Welcome to LookChem.com Sign In|Join Free

CAS

  • or
Hexamethylcyclotrisiloxane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

541-05-9 Suppliers

Post Buying Request

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier
  • 541-05-9 Structure
  • Basic information

    1. Product Name: Hexamethylcyclotrisiloxane
    2. Synonyms: 2,2,4,4,6,6-Hexamethyl-1,3,5,2,4,6-trioxatrisilinane;CH7260;Cyclotrisiloxane, hexamethyl-;cyclotrisiloxane,hexamethyl-;Dimethylsiloxane cyclic trimer;hexamethylcyclortrisiloxane;hexamethyl-cyclotrisiloxan;HEXAMETHYLCYCLOHEXASILOXANE
    3. CAS NO:541-05-9
    4. Molecular Formula: C6H18O3Si3
    5. Molecular Weight: 222.46
    6. EINECS: 208-765-4
    7. Product Categories: Siloxanes;Organics;Si (Classes of Silicon Compounds);Si-O Compounds;Organometallic Reagents;Organosilicon
    8. Mol File: 541-05-9.mol
  • Chemical Properties

    1. Melting Point: 50-64 °C(lit.)
    2. Boiling Point: 134 °C(lit.)
    3. Flash Point: 95 °F
    4. Appearance: /solid
    5. Density: 1.02
    6. Vapor Density: 1 (vs air)
    7. Vapor Pressure: 11.6mmHg at 25°C
    8. Refractive Index: 1.417
    9. Storage Temp.: Flammables area
    10. Solubility: soluble in most organic solvents.
    11. Water Solubility: may decompose
    12. Sensitive: Moisture Sensitive
    13. Stability: Stable, but moisture sensitive. Incompatible with strong oxidizing agents. Highly flammable.
    14. BRN: 1766829
    15. CAS DataBase Reference: Hexamethylcyclotrisiloxane(CAS DataBase Reference)
    16. NIST Chemistry Reference: Hexamethylcyclotrisiloxane(541-05-9)
    17. EPA Substance Registry System: Hexamethylcyclotrisiloxane(541-05-9)
  • Safety Data

    1. Hazard Codes: F,Xi
    2. Statements: 11-36/37/38
    3. Safety Statements: 26
    4. RIDADR: UN 1325 4.1/PG 2
    5. WGK Germany: 3
    6. RTECS: GZ4705000
    7. TSCA: Yes
    8. HazardClass: 4.1
    9. PackingGroup: II
    10. Hazardous Substances Data: 541-05-9(Hazardous Substances Data)

541-05-9 Usage

Chemical Properties

White crystalline solid

Physical properties

mp 64–64.5 °C; bp 133–134 °C.

Uses

Different sources of media describe the Uses of 541-05-9 differently. You can refer to the following data:
1. Hexamethylcyclotrisiloxane is used in the preparation of graft polymers and block polymers. It is also a useful biochemical for proteomics research and also acts as an intermediate in organic reactions.
2. Hexamethylcyclotrisiloxane, is the simplest member of a series of cyclic oligodimethylsiloxanes, primarily used as synthetic equivalents for the reactive interme- diate dimethylsilanone. It is one of the main raw materials for silicone products. It is widely used in aviation, military industry, medicine and petrochemicals etc. Hexamethylcyclotrisiloxane undergoes ring-opening anionic polymerization reactions, suggesting use in polymer synthesis. It is also suggested for the treatment of powders and fillers to render them hydrophobic. Hexamethylcyclotrisiloxane mainly used for products of methyl vinyl silicone rubber. It’s also the important raw materials for synthesizing other high polymers. It may be used as an effective trapping reagent for a variety of short-lived intermediates, including silanones and silyenes. Hexamethylcyclotrisiloxane has many unique characteristics.The reaction of It is more active, can be easily and quickly polymerized under lower temperature and simple catalysts. may be used to synthesize many kinds of organic silicone products, which have better stability, better insulation properties and better water resistance. may be used to synthesize silicon rubber, which may has better elasticity, better abrasive resistance, and better corrosive resistance. may be used to synthesize silicone oil, which may has lower freezing point and less surface tension, it is slightly affected by temperature. Hexamethylcyclotrisiloxane is flammable. Use and store with all precautions required for Flammable Materials. Care should be exercised in handling GP-685 to prevent contact with skin or eyes. Wear safety glasses with side shields and rubber gloves when handling.
3. Hexamethylcyclotrisiloxane can be used as reagent for the preparation of dimethylsilanols, trapping of insitu- generated silanones, silylenes, silyl azides, silanethiones, and derivatives. Hexamethylcyclotrisiloxane, (D3) is the simplest member of a series of cyclic oligodimethylsiloxanes, primarily used as synthetic equivalents for the reactive intermediate dimethylsilanone. This characteristic is responsible for its extensive application in polymer chemistry. Hexamethylcyclotrisiloxane has also been exploited as an efficient trapping reagent for a variety of shortlived intermediates, including silanones and silyenes. The ability of D3 to intercept these reactive species has been attributed to its rigid, planar structure,8 and the resultant release of strain from ring expansion.

