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Triethoxysilane, with the chemical formula HSi(OC2H5)3, is an organosilicon compound that exists as a colorless liquid. It is primarily utilized in precious metal-catalyzed hydrosilylation reactions, where the triethoxysilyl groups formed are highly valued for their ability to attach to silica surfaces. Despite having Si-H bonds, triethoxysilane demonstrates relatively low reactivity compared to most compounds with similar bonds. As a silyl ether, it is also prone to hydrolysis. Furthermore, it serves as a reducing agent in various chemical reactions, such as the reduction of amides and carbonyl compounds, as well as in Cu-catalyzed reductive hydroxymethylation of styrenes and Rh-catalyzed hydrodediazoniation.

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  • 998-30-1 Structure
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    1. Product Name: Triethoxysilane
    2. Synonyms: CT2500;triethoxy-silan;Triethoxysilane ((C2H5O)3SiH);Triethoxysilicane;TRIETHOXYSILANE;Triethoxysilane,96%;Triethoxysilaneelectronicgradeavailable;Silane, triethoxy-
    3. CAS NO:998-30-1
    4. Molecular Formula: C6H16O3Si
    5. Molecular Weight: 164.27
    6. EINECS: 213-650-7
    7. Product Categories: Si (Classes of Silicon Compounds);Si-H Compounds;Si-O Compounds;Trialkoxysilanes;Alkoxy Silanes;Hydrogensilanes Hydrogensiloxanes;Reducing Agents;OthersSilsesquioxanes: POSS? Nanohybrids;RSi(OR)3Organometallic Reagents;Organometallic Reagents;Organosilicon;POSS? Precursors and Intermediates
    8. Mol File: 998-30-1.mol
  • Chemical Properties

    1. Melting Point: -170°C
    2. Boiling Point: 134-135 °C(lit.)
    3. Flash Point: 80 °F
    4. Appearance: colourless liquid
    5. Density: 0.89 g/mL at 25 °C(lit.)
    6. Vapor Pressure: 9.21hPa at 20℃
    7. Refractive Index: n20/D 1.377(lit.)
    8. Storage Temp.: Store at 0-5°C
    9. Solubility: sol diethyl ether, THF, alkanes, aromatic and chlorinated solvents.
    10. Water Solubility: Insoluble in water. Soluble in organic solvents.
    11. Sensitive: Moisture Sensitive
    12. Stability: Stable, but moisture sensitive. Flammable. Incompatible with strong oxidizing agents, strong acids, strong bases.
    13. BRN: 1738989
    14. CAS DataBase Reference: Triethoxysilane(CAS DataBase Reference)
    15. NIST Chemistry Reference: Triethoxysilane(998-30-1)
    16. EPA Substance Registry System: Triethoxysilane(998-30-1)
  • Safety Data

    1. Hazard Codes: T+,C,T
    2. Statements: 10-26-34-23/24/25
    3. Safety Statements: 26-28-36/37/39-45
    4. RIDADR: UN 3384 6.1/PG 1
    5. WGK Germany: 3
    6. RTECS: VV6682000
    7. F: 10-21
    8. TSCA: Yes
    9. HazardClass: 6.1
    10. PackingGroup: II
    11. Hazardous Substances Data: 998-30-1(Hazardous Substances Data)

998-30-1 Usage

Uses

Used in Chemical Synthesis:
Triethoxysilane is used as a reagent in the hydrosilylation of carbon-carbon multiple bonds, a process that is essential for the synthesis of various organic compounds.
Used in Metal-Catalyzed Hydrosilylation Reactions:
In this application, triethoxysilane acts as a reducing agent for carbonyl groups, facilitating the reduction process in the presence of metal catalysts.
Used in Surface Modification:
Triethoxysilane is used for attaching to silica surfaces, which is beneficial for modifying the properties of materials and creating functional coatings or films.

Air & Water Reactions

May become pyrophoric, by generation of silane

Reactivity Profile

Triethoxysilane has been involved in cases where Triethoxysilane has disproportionated, generating silane (SiH4) which has a history of being pyrophoric.

Health Hazard

Toxicity is similar to silanes. Silanes are moderately irritating to skin, eyes, and mucous membranes. Silane compounds are toxic.

Fire Hazard

When heated to decomposition, Triethoxysilane emits acrid smoke and fumes.

Flammability and Explosibility

Highlyflammable

Safety Profile

Poison by intravenous route.Moderately toxic by inhalation. Flammable liquid. Whenheated to decomposition it emits acrid smoke andirritating fumes.

Purification Methods

Fractionate it using a column packed with glass helices of ca 15 theoretical plates in an inert atmosphere. Store it in aliquots in sealed ampoules because it is sensitive to moisture. [Spauschus et al. J Am Chem Soc 72 1377 1950, MacKenzie et al. J Am Chem Soc 72 2032 1950, Havill et al. J Org Chem 13 280 1948, Beilstein 1 IV 1359.]

