Hexamethyldisilazane

Base Information

• Chemical Name: Hexamethyldisilazane
• CAS No.: 999-97-3
• Deprecated CAS: 103737-28-6,127290-38-4,18186-75-9,761458-30-4,116638-29-0,116638-29-0,18186-75-9,761458-30-4
• Molecular Formula: C6H19NSi2
• Molecular Weight: 161.395
• Hs Code.: Oral rat LD50: 850 mg/kg
• European Community (EC) Number: 213-668-5
• NSC Number: 252161,93895
• UN Number: 2924,2920
• UNII: H36C68P1BH
• DSSTox Substance ID: DTXSID2025395
• Nikkaji Number: J7.217F
• Wikipedia: Bis(trimethylsilyl)amine
• Wikidata: Q425001
• ChEMBL ID: CHEMBL3183662
• Mol file: 999-97-3.mol

Synonyms:hexamethyldisilazane;hexamethylsilazane;hexamethylsilazane, aluminum salt;hexamethylsilazane, beryllium salt;hexamethylsilazane, cadmium salt;hexamethylsilazane, cerium (+3) salt;hexamethylsilazane, chromium (3+) salt;hexamethylsilazane, cobalt (2+) salt;hexamethylsilazane, europium (3+) salt;hexamethylsilazane, gadolinium (3+) salt;hexamethylsilazane, gallium salt;hexamethylsilazane, germanium (2+) salt;hexamethylsilazane, holmium (3+) salt;hexamethylsilazane, indium (3+) salt;hexamethylsilazane, iron (3+) salt;hexamethylsilazane, lanthanum (3+) salt;hexamethylsilazane, lead (2+) salt;hexamethylsilazane, lithium salt;hexamethylsilazane, lutetium (3+) salt;hexamethylsilazane, magnesium salt;hexamethylsilazane, manganese (2+) salt;hexamethylsilazane, mercury (2+) salt;hexamethylsilazane, neodymium (3+) salt;hexamethylsilazane, potassium salt;hexamethylsilazane, praseodymium (3+) salt;hexamethylsilazane, samarium (3+) salt;hexamethylsilazane, scandium (3+) salt;hexamethylsilazane, silanamine-(15)N-labeled;hexamethylsilazane, sodium salt;hexamethylsilazane, thallium (3+) salt;hexamethylsilazane, tin (2+) salt;hexamethylsilazane, titanium (3+) salt;hexamethylsilazane, uranium (3+) (3:1) salt;hexamethylsilazane, vanadium (3+) salt;hexamethylsilazane, ytterbium (3+) salt;hexamethylsilazane, yttrium (3+) salt;hexamethylsilazane, zinc salt;N-lithiohexamethyldisilazane;sodium hexamethyldisilazide

Chemical Property of Hexamethyldisilazane

Chemical Property:

• Appearance/Colour: colourless liquid
• Vapor Pressure: 20 hPa (20 °C)
• Melting Point: -78 °C
• Refractive Index: 1.4069 - 1.4089
• Boiling Point: 126 °C at 760 mmHg
• PKA: 30(at 25℃)
• Flash Point: 30 °C
• PSA: 12.03000
• Density: 0.776 g/cm³
• LogP: 2.63670
• Storage Temp.: 2-8°C
• Sensitive.: Moisture Sensitive
• Solubility.: Miscible with acetone, benzene, ethyl ether, heptane and perchlo
• Water Solubility.: REACTS
• Hydrogen Bond Donor Count: 1
• Hydrogen Bond Acceptor Count: 1
• Rotatable Bond Count: 2
• Exact Mass: 161.10560268
• Heavy Atom Count: 9
• Complexity: 76.2
• Transport DOT Label: Flammable Liquid Corrosive

Purity/Quality:

99%, ^*data from raw suppliers

Hexamethyldisilazane ^*data from reagent suppliers

Safty Information:

• Pictogram(s): Xn; F; C
• Hazard Codes: F,C,Xn
• Statements: 11-20/21/22-34-52/53
• Safety Statements: 16-26-36/37/39-45-61

