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556-67-2

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556-67-2 Usage

Chemical Properties

Octamethylcyclotetrasiloxane is also known as D4. It is an odorless, colorless non-oily silicone fluid which has C8H24O4Si4 as chemical formula. It is a cyclic organic silicon substance which can be used as monomer in the production of silicone polymers such as rubber, resins and greases.

Uses

Octamethylcyclotetrasiloxane is used as a monomer in the production of silicone polymers and as an intermediate in the production of other organosilicon substances.Further it finds its application in electronics, textiles, personal care products and household care products. Polydimethylsiloxane by the Polymerization of Octamethylcyclotetrasiloxane: To a resin flask equipped with a thermometer, stirrer, and reflux eondenser is added 1000 gm of octamethylcyclotetrasiloxane. The siloxane is heated to 165°C, and then 0.14gm of a potassium hydroxide-isopropanol complex (neutral equivalent = 193.5) is added to give a Si : Κ ratio of 4470:1. In 25 min the stirrer begins to stall, and the polymer is now heated for 3(1/2) hr at 150°C to complete polymerization. The resulting polymer has an intrinsic viscosity of 1.5 dl/gm corresponding to a molecular weight of 804,600.

Definition

ChEBI: Octamethylcyclotetrasiloxane is a cyclosiloxane that is the octamethyl derivative of cyclotetrasiloxane. It is an organosilicon compound and a cyclosiloxane. It derives from a hydride of a cyclotetrasiloxane.

Preparation

Commercially Octamethylcyclotetrasiloxane is produced from dimethyldichlorosilane. Dimethyldichlorosilane is added dropwise to water, the temperature is maintained at 30-40°C, stratified, the acid water is released, the oily material is hydrolyzed with sodium hydroxide solution, the hydrolysate and 0.5%-2% potassium hydroxide are added to the cracking kettle and cracked at 120-140°C and 99.8 kPa vacuum. The cracked material is fractionated and the fraction is collected at 173-176°C to obtain octamethylcyclotetraoxysilane.

General Description

Octamethylcyclotetrasiloxane (D4) is a volatile methylsiloxane (VMS) with a relatively low molecular weight. This silicone fluid has a silicon-oxygen bond in a cyclic arrangement and methyl groups are attached to the silicon atom. D4 can be used in the manufacture of silicone based polymers for use in medical devices and personal care products.

Health Hazard

Octamethylcyclotetrasiloxane (D4) can interfere with the body’s hormones. In animals, it can affect the reproductive system.D4 is classified as a category 1 endocrine disruptor by the European Commission. A 2018 study commissioned by the Danish EPA identified D4 as an endocrine disruptor. The Global Harmonized System Label Requirements classified D4 as suspected to produce reproductive toxicity. D4 was added to the Toxic Substances Control Act work plan due to reproductive toxicity, moderate environmental persistence, and high bioaccumulation potential.Adverse reproductive effects including estrogenic effects have been observed in rodents. The European Chemicals Agency characterized D4 as a persistent, bioaccumulative, and toxic chemical, and designated D4 as a Substance of Very High Concern.

Flammability and Explosibility

Flammable

Purification Methods

The solid exists in two forms, m 16.30o and 17.65o. Dry it over CaH2 and distil it. Further fractionation can be effected by repeated partial freezing and discarding the liquid phase. [Osthoff & Grubb J Am Chem Soc 76 399 1954, Hoffman J Am Chem Soc 75 6313 1953, Beilstein 4 IV 4125.]

Check Digit Verification of cas no

The CAS Registry Mumber 556-67-2 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 5,5 and 6 respectively; the second part has 2 digits, 6 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 556-67:
(5*5)+(4*5)+(3*6)+(2*6)+(1*7)=82
82 % 10 = 2
So 556-67-2 is a valid CAS Registry Number.
InChI:InChI=1/C8H24O4Si4/c1-13(2)9-14(3,4)11-16(7,8)12-15(5,6)10-13/h1-8H3