Check Digit Verification of cas no

The CAS Registry Mumber 998-30-1 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 9,9 and 8 respectively; the second part has 2 digits, 3 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 998-30:
(5*9)+(4*9)+(3*8)+(2*3)+(1*0)=111
111 % 10 = 1
So 998-30-1 is a valid CAS Registry Number.
InChI:InChI=1/C6H15O3Si/c1-4-7-10(8-5-2)9-6-3/h4-6H2,1-3H3

998-30-1 Well-known Company Product Price

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  • Alfa Aesar

  • (B22063)  Triethoxysilane, 96%   

  • 998-30-1

  • 10g

  • 306.0CNY

  • Detail
  • Alfa Aesar

  • (B22063)  Triethoxysilane, 96%   

  • 998-30-1

  • 50g

  • 859.0CNY

  • Detail
  • Alfa Aesar

  • (B22063)  Triethoxysilane, 96%   

  • 998-30-1

  • 250g

  • 3643.0CNY

  • Detail

998-30-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Triethoxysilane

1.2 Other means of identification

Product number -
Other names Silane, triethoxy-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:998-30-1 SDS

998-30-1Synthetic route

ethanol
64-17-5

ethanol

silicon
7440-21-3

silicon

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With sebaconitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 14h; Product distribution / selectivity;A 3.32%
B 95.7%
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 14 - 21h; Product distribution / selectivity;A 3.45%
B 94.18%
With hexanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 14h; Product distribution / selectivity;A 5.26%
B 93.38%
ethanol
64-17-5

ethanol

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With trichlorosilane at 80℃; for 6h; Temperature;86%
With trichlorosilane; N,N-dimethyl-aniline; benzene
With trichlorosilane
With trichlorosilane; N,N-diethylaniline
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trichlorosilane
10025-78-2

trichlorosilane

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
84%
84%
methanol
67-56-1

methanol

C21H29NO3S

C21H29NO3S

2-bromoallyl bromide
513-31-5

2-bromoallyl bromide

A

Triethoxysilane
998-30-1

Triethoxysilane

B

C20H24BrNO2

C20H24BrNO2

Conditions
ConditionsYield
Stage #1: methanol; C21H29NO3S With hydrogenchloride In 1,4-dioxane at 0 - 23℃; for 1h; Inert atmosphere; Schlenk technique;
Stage #2: 2-bromoallyl bromide With N-ethyl-N,N-diisopropylamine In acetonitrile at 23 - 80℃; for 12h; Inert atmosphere; Schlenk technique;
A 26%
B 54%
trichlorosilane
10025-78-2

trichlorosilane

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With C2H5OH In benzene byproducts: HCl;45%
With ethanol byproducts: HCl;
With C2H5OH byproducts: HCl;
ethanol
64-17-5

ethanol

ethene
74-85-1

ethene

A

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

B

ethyldiethoxysilane
13175-88-7

ethyldiethoxysilane

C

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With silicon at 240℃;A n/a
B 13%
C n/a
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With Y(3+)*2C12H21Si(1-)*H(1-)*C4H8O; 4,4,5,5-tetramethyl-[1,3,2]-dioxaboralane In benzene-d6 at 80℃; for 20h;12%
With hydrogen under 110 Torr; for 5h;
ethanol
64-17-5

ethanol

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With trichlorosilane; benzene at 0℃;
With copper(l) chloride; silicon at 242℃;A 105 g
B 1635 g
With copper(l) chloride; silicon at 242℃; Concentration; Time; Large scale;A 141 g
B 3380 g
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With trichlorosilane
orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With trichlorosilane
ethanol
64-17-5

ethanol

butoxy-dichloro-silane
18169-90-9

butoxy-dichloro-silane

benzene
71-43-2

benzene

A

Triethoxysilane
998-30-1

Triethoxysilane

B

di(ethoxy)(butoxy)silane
18236-16-3

di(ethoxy)(butoxy)silane

C

(ethoxy)di(butoxy)silane
17980-44-8

(ethoxy)di(butoxy)silane

Conditions
ConditionsYield
at 0℃; dann bei Siedetemperatur;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

triisobutylaluminum
100-99-2

triisobutylaluminum

A

Triethoxysilane
998-30-1

Triethoxysilane

B

triethoxyisobutoxysilane

triethoxyisobutoxysilane

C

diisobutylaluminumethoxide

diisobutylaluminumethoxide

Conditions
ConditionsYield
In toluene at 110 - 114℃; for 2h; Product distribution; other temperature (25-30 and 50-75 deg C), or without solvent;
ethanol
64-17-5

ethanol

trichlorosilane
10025-78-2

trichlorosilane

benzene
71-43-2

benzene

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
at 20℃;
ethanol
64-17-5

ethanol

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

diethoxysilane
18165-68-9

diethoxysilane

C

ethyldiethoxysilane
13175-88-7

ethyldiethoxysilane

D

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With thiophene; copper(l) chloride; silicon at 339.85℃; under 607.549 Torr; Further byproducts given;A 3 % Chromat.
B 4 % Chromat.
C 14 % Chromat.
D 75 % Chromat.
ethanol
64-17-5

