Published on Web 03/30/2006
Role of Interstitial Voids in Oxides on Formation and
Stabilization of Reactive Radicals: Interstitial HO
2
Radicals in
F
-Laser-Irradiated Amorphous SiO
2 2
†
‡
Koichi Kajihara,* Masahiro Hirano, Linards Skuja, and Hideo Hosono
Contribution from the Transparent Electro-ActiVe Materials Project, ERATO-SORST, Japan
Science and Technology Agency, Frontier CollaboratiVe Research Center, Mail Box S2-13,
Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
•
2
Abstract: A procedure to produce stable hydroperoxy radicals (HO ) in bulk amorphous SiO
2
(a-SiO
2
) has
been developed. Oxygen molecules incorporated in the interstitial voids in a-SiO
2
react with mobile hydrogen
0
atoms (H ) generated by the photolysis of silanol (SiOH) groups with F
2
-laser light (λ ) 157 nm, hν ) 7.9
•
2
•
eV), resulting in the efficient creation of interstitial HO . The high yield of HO suggests that the collisions
2
of the reaction intermediate with the void wall play an important role in dissipating the excess energy of the
•
2
intermediate instead of the triple collision observed in the gas phase reaction. The resultant HO is
thermally stable up to 100 °C.
-
3
1
. Introduction
O-Si bond network because of its low density (2.2 g cm ) in
comparison to the related crystalline form of SiO2 (R-quartz,
•
-
•-
Reactive oxygen species such as O , O2 (superoxide ion
-3
2
.62 g cm ) and other light metal oxides of analogous formular
weight, such as MgO (3.6 g cm ) and Al2O3 (3.97 g cm ).
•
-
radical), and O3 (ozonide ion radical) are important oxidants
in the catalytic oxidation of various organic compounds
-
3
-3
•
1,2
•
The interstitial voids in a-SiO2 often encapsulate small
molecules and radical fragments. For example, the hydrogen
atom (H ), which is one of the most reactive radicals, is
Various molecular
radicals such as HCO , NO , and ClO (x ) 0, 2, 3)
have been formed in a-SiO2 exposed to energetic radiation, such
as X-rays, γ-rays, or ultraviolet laser light. Such small chemical
species can migrate through the interstitial voids in a-SiO2:
hydrogen molecules (H2) diffuse rapidly even at room temper-
ature (average diffusion length ∼10-100 nm in 1 s). Thus,
interstitial voids having entrances to the outer surfaces may be
accessible for small reactive species to influence reactions
catalyzed by a-SiO2.
(
(
denotes an unpaired electron). Their conjugate acids, HO
•
2
•
3
hydroxyl radical), HO (hydroperoxy radical), and HO (hy-
0
drogen trioxide radical), also act as key intermediates in
reactions in acidic solutions or protonic solvents. In actual
9
-13
3
immobilized in a-SiO2 below ∼100 K.
•
14
• 15
•
x
16,17
catalytic reactions, their formation and reactivity are controlled
by various catalysts such as metals, metal oxides, zeolites, metal
complexes, and their hybrids. Among these, catalytic activity
of amorphous SiO2 (a-SiO2), which is often regarded as inert,
has attracted particular interest due to its thermal and chemical
stabilities. It is considered that the main origin of the catalytic
activity of a-SiO2 is nano- and mesopores, which are formed
intentionally and are abundantly present in mesoporous silicas
2
18
4-8
4
-6
and silica gels.
However, besides these “extrinsic” pores,
In this study, we report a novel process for the formation of
a-SiO2 contains a lot of “intrinsic” interstitial voids in the Si-
interstitial HO• in a-SiO2, which contains both interstitial
2
†
Current address: Institute of Solid State Physics, University of Latvia,
oxygen molecules (O2) and silanol (SiOH) groups. Bulk a-SiO2
was used to selectively observe reactions among interstitial
Kengaraga iela 8, LV1063 Riga, Latvia.
‡
Current address: Materials and Structures Laboratory & Frontier
Collaborative Research Center, Tokyo Institute of Technology, 4259
Nagatsuta, Midori-ku, Yokohama 226-8503, Japan.
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J. AM. CHEM. SOC. 2006, 128, 5371-5374
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