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Chemical Classes: Metals -> Metalloid Compounds (Silicon)
• Canonical SMILES: C[Si](C)(C)N[Si](C)(C)C
• Description: Hexamethyldisilazane is a bulk organo silicon compound, being a quite useful silanizing agent. It is a reagent for the preparation of trimethylsilyl derivatives. It can be used for silanizing the surface of silicon water, cellulose. It can also be used to dehydrate cells of biomaterials for scanning electron microscopy (SEM). The hexamethyldisilazane coatings on various nanoparticles make them be resistant to water contamination and flocculation during synthesis. It can also be used as a modifier to control the shape, formation of agglomerates surface area and pore size of silica particles. Moreover, it is an adhesion promoter for photoresist in photolithography, and is also useful in the pyrolysis-gas chromatography-mass spectrometry to enhance the detectability of compounds with polar functional groups.
• Physical properties: Colorless transparent and easy flowing liquid. Boiling point 125℃, relative density 0.76 (20/4℃). Soluble in organic solvents, it will be rapidly hydrolyzed in contact with air to form trimethylsilanol and hexamethyldisilyl ether.
• Uses: Deactivation of chromatographic support materials. In electronic industry as an adhesion promoter for photoresists on silicon. Hexamethyldisilazane mainly used as methyl silane alkylation (such as amikacin, penicillin, cephalosporins and kinds of penicillin derivatives), hydroxyl protectants of antibiotics. It is used as surface treatment agent of diatomite, white carbon black, titanium and blond additives of photoresist in the semiconductor industry. It is used as treatment agent of tearing strength resistance. It is used as a solvent in organic synthesis and organometallic chemistry. It is used as an adhesion promoter for photoresist in photolithography. it is used for the preparation of trimethylsilyl ethers from hydroxy compounds. It is used as an alternative to critical point drying during sample preparation in electron microscopy. It is added to analyte to get silylated diagnostic products during pyrolysis in gas chromatography- mass spectrometry. A reagent for the preparation of trimethylsilyl derivatives.

Technology Process of Hexamethyldisilazane

There total 178 articles about Hexamethyldisilazane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 100.0%

bis[bis(trimethylsilyl)amido][[(trimethylsilyl)methyl]stannyl]praseodymium*0.5(dimethoxyethane) → chloro-trimethyl-silane (75-77-4) + hydrogen (1333-74-0) + praseodymium(III) chloride (10361-79-2) + Chlor-tris<(trimethylsilyl)methyl>zinn (34570-67-7) + 1,1,1,3,3,3-hexamethyl-disilazane (999-97-3)

Guidance literature:

With hydrogenchloride; In tetrahydrofuran; mixt. od dry HCl (excess), Pr/Sn-complex and THF keeping dor 1 d at room temp., THF replacing by hexane in usual way; ppt. filtration of, hexane-soln. evapn. (vac.), residue crystn. twice (hexane, -70°C), GLC of volatiles;

Reference yield: 31.0%

N-bromobis(trimethylsilyl)amine (758-44-1) + trimethyl(phenethyloxy)silane (14629-58-4) → trimethylsilyl bromide (2857-97-8) + Hexamethyldisiloxane (107-46-0) + Me3SiOCH(Br)CH2Ph + trimethyl(2-bromo-2-phenylethoxy)silane (50901-16-1) + 1,1,1,3,3,3-hexamethyl-disilazane (999-97-3)

Guidance literature:

for 6h; UV -irradiation;

DOI:10.1134/S1070363210050117

Reference yield: 19.0%

ethanol (64-17-5) + potassium hexamethylsilazane (40949-94-8) → 1,1,1,3,3,3-hexamethyl-disilazane (999-97-3) + butan-1-ol (71-36-3)

Guidance literature:

With [HN-(CH₂CH₂PⁱPr₂)₂]Mn(CO)₂Br; at 150 ℃; for 24h; Schlenk technique;

DOI:10.1021/acscatal.7b03653

upstream raw materials:

chloro-trimethyl-silane

bis(trimethylsilyl)sulphate

tetrahydrofuran

methanol

Downstream raw materials:

2,2,7,7-tetramethyl-3,6-dioxa-2,7-disilaoctane

N-trimethylsilylphenethylamine

trimethyl(butyl-amino)silane

allylamino-trimethyl-silane

Refernces

• 1、 Yogendra, Sivathmeehan,Weyhermüller, Thomas,Hahn, Anselm W.,Debeer, Serena. "From Ylides to Doubly Yldiide-Bridged Iron(II) High Spin Dimers via Self-Protolysis". . p. 9358 - 9367. Retrieved 2019.
• 2、 Izmailov,Qi, Shisheng,Markova,Vasnev. "Ammonolysis of boron-substituted chlorosilylmethyl ortho-carborane derivatives". . p. 2338 - 2342. Retrieved 2014.
• 3、 Takebayashi, Satoshi,Fayzullin, Robert R.. "Isolation and Reactivity Study of a Model 17-Electron Species in the Oxo Process". supporting information. p. 500 - 507. Retrieved 2021/02/05.
• 4、 -. "METHOD FOR PREPARING HYDROGEN BIS(FLUOROSULFONYL)IMIDE AND METHOD FOR PREPARING LITHIUM BIS(FLUOROSULFONYL)IMIDE". Paragraph 0051. . Retrieved 2020/06/07.