ethanol

silicon
7440-21-3

silicon

A

diethyl acetal
105-57-7

diethyl acetal

B

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

C

Triethoxysilane
998-30-1

Triethoxysilane

D

acetaldehyde
75-07-0

acetaldehyde

Conditions
ConditionsYield
With FS1265; SAG 47; copper(II) hydroxide In THERMINOL 59 at 220℃; Product distribution / selectivity;
ethanol
64-17-5

ethanol

silicon
7440-21-3

silicon

A

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

B

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

C

diethoxysilane
18165-68-9

diethoxysilane

D

ethyldiethoxysilane
13175-88-7

ethyldiethoxysilane

E

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With copper(I) cyanide; copper(I) oxide In THERMINOL 59 at 200℃; for 16 - 18h; Product distribution / selectivity;
With copper(I) cyanide; undecyl cyanide; copper(I) oxide In THERMINOL 59 at 200℃; for 15h; Product distribution / selectivity;
With copper(I) cyanide; copper(I) oxide In THERMINOL 59 at 200℃; for 20h; Product distribution / selectivity;
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 15h; Product distribution / selectivity; hydrogen atmosphere;
ethanol
64-17-5

ethanol

silicon
7440-21-3

silicon

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

diethoxysilane
18165-68-9

diethoxysilane

C

ethyldiethoxysilane
13175-88-7

ethyldiethoxysilane

D

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 16h; Product distribution / selectivity; Nitrogen atmosphere;
With octanedinitrile; copper(I) oxide In NALKYLENE 500 at 200℃; for 19h; Product distribution / selectivity; hydrogen atmosphere;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

argon

argon

Triethoxysilane
998-30-1

Triethoxysilane

ethanol
64-17-5

ethanol

trichlorosilane
10025-78-2

trichlorosilane

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
In neat (no solvent) dropwise addition of ethanol to SiHCl3; heating;; distillation;;
trimethyl-silanyl-ammonium; chloride
18236-12-9

trimethyl-silanyl-ammonium; chloride

A

methylmethoxy silane
18165-31-6

methylmethoxy silane

B

diethoxysilane
18165-68-9

diethoxysilane

C

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With ethanol
With C2H5OH
ethanol
64-17-5

ethanol

silicon
7440-21-3

silicon

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
copper(I) oxide; copper; copper(l) chloride In Marlotherm SH at 190℃; for 3.41667 - 3.45h; Product distribution / selectivity; Microwave irradiation;
copper(l) chloride In Marlotherm SH at 190℃; for 3.43333 - 3.51667h; Product distribution / selectivity; Microwave irradiation;
ethanol
64-17-5

ethanol

A

chlorodiethoxysilane
6485-91-2

chlorodiethoxysilane

B

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With trichlorosilane In hexane at 0℃; Inert atmosphere;
perfluoropropylene
116-15-4

perfluoropropylene

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
In diethylene glycol dimethyl ether at -70℃; for 1h; Catalytic behavior; Solvent; Inert atmosphere; Schlenk technique;
2,3,4,5,6-pentafluorotoluene
771-56-2

2,3,4,5,6-pentafluorotoluene

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
In diethylene glycol dimethyl ether at 110℃; for 72h; Catalytic behavior; Solvent; Inert atmosphere; Schlenk technique;
ethanol
64-17-5

ethanol

1,1,3,3-tetraethoxy-disiloxane
15417-65-9

1,1,3,3-tetraethoxy-disiloxane

Triethoxysilane
998-30-1

Triethoxysilane

Conditions
ConditionsYield
With potassium hydroxide at 240℃; for 3h; Autoclave; Molecular sieve;
1-hexene
592-41-6

1-hexene

Triethoxysilane
998-30-1

Triethoxysilane

hexyltriethoxysilane
18166-37-5

hexyltriethoxysilane

Conditions
ConditionsYield
at 90℃; for 5h; Inert atmosphere;100%
at 90℃; for 5h; Inert atmosphere;100%
With platinum on carbon nanotubes In neat (no solvent) at 20℃; for 24h;98%
oct-1-ene
111-66-0

oct-1-ene

Triethoxysilane
998-30-1

Triethoxysilane

triethoxy(octyl)silane
2943-75-1

triethoxy(octyl)silane

Conditions
ConditionsYield
at 90℃; for 5h; Inert atmosphere;100%
at 90℃; for 5h; Inert atmosphere;100%
With graphene nanoplates-supported platinum nanoparticles In neat (no solvent) at 80℃; for 2h; Catalytic behavior;99%
Triethoxysilane
998-30-1