556-67-2 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Alfa Aesar

  • (A15240)  Octamethylcyclotetrasiloxane, 98%   

  • 556-67-2

  • 100g

  • 763.0CNY

  • Detail
  • Alfa Aesar

  • (A15240)  Octamethylcyclotetrasiloxane, 98%   

  • 556-67-2

  • 500g

  • 2922.0CNY

  • Detail
  • Sigma-Aldrich

  • (43883)  Octamethylcyclotetrasiloxane  analytical standard

  • 556-67-2

  • 43883-100MG

  • 758.16CNY

  • Detail
  • Sigma-Aldrich

  • (PHR1565)  D4 Cyclomethicone  pharmaceutical secondary standard; traceable to USP

  • 556-67-2

  • PHR1565-500MG

  • 791.15CNY

  • Detail
  • USP

  • (1154707)  Cyclomethicone 4  United States Pharmacopeia (USP) Reference Standard

  • 556-67-2

  • 1154707-200MG

  • 13,501.80CNY

  • Detail
  • Aldrich

  • (235695)  Octamethylcyclotetrasiloxane  98%

  • 556-67-2

  • 235695-25G

  • 508.95CNY

  • Detail
  • Aldrich

  • (235695)  Octamethylcyclotetrasiloxane  98%

  • 556-67-2

  • 235695-100G

  • 1,267.11CNY

  • Detail

556-67-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name octamethylcyclotetrasiloxane

1.2 Other means of identification

Product number -
Other names Cyclotetrasiloxane, octamethyl-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Adhesives and sealant chemicals,CBI,Finishing agents,Intermediates,Solvents (which become part of product formulation or mixture)
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:556-67-2 SDS

556-67-2Synthetic route

2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
433725-45-2

2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

C

tetravinyltetramethylcyclotetrasiloxane

tetravinyltetramethylcyclotetrasiloxane

D

copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane

copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane

Conditions
ConditionsYield
With P4-t-Bu at 80℃; for 0.333333h; Further byproducts given;A n/a
B n/a
C n/a
D 80%
dimethyl sulfoxide
67-68-5

dimethyl sulfoxide

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

E

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane;A 79%
B 48%
C 35%
D 12%
E 5%
dimethyl sulfoxide
67-68-5

dimethyl sulfoxide

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With dimethylsilicon dichloride at 0℃; Further byproducts given;A 79%
B 48%
C 35%
D 5%
phenyltrimethylsilyl ether
1529-17-5

phenyltrimethylsilyl ether

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

dimethyl-diphenoxy-silane
3440-02-6

dimethyl-diphenoxy-silane

C

C13H26O3Si3
18406-79-6

C13H26O3Si3

D

C11H20O2Si2

C11H20O2Si2

Conditions
ConditionsYield
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts;A n/a
B 79%
C n/a
D n/a
bis(trimethylsilyl)ketene
19061-00-8

bis(trimethylsilyl)ketene

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

trimethylsilylacetylene
1066-54-2

trimethylsilylacetylene

Conditions
ConditionsYield
at 700℃; flash vacuum pyrolysis;A 22%
B 16%
C 76%
(trimethylsilyl)(dimethylsilyl)ketene
98991-82-3

(trimethylsilyl)(dimethylsilyl)ketene

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

trimethylsilylacetylene
1066-54-2

trimethylsilylacetylene

Conditions
ConditionsYield
at 700℃;A 22%
B 16%
C 76%
1-(1-Adamantyl)-2-diazo-2-(pentamethyldisilanyl)ethanone
87594-05-6

1-(1-Adamantyl)-2-diazo-2-(pentamethyldisilanyl)ethanone

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

1-(trimethylsilylethynyl)adamantane
82094-48-2

1-(trimethylsilylethynyl)adamantane

Conditions
ConditionsYield
at 400℃;A 21%
B 20%
C 73%
(benzylimino)triphenylphosphorane
52826-45-6

(benzylimino)triphenylphosphorane

3,3-dimethyl-6-oxa-3-silabicyclo<3.1.0>hexane
65181-02-4

3,3-dimethyl-6-oxa-3-silabicyclo<3.1.0>hexane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