Flammability and Explosibility

Highlyflammable

Check Digit Verification of cas no

The CAS Registry Mumber 541-05-9 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 5,4 and 1 respectively; the second part has 2 digits, 0 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 541-05:
(5*5)+(4*4)+(3*1)+(2*0)+(1*5)=49
49 % 10 = 9
So 541-05-9 is a valid CAS Registry Number.
InChI:InChI=1/C6H18O3Si3/c1-10(2)7-11(3,4)9-12(5,6)8-10/h1-6H3

541-05-9 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Alfa Aesar

  • (B23028)  Hexamethylcyclotrisiloxane, 97%   

  • 541-05-9

  • 25g

  • 357.0CNY

  • Detail
  • Alfa Aesar

  • (B23028)  Hexamethylcyclotrisiloxane, 97%   

  • 541-05-9

  • 100g

  • 856.0CNY

  • Detail
  • Alfa Aesar

  • (B23028)  Hexamethylcyclotrisiloxane, 97%   

  • 541-05-9

  • 500g

  • 3413.0CNY

  • Detail
  • Sigma-Aldrich

  • (38677)  Hexamethylcyclotrisiloxane  analytical standard

  • 541-05-9

  • 38677-100MG

  • 458.64CNY

  • Detail
  • Aldrich

  • (235687)  Hexamethylcyclotrisiloxane  98%

  • 541-05-9

  • 235687-25G

  • 368.55CNY

  • Detail
  • Aldrich

  • (235687)  Hexamethylcyclotrisiloxane  98%

  • 541-05-9

  • 235687-100G

  • 872.82CNY

  • Detail

541-05-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Hexamethylcyclotrisiloxane

1.2 Other means of identification

Product number -
Other names hexamethylcyclortrisiloxane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Adhesives and sealant chemicals,CBI,Intermediates
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:541-05-9 SDS

541-05-9Synthetic route

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With aluminium(III) iodide at 140 - 170℃; for 5h;99%
dimethyl sulfoxide
67-68-5

dimethyl sulfoxide

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

E

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane;A 79%
B 48%
C 35%
D 12%
E 5%
dimethyl sulfoxide
67-68-5

dimethyl sulfoxide

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With dimethylsilicon dichloride at 0℃; Further byproducts given;A 79%
B 48%
C 35%
D 5%
phenyltrimethylsilyl ether
1529-17-5

phenyltrimethylsilyl ether

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

dimethyl-diphenoxy-silane
3440-02-6

dimethyl-diphenoxy-silane

C

C13H26O3Si3
18406-79-6

C13H26O3Si3

D

C11H20O2Si2

C11H20O2Si2

Conditions
ConditionsYield
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts;A n/a
B 79%
C n/a
D n/a
bis(trimethylsilyl)ketene
19061-00-8

bis(trimethylsilyl)ketene

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

trimethylsilylacetylene
1066-54-2

trimethylsilylacetylene

Conditions
ConditionsYield
at 700℃; flash vacuum pyrolysis;A 22%
B 16%
C 76%
(trimethylsilyl)(dimethylsilyl)ketene
98991-82-3

(trimethylsilyl)(dimethylsilyl)ketene

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

trimethylsilylacetylene
1066-54-2

trimethylsilylacetylene

Conditions
ConditionsYield
at 700℃;A 22%
B 16%
C 76%
1-(1-Adamantyl)-2-diazo-2-(pentamethyldisilanyl)ethanone
87594-05-6

1-(1-Adamantyl)-2-diazo-2-(pentamethyldisilanyl)ethanone

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

1-(trimethylsilylethynyl)adamantane
82094-48-2

1-(trimethylsilylethynyl)adamantane

Conditions
ConditionsYield
at 400℃;A 21%
B 20%
C 73%
(benzylimino)triphenylphosphorane
52826-45-6

(benzylimino)triphenylphosphorane

3,3-dimethyl-6-oxa-3-silabicyclo<3.1.0>hexane
65181-02-4

3,3-dimethyl-6-oxa-3-silabicyclo<3.1.0>hexane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