Triethoxysilane

phenylacetylene
536-74-3

phenylacetylene

(E)-styryl(triethoxy)silane
65119-09-7

(E)-styryl(triethoxy)silane

Conditions
ConditionsYield
With C34H39N3O2Rh(1+)*BF4(1-) In dichloromethane-d2 at 60℃; for 4h; Inert atmosphere; Glovebox; stereoselective reaction;100%
With 2-dicyclohexyl-phosphino-2',4',6'-triisopropylbiphenyl; platinum(IV) oxide In tetrahydrofuran at 60℃; for 1h;72%
With C24H23ClCrIrNO3 In 1,1,2,2-tetrachloroethane at 100℃; for 24h; Catalytic behavior; Inert atmosphere; Schlenk technique; regioselective reaction;63%
1-Heptene
592-76-7

1-Heptene

Triethoxysilane
998-30-1

Triethoxysilane

1-triethoxysilylheptane
41966-95-4

1-triethoxysilylheptane

Conditions
ConditionsYield
at 90℃; for 5h; Inert atmosphere;100%
at 90℃; for 5h; Inert atmosphere;100%
With dihydrogen hexachloroplatinate; 7,8-dicarba-nido-undecaborate(1-) at 20℃; for 24h; Product distribution; other reaction time, various catalyst composition;78%
1-(2-bromo-2-methyl)propionyloxy-5-hexene

1-(2-bromo-2-methyl)propionyloxy-5-hexene

Triethoxysilane
998-30-1

Triethoxysilane

(2-bromo-2-methyl)propionyloxyhexyltriethoxysilane

(2-bromo-2-methyl)propionyloxyhexyltriethoxysilane

Conditions
ConditionsYield
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex In toluene for 12h;100%
chloroplatinic acid 1,1,3,3-tetramethyl-1,3-divinyldisiloxane complex at 20℃; for 4h;38%
poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(5-hexenyloxy)-1,4-phenylenevinylene], Mn = 17000 Da

poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(5-hexenyloxy)-1,4-phenylenevinylene], Mn = 17000 Da

Triethoxysilane
998-30-1

Triethoxysilane

poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(6-triethoxysilylhexyloxy)-1,4-phenylenevinylene], Mn = 17000 Da

poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-phenylenevinylene-co-2,5-bis(6-triethoxysilylhexyloxy)-1,4-phenylenevinylene], Mn = 17000 Da

Conditions
ConditionsYield
dihydrogen hexachloroplatinate In dichloromethane for 60h; Heating;100%
Triethoxysilane
998-30-1

Triethoxysilane

tris(4-iodophenyl)amine
4181-20-8

tris(4-iodophenyl)amine

tris(4-triethoxysilylphenyl)amine
930798-86-0

tris(4-triethoxysilylphenyl)amine

Conditions
ConditionsYield
With tetra-(n-butyl)ammonium iodide; triethylamine; bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate In N,N-dimethyl-formamide at 80℃; for 1h;100%
With methyl-triphenylphosphonium iodide; triethylamine; bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate In N,N-dimethyl-formamide at 80℃; for 1h;100%
Triethoxysilane
998-30-1

Triethoxysilane

C102H146OSi
1105562-02-4

C102H146OSi

C108H162O4Si2
1105561-86-1

C108H162O4Si2

Conditions
ConditionsYield
Stage #1: C102H146OSi With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 0.166667h; Inert atmosphere;
Stage #2: Triethoxysilane In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 1h; Inert atmosphere;
100%
Triethoxysilane
998-30-1

Triethoxysilane

C122H150O2
1105561-84-9

C122H150O2

C128H166O5Si
1105561-82-7

C128H166O5Si

Conditions
ConditionsYield
Stage #1: C122H150O2 With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 0.166667h; Inert atmosphere;
Stage #2: Triethoxysilane In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 1h; Inert atmosphere;
100%
Triethoxysilane
998-30-1

Triethoxysilane

10-(4-(10-undecenyloxy)phenyl)ethynyl-9-anthraldehyde
1105561-90-7

10-(4-(10-undecenyloxy)phenyl)ethynyl-9-anthraldehyde

10-(4-(11-(triethoxysilyl)undecyloxy)phenyl)ethynyl-9-anthraldehyde
1105561-88-3

10-(4-(11-(triethoxysilyl)undecyloxy)phenyl)ethynyl-9-anthraldehyde

Conditions
ConditionsYield
Stage #1: 10-(4-(10-undecenyloxy)phenyl)ethynyl-9-anthraldehyde With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 0.166667h; Inert atmosphere;
Stage #2: Triethoxysilane In 2,2-Dimethyl-1-oxa-2-silacyclohexan; toluene at 20℃; for 1h; Inert atmosphere;
100%
Triethoxysilane
998-30-1

Triethoxysilane

tris(trimethylsilyl)(vinyldimethylsilyl)methane
101028-73-3

tris(trimethylsilyl)(vinyldimethylsilyl)methane

(Me3Si)3CSiMe2CH2CH2Si(OEt)3
1158184-68-9

(Me3Si)3CSiMe2CH2CH2Si(OEt)3

Conditions
ConditionsYield
With platinum In toluene at 20℃; for 48h;100%
Triethoxysilane
998-30-1