2,2,4,4-tetramethyl-6-vinyl-1,3-dioxa-2,4-disilacyclohexane
113017-78-0

2,2,4,4-tetramethyl-6-vinyl-1,3-dioxa-2,4-disilacyclohexane

D

buta-1,3-diene
106-99-0

buta-1,3-diene

Conditions
ConditionsYield
at 130℃; for 1h;A n/a
B n/a
C 70%
D n/a
at 130℃; for 1h;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Conditions
ConditionsYield
With water Autoclave;A 63.7%
B 27.2%
With water In toluene at 20℃; for 27h;A 17 % Chromat.
B 38%
With water Autoclave;A 15.9%
B 17.4%
With water In toluene at 20℃; for 27h;A 4%
B 44 % Chromat.
With tetrabutylammonium tetrafluoroborate; oxygen In tetrahydrofuran Product distribution; Further Variations:; Reagents; amount of electricity; type of electrolysis cell; Electrochemical reaction;
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

1,2-silaoxetene 2,2-dimethyl-3-(trimethylsilyl)-4-adamantyl-1-oxa-2-silacyclobutene
88703-87-1

1,2-silaoxetene 2,2-dimethyl-3-(trimethylsilyl)-4-adamantyl-1-oxa-2-silacyclobutene

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

1-(trimethylsilylethynyl)adamantane
82094-48-2

1-(trimethylsilylethynyl)adamantane

Conditions
ConditionsYield
In benzene at 120℃;A 48%
B 62%
diallyl(dimethyl)silane
1113-12-8

diallyl(dimethyl)silane

Trifluoromethanesulfonamide
421-85-2

Trifluoromethanesulfonamide

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

3,7,9-tris(trifluoromethylsulfonyl)-3,7,9-triazabicyclo[3.3.1]nonane

3,7,9-tris(trifluoromethylsulfonyl)-3,7,9-triazabicyclo[3.3.1]nonane

C

N,N',N''-propane-1,2,3-triyltris(triflamide)

N,N',N''-propane-1,2,3-triyltris(triflamide)

Conditions
ConditionsYield
With tert-butylhypochlorite; sodium iodide In acetonitrile at -30℃; for 24h; Inert atmosphere; Darkness;A n/a
B 28%
C 61%
diiododimethylsilane
15576-81-5

diiododimethylsilane

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With 3,3-dimethyl-butan-2-one; zinc In dichloromethane for 0.166667h; Ambient temperature;A 60%
B 18%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

Tetradecamethylcycloheptasilan
13452-94-3

Tetradecamethylcycloheptasilan

C

decamethylcyclopentasilane
13452-92-1

decamethylcyclopentasilane

D

dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

Conditions
ConditionsYield
With tetrahydrofuran; lithium 0 deg C, 1 h, then 20-25 deg C, 2 h; Further byproducts given. Yields of byproduct given;A n/a
B n/a
C 60%
D n/a
With tetrahydrofuran; lithium 0 deg C, 1 h, then 20-25 deg C, 2 h; Further byproducts given. Yields of byproduct given;A n/a
B n/a
C n/a
D 60%
With tetrahydrofuran; lithium at -5 - 0℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h;A 60%
B 20%
C 15%
With water Autoclave;A 51.3%
B 29.2%
C 8%
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale;A n/a
B 43%
C n/a
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With dimethyl sulfoxide at 0℃; Further byproducts given;A 48%
B 35%
C 12%
D 5%
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given;
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given;
(allyl)(cyclopentadienyl)dimethylsilane
17306-11-5

(allyl)(cyclopentadienyl)dimethylsilane

benzaldehyde
100-52-7

benzaldehyde

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

6-phenylfulvene
7338-50-3

6-phenylfulvene

Conditions
ConditionsYield
A n/a
B n/a
C 47%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

E

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;;A n/a
B 0.5%
C 42%
D 6.7%
E 1.6%
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes;
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With water at 15 - 20℃; Autoclave;A 42%
B 6.7%
2,3-dimethyl-3,4-epoxy-1-butene
34485-82-0

2,3-dimethyl-3,4-epoxy-1-butene

dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

2,2,4,5-tetramethyl-1-oxa-2-silacyclohex-4-ene

2,2,4,5-tetramethyl-1-oxa-2-silacyclohex-4-ene

D

2,3-dimethyl-buta-1,3-diene
513-81-5

2,3-dimethyl-buta-1,3-diene

Conditions
ConditionsYield
at 0℃; Irradiation;A 3%
B 4%
C 38%
D 25%
tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