2,2,4,4-tetramethyl-6-vinyl-1,3-dioxa-2,4-disilacyclohexane
113017-78-0

2,2,4,4-tetramethyl-6-vinyl-1,3-dioxa-2,4-disilacyclohexane

D

buta-1,3-diene
106-99-0

buta-1,3-diene

Conditions
ConditionsYield
at 130℃; for 1h;A n/a
B n/a
C 70%
D n/a
at 130℃; for 1h;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Conditions
ConditionsYield
With water Autoclave;A 63.7%
B 27.2%
With water In toluene at 20℃; for 27h;A 17 % Chromat.
B 38%
With water Autoclave;A 15.9%
B 17.4%
With water In toluene at 20℃; for 27h;A 4%
B 44 % Chromat.
With tetrabutylammonium tetrafluoroborate; oxygen In tetrahydrofuran Product distribution; Further Variations:; Reagents; amount of electricity; type of electrolysis cell; Electrochemical reaction;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h;A 60%
B 20%
C 15%
With water Autoclave;A 51.3%
B 29.2%
C 8%
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale;A n/a
B 43%
C n/a
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With dimethyl sulfoxide at 0℃; Further byproducts given;A 48%
B 35%
C 12%
D 5%
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given;
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given;
(allyl)(cyclopentadienyl)dimethylsilane
17306-11-5

(allyl)(cyclopentadienyl)dimethylsilane

benzaldehyde
100-52-7

benzaldehyde

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

6-phenylfulvene
7338-50-3

6-phenylfulvene

Conditions
ConditionsYield
A n/a
B n/a
C 47%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

E

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;;A n/a
B 0.5%
C 42%
D 6.7%
E 1.6%
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes;
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;;
triphenylboroxine
3262-89-3

triphenylboroxine

2,2,4,4,6,6-hexamethylcyclotrisilazane
1009-93-4

2,2,4,4,6,6-hexamethylcyclotrisilazane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

2,2,4,4,6,6-hexamethyl-1,3-dioxa-5-aza-2,4,6-trisilacyclohexane
7418-21-5

2,2,4,4,6,6-hexamethyl-1,3-dioxa-5-aza-2,4,6-trisilacyclohexane

C

2,4,6-triphenylborazine
976-28-3

2,4,6-triphenylborazine

Conditions
ConditionsYield
In potassium hydroxide byproducts: CH4, C6H6; heating 0.01mol phenylboric anhydride and 0.01mol cyclotrisilazane and 0.05g (1%) KOH for 4h at 180-280°C; analysis of liquid and gaseous products by GLC; extractn. of residue with C6H6, removal of solvent, recrystn. of triphenylborazine from heptane, elem. anal.;A n/a
B n/a
C 40%
2,3-dimethyl-3,4-epoxy-1-butene
34485-82-0

2,3-dimethyl-3,4-epoxy-1-butene

dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

2,2,4,5-tetramethyl-1-oxa-2-silacyclohex-4-ene

2,2,4,5-tetramethyl-1-oxa-2-silacyclohex-4-ene

D

2,3-dimethyl-buta-1,3-diene
513-81-5

2,3-dimethyl-buta-1,3-diene

Conditions
ConditionsYield
at 0℃; Irradiation;A 3%
B 4%
C 38%
D 25%
epoxybutene
930-22-3

epoxybutene

dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

2,2-dimethyl-1-oxa-2-silacyclohex-4-ene

2,2-dimethyl-1-oxa-2-silacyclohex-4-ene

D

buta-1,3-diene
106-99-0

buta-1,3-diene

Conditions
ConditionsYield
at 0℃; Irradiation;A 3%
B 6%
C 15%
D 35%
1-dimethylmethoxysilyl-1-trimethylsilylcyclopentadiene
78133-11-6

1-dimethylmethoxysilyl-1-trimethylsilylcyclopentadiene

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With benzaldehyde at 500℃;29%
benzophenone
119-61-9

benzophenone

(allyl)(cyclopentadienyl)dimethylsilane
17306-11-5

(allyl)(cyclopentadienyl)dimethylsilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

6,6-Diphenylfulvene
2175-90-8

6,6-Diphenylfulvene

Conditions
ConditionsYield
With quartz In benzene at 600℃;A n/a
B n/a
C 28%
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

D

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

E

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

Conditions
ConditionsYield
With carbon monoxide; nickel at 200℃; under 750.06 Torr; for 2h; Product distribution; various reagents and reaction conditions;A n/a
B 25.8%
C n/a
D n/a
E n/a
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

dodecamethylpentasiloxane
141-63-9

dodecamethylpentasiloxane

Conditions
ConditionsYield
With water In toluene at 20℃; for 27h; Further byproducts given;A n/a
B 22%
C n/a
D 10 % Chromat.
With water In toluene at 20℃; for 27h; Further byproducts given;A n/a
B 22 % Chromat.
C n/a
D 10%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

Conditions
ConditionsYield
With water In toluene at 20℃; for 27h; Further byproducts given;A n/a
B 22%
C n/a
D 6 % Chromat.
dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

octamethylcyclotetrasilane
38041-04-2

octamethylcyclotetrasilane

D

decamethylcyclopentasilane
13452-92-1

decamethylcyclopentasilane

Conditions
ConditionsYield
With sodium perchlorate In tetrahydrofuran Photolysis;A 73 % Chromat.
B 20%
C n/a
D n/a
(allyl)(cyclopentadienyl)dimethylsilane
17306-11-5