Triethoxysilane

1-undecene
821-95-4

1-undecene

1-triethoxysilylundecane
951128-81-7

1-triethoxysilylundecane

Conditions
ConditionsYield
at 90℃; for 5h; Inert atmosphere;100%
at 90℃; for 5h; Inert atmosphere;100%
With tri[1-methyl-2-diphenylposphino-3-ethylimidazolium hexafluorophosphate] rhodium chloride at 70℃; for 5h; Ionic liquid; regioselective reaction;
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex at 80℃; for 20h; Schlenk technique; Inert atmosphere; regioselective reaction;94.7 %Spectr.
Triethoxysilane
998-30-1

Triethoxysilane

5-hexen-1-yl α-bromophenylacetate
1344059-11-5

5-hexen-1-yl α-bromophenylacetate

6-(triethoxysilyl)hexyl α-bromophenylacetate
1344059-13-7

6-(triethoxysilyl)hexyl α-bromophenylacetate

Conditions
ConditionsYield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene for 24h; Inert atmosphere;100%
Triethoxysilane
998-30-1

Triethoxysilane

carbon dioxide
124-38-9

carbon dioxide

triethoxysilyl formate

triethoxysilyl formate

Conditions
ConditionsYield
With C56H75N4O2Zn(1+)*C24BF20(1-) at 90℃; under 1140.08 Torr; for 48h;100%
With [(1,3-bis(2,6-diisopropylphenyl)imidazol-2-ylidene)CuO2CH] In benzene-d6 at 100℃; under 760.051 Torr; for 1h; Inert atmosphere; Schlenk technique; Glovebox;82%
With C39H49N3OSiZn In neat (no solvent) at 70℃; under 7240.26 Torr; for 40h; Catalytic behavior; Temperature; Reagent/catalyst;60%
rhodium hydrido (PEt3)3 complex
75070-85-8

rhodium hydrido (PEt3)3 complex

Triethoxysilane
998-30-1

Triethoxysilane

[Rh{Si(OEt)3}(PEt3)3]

[Rh{Si(OEt)3}(PEt3)3]

Conditions
ConditionsYield
In benzene-d6 Schlenk technique; Inert atmosphere;100%
Triethoxysilane
998-30-1

Triethoxysilane

[Rh(CH3)(triethylphosphine)3]
1055315-90-6

[Rh(CH3)(triethylphosphine)3]

[Rh{Si(OEt)3}(PEt3)3]
1446417-30-6

[Rh{Si(OEt)3}(PEt3)3]

Conditions
ConditionsYield
In pentane at -90.16℃; Schlenk technique; Inert atmosphere;100%
Triethoxysilane
998-30-1

Triethoxysilane

dimethyl (prop-2-yn-1-yl)malonate
95124-07-5

dimethyl (prop-2-yn-1-yl)malonate

dimethyl 2-(2-(triethoxysilyl)allyl)malonate

dimethyl 2-(2-(triethoxysilyl)allyl)malonate

Conditions
ConditionsYield
With Ru(Cp*)(MeCN)3PF6 In dichloromethane at 0 - 20℃; for 1h; Inert atmosphere;100%
Triethoxysilane
998-30-1

Triethoxysilane

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With trichloroisocyanuric acid In dichloromethane Heating;99.7%
With trichloroisocyanuric acid; copper(l) chloride In dichloromethane at 25℃; for 4h; Temperature; Reagent/catalyst; Reflux; Inert atmosphere;
tert-butylethylene
558-37-2

tert-butylethylene

Triethoxysilane
998-30-1

Triethoxysilane

(3,3-dimethylbutyl)triethoxysilane
41966-94-3

(3,3-dimethylbutyl)triethoxysilane

Conditions
ConditionsYield
With N-heterocyclic carbene fuctionalized with methyl(trimethylsilane) and methoxypolyethylene glycol Pt(II) complex at 90℃; for 10h;99.7%
With (TFAPDI)Co(2-ethylhexanoate)2 In neat (no solvent) at 23℃; for 24h;87%
With (TFAPDI)Co(2-ethylhexanoate)2 at 20℃; for 24h;87%
1-Heptene
592-76-7

1-Heptene

Triethoxysilane
998-30-1

Triethoxysilane

β-heptyltriethoxysilane

β-heptyltriethoxysilane

Conditions
ConditionsYield
With rhodium(III) chloride trihydrate at 80℃; for 8h;99.6%
1-hexene
592-41-6

