211501-3
Rousseau et al.
Appl. Phys. Lett. 86, 211501 ͑2005͒
sequence of n pulse periods is computed, starting from pure
N2/O2 air like mixture, followed by t=2 min. n is defined by
the ratio of the experimental residence time of the gas inside
the discharge tube 1.2 s to the period; t is the gas averaged
residence time between the discharge tube and the multipath
cell where infrared measurements are performed; ͑v͒ NO2
kinetics have not been included.
In the present study, tunable diode laser absorption spec-
troscopy has been performed downstream a pulsed low pres-
sure dc discharge in air, in order to measure simultaneously
the formation of NO and NO2 for various pulse durations and
repetition rates. It is shown that the NOx production depends
only on the pulse duty cycle ratio, which is proportional to
the pulse power. This is similar to recent measurements per-
formed downstream a pulsed microwave discharge near at-
mospheric pressure. NO density increases with DCR up to
about 1.2% for an averaged specific energy equal to 360 kJ/l.
A numerical computation, solving a set of 21 kinetic equa-
tions including some excited states of N2 and N, gives a very
good agreement with experimental results. NO formation is
Figure 2 also shows the good agreement between the
results of the numerical computation of the model presented
above and the experimental results for NO. This agreement
covers a wide range of pulse frequency and duration as well
as they NO density. NO molecules are formed and destroyed
mainly during the plasma pulse. The major process leading
to NO formation is the reaction between N*2͑A3⌺u+͒ molecules
and atomic oxygen O ͑reaction 11͒. In fact in this reaction
two NO molecules are created, because the excited N*͑2D͒
atoms, that are produced in reaction ͑11͒, collide with O2 to
produce another NO molecule in reaction ͑17͒. The destruc-
+
driven by the time averaged density of N*2͑A3⌺u ͒, which is
an increasing function of the DCR.
1B. Penetrante, M. Hsiao, B. Meritt, G. Vogtlin, and P. Wallman, IEEE
Trans. Plasma Sci. 23, 67 ͑1995͒.
1
−
tion of NO occurs by the collision with electrons, N ͑a ⌺ ͒
Ј
2
u
2F. Fresnet, G. Baravian, L. Magne, S. Pasquiers, C. Postel, V. Puech, and
A. Rousseau, Appl. Phys. Lett. 77, 4118 ͑2000͒.
molecules and O*͑1D͒ atoms ͑reactions 7, 15, and 20͒.
The physical reason for the dependency of the NOx on
the DCR may be summarized as follows. The rate of
3R. Dorai and M. Kushner, J. Phys. D 34, 574 ͑2001͒.
4Th. Hammer, Plasma Sources Sci. Technol. 11, 196 ͑2002͒.
5A. Rousseau, A. Dantier, L. Gatilova, Y. Ionikh, J. Röpcke, and Y. Tol-
machev, Plasma Sources Sci. Technol. 14, 70 ͑2005͒.
6B. F. Gordiets, C. M. Ferreira, V. L. Guerra, J. M. A. H. Loureiro, J.
Nahorny, D. Pagnon, M. Touzeau, and M. Vialle, IEEE Trans. Plasma Sci.
23, 750 ͑1995͒.
+
N*2͑A3⌺u ͒ molecules depends mostly on the electron density
͑process 1͒, which is constant during the pulse and equal to
zero after the pulse; thus the time average value of this rate is
proportional to the duty cycle ratio. The same is valid for NO
molecule destruction ͑processes 7, 15, and 20͒. The destruc-
7S. A. Smirnov, V. V. Rybkin, I. V. Kholodov, and V. A. Titov, High Temp.
40, 323 ͑2002͒.
+
tion of the N*2͑A3⌺u ͒ excited state goes via the collision
with O2 and O ͑processes 10 and 11͒, where the time aver-
aged O atom density depends only on the DCR for a given
pulse amplitude; as a result NO concentration depends only
on the DCR and shows some saturation effect for high DCR
corresponding to a high O atom density.
NO2 kinetics were not included in the kinetic modeling;
its density is much lower than the NO density for DCR
Ͼ1%. NO2 is formed downstream the plasma region via oxi-
dation of NO by ozone:
8J. B. McManus, D. Nelson, M. Zahniser, L. Mechold, M. Osiac, J.
Röpcke, and A. Rousseau, Rev. Sci. Instrum. 74, 2709 ͑2003͒.
9Y. P. Raizer, Gas Discharge Physics ͑Springer, Berlin, 1991͒.
10N. A. Dyatko, I. V. Kochetov, and A. P. Napartovich, J. Phys. D 26, 418
͑1993͒.
11J. Nahorny, C. M. Ferreira, B. Gordiets, D. Pagnon, M. Touzeau, and M.
Vialle, J. Phys. D 28, 738 ͑1995͒.
12J. T. Herron, J. Phys. Chem. Ref. Data 28, 1453 ͑1999͒.
13I. A. Kossyi, A. Yu. Kostonsky, A. A. Matveev, and V. P. Silakov, Plasma
Sources Sci. Technol. 1, 207 ͑1992͒.
O3 + NO → NO2 + O2,
where the O3 density is strongly reduced with increasing gas
temperature above 300 K. This would explain why the NO2
production decreases with increasing DCR.
14R. Atkinson, D. L. Baulch, R. A. Cox, R. F. Hampson, J. A. Kerr, and J.
Troe, J. Phys. Chem. Ref. Data 18, 881 ͑1989͒.
129.22.67.107 On: Sat, 22 Nov 2014 18:15:58