(allyl)(cyclopentadienyl)dimethylsilane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With benzaldehyde at 680℃;17%
1-trimethylsilyl-μ3-S,S'-ethylenedithiolatohexacarbonyldiiron

1-trimethylsilyl-μ3-S,S'-ethylenedithiolatohexacarbonyldiiron

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Conditions
ConditionsYield
In decane byproducts: H2S; Ar atmosphere; decompn. (165°C, 13 h); GLC, chromato-mass spectroscopy;A 15%
B 15%
C 15%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

A

iododimethylsilane
2441-21-6

iododimethylsilane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Conditions
ConditionsYield
With iodine In dichloromethaneA n/a
B 4%
C 11%
diethoxy dimethylsilane
78-62-6

diethoxy dimethylsilane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With hydrogenchloride
(1,1,3,3-tetramethyldisiloxane-1,3-diyl)bis(methylene)diacetate
5360-04-3

(1,1,3,3-tetramethyldisiloxane-1,3-diyl)bis(methylene)diacetate

A

acetic acid methyl ester
79-20-9

acetic acid methyl ester

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With sodium hydroxide
Dimethyl ether
115-10-6

Dimethyl ether

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With aluminium trichloride at 200℃;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

acetone
67-64-1

acetone

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With water Erhitzen des Reaktionsprodukts an Al2O3 auf 500-550grad;
With water at 15 - 20℃; Erhitzen der gebildeten nicht destillierbaren Produkte mit NaOH auf 230-240grad unter 1 mm;
With water at 15 - 20℃;
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

bis(tetraphenylphosphonium) hexachloridodiberyllate

bis(tetraphenylphosphonium) hexachloridodiberyllate

2(C6H5)4P(1+)*[Be4Cl6(OSi(CH3)2OSi(CH3)2O)2](2-)=((C6H5)4P)2[Be4Cl6(OSi(CH3)2OSi(CH3)2O)2]

2(C6H5)4P(1+)*[Be4Cl6(OSi(CH3)2OSi(CH3)2O)2](2-)=((C6H5)4P)2[Be4Cl6(OSi(CH3)2OSi(CH3)2O)2]

Conditions
ConditionsYield
In dichloromethane byproducts: (CH3)2SiCl2, ((C6H5)4P)Cl; all manipulations under dry N2 atm.; soln. of Be compd. in CH2Cl2 added to soln. of Si compd. in CH2Cl2, stored at 20°C for 2 d; evapd. under vac.;99%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

tert.-butyl lithium
594-19-4

tert.-butyl lithium

tert-butyldimethylsilanol
18173-64-3

tert-butyldimethylsilanol

Conditions
ConditionsYield
In diethyl ether 1.) 0 deg C, 1 h, 2.) to 25 deg C, 1.5 h;98%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

lithium dimethylamide
3585-33-9

lithium dimethylamide

lithium (dimethylamino)dimethylsilanolate

lithium (dimethylamino)dimethylsilanolate

Conditions
ConditionsYield
In tetrahydrofuran for 4h;98%
C19H45N10P

C19H45N10P

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C6H19O4Si3(1-)*C19H45N10P*H(1+)

C6H19O4Si3(1-)*C19H45N10P*H(1+)

Conditions
ConditionsYield
In hexane; water98%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

(E)-4-bromostilbene
13041-70-8

(E)-4-bromostilbene

(E)-(4-(phenylethenyl)phenyl)dimethylsilanol
1123246-77-4

(E)-(4-(phenylethenyl)phenyl)dimethylsilanol

Conditions
ConditionsYield
Stage #1: (E)-4-bromostilbene With tert.-butyl lithium In diethyl ether at -78 - -57℃; Inert atmosphere;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -57℃; Inert atmosphere;
95%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C40H99N13P4

C40H99N13P4

C6H20O4Si3*C40H99N13P4

C6H20O4Si3*C40H99N13P4

Conditions
ConditionsYield
With water In hexane at 20℃;95%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C40H99N13P4

C40H99N13P4

C40H99N13P4*H(1+)*C6H19O4Si3(1-)

C40H99N13P4*H(1+)*C6H19O4Si3(1-)

Conditions
ConditionsYield
In hexane; water at 20℃;95%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

carbonic acid dimethyl ester
616-38-6

carbonic acid dimethyl ester

dimethyldimethoxysilan
1112-39-6

dimethyldimethoxysilan

Conditions
ConditionsYield
With aluminum oxide; potassium fluoride at 400℃;94%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

t-butyldimethylsilyl-4-bromophenol
67963-68-2

t-butyldimethylsilyl-4-bromophenol

(4-(tert-butyldimethylsilyloxy)phenyl)dimethylsilanol
1123246-73-0

(4-(tert-butyldimethylsilyloxy)phenyl)dimethylsilanol

Conditions
ConditionsYield
Stage #1: t-butyldimethylsilyl-4-bromophenol With tert.-butyl lithium In diethyl ether at -78 - -58℃; Inert atmosphere;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;
93%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

