
obtained under different conditions, experimental setup and graphical
plots of photodegradation of formic acid by Cu2ꢀxSeꢀTiO and recycled
1
1
1
1
1
1
1
00
05
10
15
20
2
3
3, 641ꢀ645;
2
2
0
(a) J. R. Sparks, R. He, N. Healy, M. Krishnamurthi, A. C. Peacock,
P. J. Sazio, V. Gopalan and J. V. Badding, Adv. Mater., 2011, 23,
1647ꢀ1651; (b) N. D. Boscher, C. J. Carmalt, R. G. Palgrave and I. P.
Parkin, Thin Solid Films, 2008, 516, 4750ꢀ4757; (c) N. D. Boscher,
C. J. Carmalt, G. Hyett, A. G. Prieto, Q. A. Pankhurst and I. P.
Parkin, J. Mater. Chem., 2008, 18, 1667ꢀ1673; (d) N. D. Boscher, C.
J. Carmalt and I. P. Parkin, J. Mater. Chem., 2006, 16, 122ꢀ127; (e)
N. D. Boscher, C. J. Carmalt, R. G. Palgrave, J. J. GilꢀTomas and I.
P. Parkin, Chem. Vap. Deposition, 2006, 12, 692ꢀ698; (f) N. D.
Boscher, C. J. Carmalt and I. P. Parkin, Eur. J. Inorg. Chem., 2006,
catalysts under UVꢀvisible region. CCDC 1835505ꢀ1835506 contain the
supplementary crystallographic data for this article. These data can be
obtained free of charge from the Cambridge Crystallographic Data
Centre. For ESI and crystallographic data in CIF or other electronic
format see DOI: 10.1039/b000000x/.
1
2
3
4
5
6
7
8
9
1
1
1
R. Daghrira, P. Droguia and D. Robertb, J. Photochem. Photobiol. A
Chem., 2012, 238, 41–52.
M. Kapilashrami, Y. Zhang, Y.ꢀS. Liu, A. Hagfeldt and J. Guo, Chem.
Rev., 2014, 114, 9662ꢀ9707.
1
255ꢀ1259.
Y. Liu, P. Zhang, B. Tian and J. Zhang, Catal. Commun., 2015, 70,
2
1
(a) K. Ramasamy, M. A. Malik, N. Revaprasadu and P. O’Brien,
Chem. Mater. 2013, 25, 3551–3569; (b) M. Afzaal, M. A. Malik and
P. O’Brien, J. Mater. Chem. 2010, 20, 4031–4040.
3
0–33.
J. Lee, T. G. Kim, H. Choi and Y. Sung, Cryst. Growth Des., 2007, 7,
588–2593.
2
2
2
2
3
A. Turki, C. Guillard, F. Dappozze, G. Berhault, Z. Ksibi and H.
Kochkar, J. Photochem. Photobio. Chem. 2014, 279, 8–16.
CrysAlisPro, Agilent Technologies, Version 1.171.34.49 (release 20ꢀ
01ꢀ2011 CrysAlis171 .NET) (compiled Jan 20 2011,15:58:25).
R. C. Clark and J. S. Reid, Acta Cryst. A, 1995, 51, 887ꢀ897.
A. Altomare, M. C. Burla, M. Camalli, G. L. Cascarano, C.
Giacovazzo, A. Guagliardi, A. G. G. Moliterni, G. Polidori and R.
Spagna, J. App. Cryst., 1999, 32, 115ꢀ119.
Z. Hana, L. Ren, M. Luo, L. Chen, H. Pan, C. Li, J. Chen and
J. Lan, J. Mol. Catal. A: Chem., 2016, 425, 229–236.
W. L. Ong, Y. Lim, J. L. T. Ong and G. W. Ho, J. Mater. Chem. A.,
2015, 3, 6509–6516.
S. Mishra, D. Du, E. Jeanneau, F. Dappozze, C. Guillard, J. Zhang
and S. Daniele, Chem. Asian J., 2016, 11, 1658–1663.
B. Chong, W. Zhu, Y. Liu, L. Guan and G. Z. Chen, J. Mater. Chem.
A., 2016, 4, 1336–1344.
2
2
4
5
25 26 P. W. Betteridge, J. R. Carruthers, R. I. Cooper, K. Prout and D. J.
C. Coughlan, M. Ibáñez, O. Dobrozhan, A. Singh, A. Cabot and
K.Ryan, Chem. Rev., 2017, 117, 5865–6109.
D. Chen, G. Chen, R. Jinb and H. Xua, CrystEngComm, 2014, 16,
Watkin, J. Appl. Cryst., 2003, 36, 1487.
2
2
7
A. L. Hector, M. Jura, W. Levason, S. D. Reid and G. Reid, New J.
Chem., 2009, 33, 641–645.
0
1
2
810–2817.
8 A. C. Jones and M. L. Hitchman, Chemical Vapour Deposition:
Precursors, Processes and Applications, Royal Society of Chemistry,
D. Li, Z. Zheng, Y. Lei, S. Ge, Y. Zhang, Y. Zhang, K. Wong, F.
Yanga and W. Lau, CrystEngComm. 2010, 12, 1856–1861.
30
2
009.
S. Mishra, E. Jeanneau and S. Daniele, Polyhedron, 2010, 29, 500–
06.
2 X. Liu, X. Duan, P. Penga and W. Zheng, Nanoscale, 2011, 3, 5090–
095.
2
9
5
5
This journal is © The Royal Society of Chemistry [year]
Journal Name, [year], [vol], 00–00 | 7