1-hexene

Triethoxysilane
998-30-1

Triethoxysilane

β-hexyltriethoxysilane
18166-36-4

β-hexyltriethoxysilane

Conditions
ConditionsYield
With rhodium(III) chloride trihydrate at 60℃; for 6h; Reagent/catalyst; Temperature;99.5%
With graphite oxide-supported Karstedt catalyst at 60℃; for 1.5h;
With rhodium(III) chloride trihydrate; diphenyl(3-triethylsilylphenyl)phosphine at 90℃; for 5h; Inert atmosphere; Schlenk technique;
With C19H40N2OPtSi3 at 60℃; for 5h; Reagent/catalyst; Sealed tube;
With 2C14H25N2O3PtSi2(1-)*Fe(2+) at 80℃; for 4h; Reagent/catalyst;
Triethoxysilane
998-30-1

Triethoxysilane

3-chloroprop-1-ene
107-05-1

3-chloroprop-1-ene

(3-chloropropyl)triethoxysilane
5089-70-3

(3-chloropropyl)triethoxysilane

Conditions
ConditionsYield
With Ru-B/γ-Al2O3 at 115℃; for 1h; Temperature; Inert atmosphere;99.44%
With dihydrogen hexachloroplatinate; Triethoxyvinylsilane; isopropyl alcohol at 50 - 80℃; for 4h; Product distribution; Mechanism; influence unsaturated Si-comp. on rate of hydrosilylation; effect of other additives;22.7 % Chromat.
bis(1,5-cyclooctadiene)diiridium(I) dichloride at -78 - 40℃; for 2h; Product distribution / selectivity; Inert atmosphere; pressure tight tube;21.8 %Chromat.
With di-tert-butyl peroxide In methanol at 80 - 91℃; for 4h;65 %Chromat.
1-penten
109-67-1

1-penten

Triethoxysilane
998-30-1

Triethoxysilane

pentyltriethoxysilane

pentyltriethoxysilane

Conditions
ConditionsYield
With Wilkinson's catalyst at 60℃; for 6h;99.4%
oct-1-ene
111-66-0

oct-1-ene

Triethoxysilane
998-30-1

Triethoxysilane

β-octylltriethoxysilane
1233710-95-6

β-octylltriethoxysilane

Conditions
ConditionsYield
With Wilkinson's catalyst at 80℃; for 6h; Reagent/catalyst;99.3%
With graphite oxide-supported Karstedt catalyst at 60℃; for 1h;
With rhodium(III) chloride trihydrate; diphenyl(3-triethylsilylphenyl)phosphine at 90℃; for 5h; Inert atmosphere; Schlenk technique;
ethene
74-85-1

ethene

Triethoxysilane
998-30-1

Triethoxysilane

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

Conditions
ConditionsYield
With C22H34FeO2Si4 In toluene at 20℃; for 16h; Inert atmosphere; Schlenk technique;99%
With C21H34FeO2Si4 In toluene at 20℃; under 760.051 Torr; for 5h; Schlenk technique;96%
With pentacarbonyl iron at 130℃;
Triethoxysilane
998-30-1

Triethoxysilane

cyclohexanone
108-94-1

cyclohexanone

cyclohexyloxy(triethoxy)silane
18027-46-8

cyclohexyloxy(triethoxy)silane

Conditions
ConditionsYield
hydroxyapatite In n-heptane at 90℃; for 1h;99%
With hydroxyapatite In n-heptane at 90℃; for 1h;99%
Rh catalyst
Triethoxysilane
998-30-1

Triethoxysilane

diphenyl acetylene
501-65-5

diphenyl acetylene

triethoxy-[(E)-(1,2-diphenylvinyl)]silane
65119-10-0

triethoxy-[(E)-(1,2-diphenylvinyl)]silane

Conditions
ConditionsYield
chloro(1,5-cyclooctadiene)rhodium(I) dimer at 20℃; for 3h;99%
With Palladium nanoparticles stabilized withtris-imidazolium tetrafluoroborates (1b-Pd) at 90℃; for 17h; Inert atmosphere; Sealed tube;99%
With rhodium nanaoparticle stablized by polyethylene glycol at 60℃; for 36h; Sealed tube; stereoselective reaction;99%
4-Octyne
1942-45-6

4-Octyne

Triethoxysilane
998-30-1

Triethoxysilane

(Z)-triethoxy(oct-4-en-4-yl)silane

(Z)-triethoxy(oct-4-en-4-yl)silane

Conditions
ConditionsYield
Cp*Ru(MeCN)3+PF6- In dichloromethane for 1h;99%
Triethoxysilane
998-30-1

Triethoxysilane

1-Phenyl-2-(trimethylsilyl)acetylene
2170-06-1

1-Phenyl-2-(trimethylsilyl)acetylene

triethoxy-[(E)-(1-phenyl-2-(trimethylsilyl)vinyl)]silane

triethoxy-[(E)-(1-phenyl-2-(trimethylsilyl)vinyl)]silane

Conditions
ConditionsYield
chloro(1,5-cyclooctadiene)rhodium(I) dimer at 20℃;99%
Triethoxysilane
998-30-1