(((2,6-Me2NCH2)2C6H3)BiO)2

(((2,6-Me2NCH2)2C6H3)BiO)2

cyclo-(C6H3-2,6-((CH2NMe2)2))Bi(OSiMe2)2O

cyclo-(C6H3-2,6-((CH2NMe2)2))Bi(OSiMe2)2O

Conditions
ConditionsYield
In benzene at 60℃; for 120h; Inert atmosphere; Schlenk technique;93%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

2-iodo-5-phenylpent-1-ene

2-iodo-5-phenylpent-1-ene

2-(dimethylsilanol)-5-phenylpent-1-ene
311312-20-6

2-(dimethylsilanol)-5-phenylpent-1-ene

Conditions
ConditionsYield
With tert.-butyl lithium In diethyl ether; hexane at -78 - 20℃;92%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

diisobutylaluminium hydride
1191-15-7

diisobutylaluminium hydride

(i-Bu)2Al(μ-OSiMe2H)(μ-OSiMe2OSiMe2H)Al(i-Bu)2
254763-41-2

(i-Bu)2Al(μ-OSiMe2H)(μ-OSiMe2OSiMe2H)Al(i-Bu)2

Conditions
ConditionsYield
In n-heptane stirring (3 d); evapn. (vac.); elem. anal.;92%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,1,3,3,5,5-Hexamethyltrisiloxane-1,5-diol
3663-50-1

1,1,3,3,5,5-Hexamethyltrisiloxane-1,5-diol

Conditions
ConditionsYield
With Re/Ac; water; hydrogen In tetrahydrofuran at 25℃; under 760.051 Torr; for 7h; Reagent/catalyst;91.3%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

2,4,6-trimethylcyclotrisiloxane
13269-39-1

2,4,6-trimethylcyclotrisiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane
546-45-2

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=2.69; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=2.69; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions
ConditionsYield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃;
Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane
91%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

2,4,6-trimethylcyclotrisiloxane
13269-39-1

2,4,6-trimethylcyclotrisiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane
546-45-2

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4800, Mw/Mn=2.10; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

polymer, Mn=4800, Mw/Mn=2.10; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions
ConditionsYield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃;
Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane
90%
n-butyllithium
109-72-8, 29786-93-4

n-butyllithium

dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C12H34O3Si4
121263-52-3

C12H34O3Si4

Conditions
ConditionsYield
In tetrahydrofuran; toluene for 5h; Inert atmosphere;90%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

2,4,6-trimethylcyclotrisiloxane
13269-39-1

2,4,6-trimethylcyclotrisiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane
546-45-2

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4200, Mw/Mn=2.01; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

polymer, Mn=4200, Mw/Mn=2.01; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions
ConditionsYield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃;
Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane
88%
[(pentamethylcyclopentadienyl)2Sm(μ-H)]2
84751-30-4

[(pentamethylcyclopentadienyl)2Sm(μ-H)]2

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

{(C5(CH3)5)2Sm(C4H8O)}2(OSi(CH3)2OSi(CH3)2O)
130013-56-8

{(C5(CH3)5)2Sm(C4H8O)}2(OSi(CH3)2OSi(CH3)2O)

Conditions
ConditionsYield
In tetrahydrofuran dissoln. of the Sm-compd. and hexamethylcyclotrisiloxane in THF, stirred for 5 min; removal of solvent by rotary evaporation, extractn. of solid with hexane, removal of hexane, elem. anal.;88%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

para-iodoanisole
696-62-8

para-iodoanisole

(p-methoxyphenyl)dimethylsilanol
22868-26-4

(p-methoxyphenyl)dimethylsilanol

Conditions
ConditionsYield
Stage #1: para-iodoanisole With n-butyllithium In diethyl ether at -78℃; Inert atmosphere;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;
88%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

p-trifluoromethylphenyl bromide
402-43-7

p-trifluoromethylphenyl bromide

hydroxy(dimethyl)(4-trifluoromethylphenyl)silane
228873-97-0

hydroxy(dimethyl)(4-trifluoromethylphenyl)silane

Conditions
ConditionsYield
Stage #1: p-trifluoromethylphenyl bromide With tert.-butyl lithium In diethyl ether at -78℃; Inert atmosphere;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;
87%
Stage #1: p-trifluoromethylphenyl bromide With n-butyllithium In diethyl ether at -78℃; for 1h; Metallation;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at 20℃; for 13h; Substitution;
83%
Stage #1: p-trifluoromethylphenyl bromide With n-butyllithium In diethyl ether; hexane at -78℃; for 1h;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether; hexane at 20℃; for 13h; Further stages.;
83%
bromochlorobenzene
106-39-8

bromochlorobenzene

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

(4-chlorophenyl)dimethylsilanol
18246-04-3

(4-chlorophenyl)dimethylsilanol

Conditions
ConditionsYield
Stage #1: bromochlorobenzene With tert.-butyl lithium In diethyl ether at -78 - -60℃; Inert atmosphere;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -74℃; Inert atmosphere;
87%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

phenyllithium
591-51-5

phenyllithium

dimethylphenylsilanol
5272-18-4

dimethylphenylsilanol

Conditions
ConditionsYield
In diethyl ether Substitution;86%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