1,1-dimethyltetramethoxydisiloxane
84521-21-1

1,1-dimethyltetramethoxydisiloxane

Conditions
ConditionsYield
With dimethyl sulfoxide at 0℃;A n/a
B n/a
C 37%
epoxybutene
930-22-3

epoxybutene

dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

2,2-dimethyl-1-oxa-2-silacyclohex-4-ene

2,2-dimethyl-1-oxa-2-silacyclohex-4-ene

D

buta-1,3-diene
106-99-0

buta-1,3-diene

Conditions
ConditionsYield
at 0℃; Irradiation;A 3%
B 6%
C 15%
D 35%
benzophenone
119-61-9

benzophenone

(allyl)(cyclopentadienyl)dimethylsilane
17306-11-5

(allyl)(cyclopentadienyl)dimethylsilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

6,6-Diphenylfulvene
2175-90-8

6,6-Diphenylfulvene

Conditions
ConditionsYield
With quartz In benzene at 600℃;A n/a
B n/a
C 28%
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

1,1-dimethyl-1,3,3,3-tetraethoxydisiloxane
53201-01-7

1,1-dimethyl-1,3,3,3-tetraethoxydisiloxane

Conditions
ConditionsYield
With dimethyl sulfoxide at 0℃;A n/a
B n/a
C 28%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With iodine In dichloromethane for 0.333333h; Heating; Further byproducts given;A 14%
B 26%
C 21%
D 15%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

dodecamethylpentasiloxane
141-63-9

dodecamethylpentasiloxane

Conditions
ConditionsYield
With water In toluene at 20℃; for 27h; Further byproducts given;A n/a
B 22%
C n/a
D 10 % Chromat.
With water In toluene at 20℃; for 27h; Further byproducts given;A n/a
B 22 % Chromat.
C n/a
D 10%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

Conditions
ConditionsYield
With water In toluene at 20℃; for 27h; Further byproducts given;A n/a
B 22%
C n/a
D 6 % Chromat.
dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

octamethylcyclotetrasilane
38041-04-2

octamethylcyclotetrasilane

D

decamethylcyclopentasilane
13452-92-1

decamethylcyclopentasilane

Conditions
ConditionsYield
With sodium perchlorate In tetrahydrofuran Photolysis;A 73 % Chromat.
B 20%
C n/a
D n/a
1-trimethylsilyl-μ3-S,S'-ethylenedithiolatohexacarbonyldiiron

1-trimethylsilyl-μ3-S,S'-ethylenedithiolatohexacarbonyldiiron

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Conditions
ConditionsYield
In decane byproducts: H2S; Ar atmosphere; decompn. (165°C, 13 h); GLC, chromato-mass spectroscopy;A 15%
B 15%
C 15%
1-chloro-1,1,3,3,3-pentamethyldisiloxane
2943-62-6

1-chloro-1,1,3,3,3-pentamethyldisiloxane

A

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

1-chloroheptamethyltrisiloxane
18297-87-5

1-chloroheptamethyltrisiloxane

D

1-chloro-1,1,3,3,5,5,7,7,7-nonamethyltetrasiloxane
14415-31-7

1-chloro-1,1,3,3,5,5,7,7,7-nonamethyltetrasiloxane

Conditions
ConditionsYield
With sodium iodide In acetonitrile for 18h; Mechanism; Ambient temperature; other siloxanes; other reagent, var. temp.;A 14%
B 10%
C n/a
D n/a
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

Conditions
ConditionsYield
With aluminium(III) iodide at 140 - 170℃; for 5h;99%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane
1152310-87-6

1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane

C50H144N6O21Si22

C50H144N6O21Si22

Conditions
ConditionsYield
With trifluorormethanesulfonic acid at 60℃; for 13h;98%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

(dimethoxy)methylsilane
16881-77-9

(dimethoxy)methylsilane

C12H29N9O4Si3

C12H29N9O4Si3

C110H323N9O51Si52

C110H323N9O51Si52

Conditions
ConditionsYield
With trifluorormethanesulfonic acid at 20 - 60℃; for 15.25h;95%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

polyhydridomethylsiloxane

polyhydridomethylsiloxane

hydridomethyldimethylsiloxane copolymer

hydridomethyldimethylsiloxane copolymer

Conditions
ConditionsYield
With China clay; sulfuric acid at 100℃; for 120h;94.3%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C4H11N3O2Si