Triethoxysilane

2,6-diyl bis(trifluoromethanesulfonate)anthracene
594838-61-6

2,6-diyl bis(trifluoromethanesulfonate)anthracene

2,6-bis(triethoxysilyl)anthracene
867144-07-8

2,6-bis(triethoxysilyl)anthracene

Conditions
ConditionsYield
With triethanolamine; tetra-(n-butyl)ammonium iodide; bis(acetonitrile)(1,5-cyclooctadiene)rhodium(I) tetrafluoroborate In N,N-dimethyl-formamide at 80℃; for 2h;99%

998-30-1Relevant articles and documents

How a Thermally Unstable Metal Hydrido Complex Can Yield High Catalytic Activity Even at Elevated Temperatures

Ehm, Christian,Krüger, Juliane,Lentz, Dieter

, p. 9305 - 9310 (2016)

Despite their instability in ethereal solvents, organotitanium hydride catalysts are successfully employed in catalysis at moderate to high temperatures (110 °C), even in the presence of alcohols. It is shown computationally (bond dissociation energy (BDE) analysis and energetic profile for regeneration) and experimentally (EPR studies and kinetic studies), with the specific example of hydrodefluorination (HDF), that despite the long standing belief, regeneration of Ti?H bonds from Ti?F bonds using silanes is endergonic. The resulting low concentration of Ti?H species is crucial for the catalytic stability of those systems. The resting state in the catalysis is a Ti?F species. The most promising silanes for regeneration are not the ones that have the strongest Si?F bond, but the ones that show the largest difference in Si?F and Si?H BDEs.

Sustainable Catalytic Synthesis of Diethyl Carbonate

Putro, Wahyu S.,Ikeda, Akira,Shigeyasu, Shinji,Hamura, Satoshi,Matsumoto, Seiji,Lee, Vladimir Ya.,Choi, Jun-Chul,Fukaya, Norihisa

, p. 842 - 846 (2020/12/07)

New sustainable approaches should be developed to overcome equilibrium limitation of dialkyl carbonate synthesis from CO2 and alcohols. Using tetraethyl orthosilicate (TEOS) and CO2 with Zr catalysts, we report the first example of sustainable catalytic synthesis of diethyl carbonate (DEC). The disiloxane byproduct can be reverted to TEOS. Under the same conditions, DEC can be synthesized using a wide range of alkoxysilane substrates by investigating the effects of the number of ethoxy substituent in alkoxysilane substrates, alkyl chain, and unsaturated moiety on the fundamental property of this reaction. Mechanistic insights obtained by kinetic studies, labeling experiments, and spectroscopic investigations reveal that DEC is generated via nucleophilic ethoxylation of a CO2-inserted Zr catalyst and catalyst regeneration by TEOS. The unprecedented transformation offers a new approach toward a cleaner route for DEC synthesis using recyclable alkoxysilane.

Mechanochemical method of producing triethoxysilane

Temnikov,Anisimov,Chistovalov,Zhemchugov,Kholodkov,Zimovets,Vysochinskaya, Yu. S.,Muzafarova

, p. 270 - 274 (2019/04/27)

A mechanochemical method for synthesis of triethoxysilane from silicon-copper contact mass and ethyl alcohol in the developed vibration reactor is presented. It is shown that the process of a direct alkoxysilane synthesis in the vibro-boiling layer is affected by a series of control parameters such as the ratio between the contact mass and the mass of grinding bodies, the grinding body sizes and their ratios in a polydisperse mixture, power density. Optimization of these parameters allowed us to obtain HSi(OEt)3 with a selectivity of 50% at a silicon conversion of 90% without the use of promoters.

Calyciphylline B-Type Alkaloids: Total Syntheses of (-)-Daphlongamine H and (-)-Isodaphlongamine H

Hugelshofer, Cedric L.,Palani, Vignesh,Sarpong, Richmond

supporting information, p. 8431 - 8435 (2019/06/13)

The first total synthesis of the complex hexacylic Daphniphyllum alkaloid (-)-daphlongamine H has been accomplished. Key to the success of the strategy are a complexity-building Mannich reaction, efficient cyclizations, and a highly diastereoselective hydrogenation to assemble multigram quantities of the tricyclic core bearing four contiguous stereocenters. Following construction of the hydro-indene substructure by means of a Pauson-Khand reaction, endgame redox manipulations delivered the natural product. Importantly, the synthetic studies have also given access to (-)-isodaphlongamine H and led to a revision of the reported structure of deoxyisocalyciphylline B.