2,4,6-trimethylcyclotrisiloxane
13269-39-1

2,4,6-trimethylcyclotrisiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane
546-45-2

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=2.17; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=2.17; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions
ConditionsYield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃;
Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane
85%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

trans-1-iodo-1-pentene
66703-03-5

trans-1-iodo-1-pentene

(E)-dimethyl-(1-pentenyl)silanol
915380-13-1

(E)-dimethyl-(1-pentenyl)silanol

Conditions
ConditionsYield
Stage #1: trans-1-iodo-1-pentene With n-butyllithium In diethyl ether at -78℃; for 0.5h;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃;
85%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

2,2,4,4,6,6,8,8-Octamethyl-1,5,7-trioxa-3-aza-cyclooctasilan
17883-13-5

2,2,4,4,6,6,8,8-Octamethyl-1,5,7-trioxa-3-aza-cyclooctasilan

Conditions
ConditionsYield
Stage #1: Hexamethylcyclotrisiloxane; dimethylsilicon dichloride; N,N,N,N,N,N-hexamethylphosphoric triamide at 20℃; for 3h; Inert atmosphere;
Stage #2: With ammonia In toluene at 5℃; for 8h; Cooling with ice;
84.7%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1-Iodonaphthalene
90-14-2

1-Iodonaphthalene

dimethyl(naphthalen-1-yl)silanol
17950-90-2

dimethyl(naphthalen-1-yl)silanol

Conditions
ConditionsYield
Stage #1: 1-Iodonaphthalene With n-butyllithium In diethyl ether at -78℃; Inert atmosphere;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; Inert atmosphere;
84%
Stage #1: 1-Iodonaphthalene With n-butyllithium In diethyl ether; hexane at -78℃; for 1h;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at -78 - 20℃; for 12h;
67%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

2,4,6-trimethylcyclotrisiloxane
13269-39-1

2,4,6-trimethylcyclotrisiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane
546-45-2

1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=1.89; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

polymer, Mn=4300, Mw/Mn=1.89; monomers: hexamethylcyclotrisiloxane; trimethyltriphenylcyclosiloxane; trimethylcyclotrisiloxane

Conditions
ConditionsYield
Stage #1: 2,4,6-trimethylcyclotrisiloxane; Hexamethylcyclotrisiloxane; 1,3,5-triphenyl-1,3,5-trimethylcyclotrisiloxane With n-butyllithium In tetrahydrofuran; hexane at 70℃;
Stage #2: chloro-trimethyl-silane In tetrahydrofuran; hexane
82%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

2-methylphenyl bromide
95-46-5

2-methylphenyl bromide

hydroxy(dimethyl)(2-methylphenyl)silane
188404-95-7

hydroxy(dimethyl)(2-methylphenyl)silane

Conditions
ConditionsYield
Stage #1: 2-methylphenyl bromide With n-butyllithium In diethyl ether at -78℃; for 1h; Metallation;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether at 20℃; for 13h; Substitution;
81%
Stage #1: 2-methylphenyl bromide With n-butyllithium In diethyl ether; hexane at -78℃; for 1h;
Stage #2: Hexamethylcyclotrisiloxane In diethyl ether; hexane at 20℃; for 13h; Further stages.;
81%
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

dimethylaluminum hydride
865-37-2

dimethylaluminum hydride

(Me)2Al(μ-OSiMe2H)(μ-OSiMe2OSiMe2H)Al(Me)2
254763-42-3

(Me)2Al(μ-OSiMe2H)(μ-OSiMe2OSiMe2H)Al(Me)2

Conditions
ConditionsYield
In hexane stirring (4 d); evapn. (vac.); elem. anal.;81%

541-05-9Relevant articles and documents

Electrochemical oxygenation of diorganyldichlorosilanes: A novel route to generation of diorganylsilanones

Fattakhova,Jouikov,Voronkov

, p. 170 - 176 (2000)

Interaction of diorganyldichlorosilanes R2SiCl2 (R = Me, Et, Ph) with superoxide or peroxide anions, produced in situ by electroreduction of molecular oxygen, provides short-living diorganylsilanones R2Si=O. The latter undergo cyclization to give lower perorganylcyclosiloxanes (R2SiO)n, n = 3 or 4 and then insert to the molecules of these primary products to form higher cyclic oligomers. When the process is carried out in the presence of a reagent-trap for silanones (hexamethyldisiloxane, hexamethylcyclotrisiloxane), the products of insertion of diorganylsilanones into the molecule-traps (Me3Si(OSiR2)nOSiMe3 with n ≥ 1, and (Me2SiO)3(R2SiO)m with m ≥ 1, respectively) were obtained.