C4H11N3O2Si

C48H143N3O22Si23

C48H143N3O22Si23

Conditions
ConditionsYield
With trifluorormethanesulfonic acid at 20 - 60℃; for 15.25h;94%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
995-82-4

1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane

Conditions
ConditionsYield
With Kg-23 catalyst at 80℃; for 12h; Inert atmosphere;93%
With potassium hydroxide In water; toluene at 50℃; for 2h;72.9%
With sulfuric acid
With trimethylsilyl trifluoromethanesulfonate for 24h;
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

tetra(n-butyl)ammonium hydroxide
2052-49-5

tetra(n-butyl)ammonium hydroxide

C16H36N(1+)*C6H19O4Si3(1-)

C16H36N(1+)*C6H19O4Si3(1-)

Conditions
ConditionsYield
In methanol92%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

dimethylaluminum hydride
865-37-2

dimethylaluminum hydride

(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2
254763-44-5

(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2

Conditions
ConditionsYield
In hexane stirring (4 d); distn. (vac.);90%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

trimethylaluminum
75-24-1

trimethylaluminum

((CH3)2Al(OSi(CH3)3))2

((CH3)2Al(OSi(CH3)3))2

Conditions
ConditionsYield
mixed in a quarts tube; heated to 180°C for 24 h; pressure (28 psig); purified by vac. distillation; recrystd. (cold pentane, or vac. sublimation); elem. anal.;90%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,5-disodiumoxyhexamethyltrisiloxane

1,5-disodiumoxyhexamethyltrisiloxane

Conditions
ConditionsYield
With sodium hydroxide In methanol for 4h; Time; Reflux;90%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane
1152310-87-6

1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane

C30H84N6O11Si12

C30H84N6O11Si12

Conditions
ConditionsYield
With trifluorormethanesulfonic acid at 60℃; for 13h;90%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Polymer, Mn 580; Monomer(s): 1,3-divinyl-1,1,3,3-tetramethyldivinylsiloxane; octamethylcyclotetrasiloxane

Polymer, Mn 580; Monomer(s): 1,3-divinyl-1,1,3,3-tetramethyldivinylsiloxane; octamethylcyclotetrasiloxane

Conditions
ConditionsYield
With sulfuric acid at 20℃; for 4h;89%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C20H62O9Si10
33006-95-0

C20H62O9Si10

Conditions
ConditionsYield
With Kg-23 catalyst In toluene at 80℃; for 12h; Inert atmosphere;86%
With sulfuric acid
With trimethylsilyl trifluoromethanesulfonate for 24h;
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

(E)-But-2-enedioic acid mono-(3-{3-[3-((E)-3-carboxy-acryloyloxy)-propyl]-1,1,3,3-tetramethyl-disiloxanyl}-propyl) ester
88351-31-9

(E)-But-2-enedioic acid mono-(3-{3-[3-((E)-3-carboxy-acryloyloxy)-propyl]-1,1,3,3-tetramethyl-disiloxanyl}-propyl) ester

C34H78O17Si10

C34H78O17Si10

Conditions
ConditionsYield
With KU-23 ion-exchange resin at 90℃; for 7h;86%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

C

methyl iodide
74-88-4

methyl iodide

Conditions
ConditionsYield
With aluminium(III) iodide at 140 - 170℃; for 5h;A n/a
B 83.5%
C n/a
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

2,4,6,8-tetramethyl-2,4,6,8-tetravinyl-cyclotetrasiloxane
2554-06-5

2,4,6,8-tetramethyl-2,4,6,8-tetravinyl-cyclotetrasiloxane

2-vinyl-2,4,4,6,6-pentamethylcyclotrisiloxane
18395-32-9

2-vinyl-2,4,4,6,6-pentamethylcyclotrisiloxane

Conditions
ConditionsYield
With triphenylphosphine; potassium hydroxide at 95 - 145℃; for 2h; Temperature; Concentration; Reagent/catalyst; Autoclave;83.4%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,3-bis<3-chloropropyl>-1,1,3,3-tetramethyldisiloxane
18132-72-4