Silylating Disulfides and Thiols with Hydrosilicones Catalyzed by B(C6F5)3

Brook, Michael A.,Liao, Mengchen,Zheng, Sijia

supporting information, p. 2694 - 2700 (2021/06/25)

Hydrosilanes and silicones, catalyzed with B(C6F5)3, may be used to silylate thiols or cleave disulfides giving silyl thio ethers. Alcohols were found to react faster than thiols or disulfides, while alkoxysilanes (the Piers-Rubinsztajn reaction) were slower such that the overall order of reactivity was found to be HO>HS>SS>SiOEt. The resulting silane and silicone-protected thio ethers produced from the sulfur-based functional groups could be cleaved to thiols using alcohols or mild acid with rates that depend on the steric bulk of the siloxane.

Hydrogenolysis of Polysilanes Catalyzed by Low-Valent Nickel Complexes

Comas-Vives, Aleix,Eiler, Frederik,Grützmacher, Hansj?rg,Pribanic, Bruno,Trincado, Monica,Vogt, Matthias

supporting information, p. 15603 - 15609 (2020/04/29)

The dehydrogenation of organosilanes (RxSiH4?x) under the formation of Si?Si bonds is an intensively investigated process leading to oligo- or polysilanes. The reverse reaction is little studied. To date, the hydrogenolysis of Si?Si bonds requires very harsh conditions and is very unselective, leading to multiple side products. Herein, we describe a new catalytic hydrogenation of oligo- and polysilanes that is highly selective and proceeds under mild conditions. New low-valent nickel hydride complexes are used as catalysts and secondary silanes, RR′SiH2, are obtained as products in high purity.

METHOD FOR PRODUCING SILOXANE OLIGOMER

-

Paragraph 0034; 0045, (2017/07/23)

PROBLEM TO BE SOLVED: To provide a production method capable of simply producing a siloxane oligomer in a high yield when producing a siloxane oligomer by hydrolysis of a silicon halide compound and to provide a production method capable of selectively producing a linear or cyclic siloxane oligomer in particular. SOLUTION: The siloxane oligomer can be efficiently produced without performing any special agitation by providing two electrospray nozzles to oppose to each other in a medium liquid and in the medium liquid, electrostatically spraying in an electric field a first liquid sample containing a silicon halide compound from one nozzle and electrostatically spraying in an electric field a second liquid sample containing water from the other nozzle and allowing the liquid samples to collide and fuse with each other. SELECTED DRAWING: None COPYRIGHT: (C)2017,JPO&INPIT

A dimethyl dichloro silane hydrolysate cracking method

-

Paragraph 0026; 0028, (2017/02/24)

The invention discloses a method for splitting dimethyl dichlorosilane hydrolysate. The method comprises the following steps: carrying out load reaction onto strong-basicity macroporous anion exchange resin, potassium hydroxide, potassium trimethylsilanolate and [bmim]BF4 ionic liquid to obtain a composite catalyst after the reaction is ended; adding dimethyl dichlorosilane hydrolysate into a splitting kettle to obtain a ring-body mixture by splitting and re-arranging solvent oil, the composite catalyst and the hydrolysate; and washing with water to remove high-boiling point residues and low-boiling point residues to obtain products such as octamethylcyclotetrasiloxane D4, hexamethylcyclotrisiloxane and decamethylcyclopentasiloxane.

One-Step Synthesis of Siloxanes from the Direct Process Disilane Residue

Neumeyer, Felix,Auner, Norbert

supporting information, p. 17165 - 17168 (2016/11/23)

The well-established Müller–Rochow Direct Process for the chloromethylsilane synthesis produces a disilane residue (DPR) consisting of compounds MenSi2Cl6?n(n=1–6) in thousands of tons annually. Technologically, much effort is made to retransfer the disilanes into monosilanes suitable for introduction into the siloxane production chain for increase in economic value. Here, we report on a single step reaction to directly form cyclic, linear, and cage-like siloxanes upon treatment of the DPR with a 5 m HCl in Et2O solution at about 120 °C for 60 h. For simplification of the Si?Si bond cleavage and aiming on product selectivity the grade of methylation at the silicon backbone is increased to n≥4. Moreover, the HCl/Et2O reagent is also suitable to produce siloxanes from the corresponding monosilanes under comparable conditions.

Silanones and silanethiones from the reactions of transient silylenes with oxiranes and thiiranes in solution. The direct detection of diphenylsilanethione

Kostina, Svetlana S.,Leigh, William J.

supporting information; experimental part, p. 4377 - 4388 (2011/06/11)

The transient silylenes SiMe2 and SiPh2 react with cyclohexene oxide (CHO), propylene oxide (PrO), and propylene sulfide (PrS) in hydrocarbon solvents to form products consistent with the formation of the corresponding transient silanones and silanethiones, respectively. Laser flash photolysis studies show that these reactions proceed via multistep sequences involving the intermediacy of the corresponding silylene-oxirane or -thiirane complexes, which are formed with rate constants close to the diffusion limit in all cases and exhibit UV absorption spectra similar to those of the corresponding complexes with the nonreactive O- and S-donors, tetrahydrofuran and tetrahydrothiophene. The SiMe2-PrO and SiPh2-PrO complexes both exhibit lifetimes of ca. 300 ns, and are longer-lived than the corresponding complexes with CHO, which are both in the range of 230-240 ns. On the other hand, the silylene-PrS complexes are considerably shorter-lived and vary with silyl substituent; the SiMe2-PrS complex decays with the excitation laser pulse (i.e., τ ≥ 25 ns), while the SiPh2-PrS complex exhibits τ = 48 ± 3 ns. The decay of the SiPh2-PrS complex affords a long-lived transient product exhibiting λ max ≈ 275 nm, which has been assigned to diphenylsilanethione (Ph2Si=S) on the basis of its second order decay kinetics and absolute rate constants for reaction with methanol, tert-butanol, acetic acid, and n-butyl amine, for which values in the range of 1.4 × 108 to 3.2 × 109 M-1 s-1 are reported. The experimental rate constants for decay of the SiMe2-epoxide and -PrS complexes indicate free energy barriers (ΔG?) of ca. 8.5 and ≥7.1 kcal mol-1 for the rate-determining steps leading to dimethylsilanone and -silanethione, respectively, which are compared to the results of DFT (B3LYP/6-311+G(d,p)) calculations of the reactions of SiH 2 and SiMe2 with oxirane and thiirane. The calculations predict a stepwise C-O cleavage mechanism involving singlet biradical intermediates for the silylene-oxirane complexes, and a concerted mechanism for silanethione formation from the silylene-thiirane complexes, in agreement with earlier ab initio studies of the SiH2-oxirane and -thiirane systems.

Effect of catalyst structure on the reaction of α-methylstyrene with 1,1,3,3-tetramethyldisiloxane

De Vekki,Skvortsov

body text, p. 762 - 777 (2009/09/26)

Reaction of α-methylstyrene with 1,1,3,3-tetramethyldisiloxane in the presence of the complexes of platinum(II), palladium(II) and rhodium(I) is explored. It is established that in the presence of platinum catalyst predominantly occurs hydrosilylation of α-methylstyrene leading to formation of β-adduct, on palladium catalysts proceeds reduction of α-methylstyrene, on rhodium catalysts both the processes take place. In the reaction mixture proceeds disproportion and dehydrocondensation of 1,1,3,3-tetramethyldisiloxane that leads to formation of long chain linear and cyclic siloxanes of general formula HMe2Si(OSiMe2) n H and (-OSiMe2-)m (n = 2-6, m = 3-7), respectively. Platinum catalysts promotes formation of linear siloxanes, while both rhodium and palladium catalysts afford linear and cyclic siloxanes as well. Structure of intermediate metallocomplexes is studied.

A mechanistic study of cyclic siloxane pyrolyses at low pressures

Almond, Matthew J.,Becerra, Rosa,Bowes, Sarah J.,Cannady, John P.,Ogden, J. Steven,Walsh, Robin

experimental part, p. 6856 - 6861 (2009/04/18)

Matrix isolation IR spectroscopy has been used to study the vacuum pyrolysis of hexamethylcyclotrisiloxane (D3), octamethylcyclotetrasiloxane (D4) and decamethyl cyclopentasiloxane (D5), and the results interpreted in the context of various kinetic models. In particular, it is shown that the significant pyrolysis products - which include CH3, CH4, C2H2, C2H4, C2H 6 and SiO - may be satisfactorily accounted for by radical reactions involving dimethylsiloxane (D1), and estimates are made of the various chain lengths for the proposed reactions based on a range of ambient conditions. the Owner Societies.

METHOD FOR THE PRODUCTION OF CYCLIC POLYSILOXANES

-

Page/Page column 19-21, (2009/01/23)

A process for producing cyclic polysiloxanes is disclosed. The first step of the process comprises combining a poiysiloxane, a cafaiyst and a high boiling endblocker, wherein the catalyst is selected from the group consisting of a phosphazene base and a carborane acid. The second step of the process comprises heating said poiysiloxane, catalyst and high boiling endblocker, and the third step of the process comprising recovering the cyclic poiysiloxane,

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 541-05-9