1,3-bis<3-chloropropyl>-1,1,3,3-tetramethyldisiloxane

α,ω-bis-(chloropropyl)-pentadimethylsiloxane

α,ω-bis-(chloropropyl)-pentadimethylsiloxane

Conditions
ConditionsYield
Purolite CT-175 at 100℃; for 17h;83%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

(E)-But-2-enedioic acid mono-(3-{3-[3-((E)-3-carboxy-acryloyloxy)-propyl]-1,1,3,3-tetramethyl-disiloxanyl}-propyl) ester
88351-31-9

(E)-But-2-enedioic acid mono-(3-{3-[3-((E)-3-carboxy-acryloyloxy)-propyl]-1,1,3,3-tetramethyl-disiloxanyl}-propyl) ester

C26H54O13Si6

C26H54O13Si6

Conditions
ConditionsYield
With KU-23 ion-exchange resin at 90℃; for 7h;82%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

bis<4-(methacryloyloxy)butyl>tetramethyldisiloxane
70877-11-1

bis<4-(methacryloyloxy)butyl>tetramethyldisiloxane

C60H158O25Si22

C60H158O25Si22

Conditions
ConditionsYield
With trifluorormethanesulfonic acid In chloroform at 25℃; for 24h;82%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,3-bis(3-(acryloxymethyl)phenylethyl)tetramethyldisiloxane

1,3-bis(3-(acryloxymethyl)phenylethyl)tetramethyldisiloxane

C68H158O25Si22

C68H158O25Si22

Conditions
ConditionsYield
With trifluorormethanesulfonic acid In chloroform at 25℃; for 24h;81.1%
1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane
18001-60-0

1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,3,3,5-tetramethyl-1,1,5,5-tetraethoxytrisiloxane

1,3,3,5-tetramethyl-1,1,5,5-tetraethoxytrisiloxane

Conditions
ConditionsYield
With potassium hydroxide at 145℃;81%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
995-82-4

1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane

Conditions
ConditionsYield
With water; sulfur dioxide Ambient temperature;78%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane
1152310-87-6

1,3-bis(3-azidopropyl)-1,1,3,3-tetramethyldisiloxane

C3H14O4Si3

C3H14O4Si3

C105H310N6O49Si50

C105H310N6O49Si50

Conditions
ConditionsYield
With trifluorormethanesulfonic acid at 20 - 80℃; for 20.25h;77%

556-67-2Relevant articles and documents

Andrianov et al.

, p. 1992,1996 (1968)

Hydrogenolysis of Polysilanes Catalyzed by Low-Valent Nickel Complexes

Comas-Vives, Aleix,Eiler, Frederik,Grützmacher, Hansj?rg,Pribanic, Bruno,Trincado, Monica,Vogt, Matthias

supporting information, p. 15603 - 15609 (2020/04/29)

The dehydrogenation of organosilanes (RxSiH4?x) under the formation of Si?Si bonds is an intensively investigated process leading to oligo- or polysilanes. The reverse reaction is little studied. To date, the hydrogenolysis of Si?Si bonds requires very harsh conditions and is very unselective, leading to multiple side products. Herein, we describe a new catalytic hydrogenation of oligo- and polysilanes that is highly selective and proceeds under mild conditions. New low-valent nickel hydride complexes are used as catalysts and secondary silanes, RR′SiH2, are obtained as products in high purity.

METHOD FOR PRODUCING SILOXANE OLIGOMER

-

Paragraph 0037; 0045, (2017/07/23)

PROBLEM TO BE SOLVED: To provide a production method capable of simply producing a siloxane oligomer in a high yield when producing a siloxane oligomer by hydrolysis of a silicon halide compound and to provide a production method capable of selectively producing a linear or cyclic siloxane oligomer in particular. SOLUTION: The siloxane oligomer can be efficiently produced without performing any special agitation by providing two electrospray nozzles to oppose to each other in a medium liquid and in the medium liquid, electrostatically spraying in an electric field a first liquid sample containing a silicon halide compound from one nozzle and electrostatically spraying in an electric field a second liquid sample containing water from the other nozzle and allowing the liquid samples to collide and fuse with each other. SELECTED DRAWING: None COPYRIGHT: (C)2017,JPO&INPIT

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