Mechanochemistry-a new powerful green approach to the direct synthesis of alkoxysilanes

Temnikov, Maxim N.,Anisimov, Anton A.,Zhemchugov, Pavel V.,Kholodkov, Dmitry N.,Goloveshkin, Alexander S.,Naumkin, Alexander V.,Chistovalov, Sergey M.,Katsoulis, Dimitris,Muzafarov, Aziz M.

supporting information, p. 1962 - 1969 (2018/05/23)

The present work shows a new one-stage mechanochemical method for the direct synthesis of alkoxysilanes by silicon mechanoactivation followed by a reaction with an alcohol. Alkoxysilanes were obtained with nearly complete silicon and alcohol conversion. This method allows for a considerable simplification of the traditional multistage process by eliminating three stages that include silicon and catalyst preparation, and adapts it to green chemistry requirements. Vibration milling removed the oxide film, and the mechanoactivation of the large silicon fraction (1000-2000 μm) occurs in the reactor working space. Abrasion of the reactor walls and grinding bodies made of brass results in a developed catalytic surface on silicon, as it has been proven by a set of physical analytical methods such as scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), powder X-ray diffraction (PXRD), and X-ray photoelectron spectroscopy (XPS).

METHOD FOR PRODUCING HYDROSILANE

-

Paragraph 0026, (2019/01/06)

PROBLEM TO BE SOLVED: To provide a method for producing hydrosilane capable of efficiently producing hydrosilane under mild conditions. SOLUTION: Provided is a method for producing hydrosilane where hydrosilane can be efficiently produced by reacting alkoxysilane having a structure represented by formula (a) with hydroborane and/or hydrogen under the presence of a complex with at least one kind of atom selected from the group consisting of a yttrium atom (Y), a zirconium atom (zr) and a hafnium atom (Hf) as a central metal(s)(in the formula (a), R denotes a 1 to 20C hydrocarbon group). SELECTED DRAWING: None COPYRIGHT: (C)2018,JPO&INPIT

New vinyl alkoxy silane preparation process

-

Paragraph 0041; 0042, (2016/10/08)

The present invention discloses a new vinyl alkoxy silane preparation process, which is characterized in that hydrogen chloride produced during a preparation process is adopted as a reactant to synthesize an initial raw material trichlorosilane, the hydrogen chloride is recycled, and the byproduct bis(trialkoxy)silyl ethane is adopted as a reaction solvent during a hydrogen silicon addition process, such that the byproduct emission is reduced, the new impurity introduction is avoided, and the product purity is improved. According to the present invention, the new process has characteristics of stable production, simple preparation process, and mild reaction conditions, and the yield of the product vinyl alkoxy silane is high, and the product purity is more than 99%.

Amorphous silicon: New insights into an old material

Spomer, Natalie,Holl, Sven,Zherlitsyna, Larissa,Maysamy, Fariba,Frost, Andreas,Auner, Norbert

, p. 5600 - 5616 (2015/03/30)

Amorphous silicon is synthesized by treating the tetrahalosilanes SiX4 (X=Cl, F) with molten sodium in high boiling polar and non-polar solvents such as diglyme or nonane to give a brown or a black solid showing different reactivities towards suitable reagents. With regards to their technical relevance, their stability towards oxygen, air, moisture, chlorine-containing reaction partners RCl (R=H, Cl, Me) and alcohols is investigated. In particular, reactions with methanol are a versatile tool to deliver important products. Besides tetramethoxysilane formation, methanolysis of silicon releases hydrogen gas under ambient conditions and is thus suitable for a decentralized hydrogen production; competitive insertion into the MeO-H versus the Me-OH bond either yields H- and/or methyl-substituted methoxy functional silanes. Moreover, compounds, such as MenSi(OMe)4-n (n=0-3) are simply accessible in more than 75% yield from thermolysis of, for example, tetramethoxysilane over molten sodium. Based on our systematic investigations we identified reaction conditions to produce the methoxysilanes MenSi(OMe)4-n in excellent (n=0:100%) to acceptable yields (n=1:51%; n=2:27%); the yield of HSi(OMe)3 is about 85%. Thus, the methoxysilanes formed might possibly open the door for future routes to silicon-based products. Amorphous silicon is easily synthesized from tetrahalosilanes SiX4 (X=Cl, F) and molten sodium in different solvents. Reactivity studies prove the resulting materials as versatile tools for the formation of technical important silanes, such as the silicon chloro-, alkoxy-, and methylalkoxy-substituted derivatives (see figure; bl=black, br=brown).

METHOD FOR HYDROGENATING SILANE COMPOUND

-

Paragraph 0086 - 0095, (2016/12/12)

In the present invention, provided is a method for hydrogenating silane compounds, comprising the steps of supplying hydrogen to a low-temperature plasma reaction apparatus and accordingly generating low-temperature plasmas including hydrogen ions, electrons and hydrogen atom radicals; supplying raw materials including the silane compound to the low-temperature plasma reaction apparatus; and making the silane compound, the hydrogen ion, the electrons and the hydrogen atom radical have the hydrogenating reaction.

METHOD FOR PREPARING TRIALKOXYSILANE

-

Paragraph 0062, (2014/07/23)

The present invention relates to a method for preparing SiH(OR3)-type trialkoxysilane (wherein, R is a C1-C3 methyl, ethyl, propyl or isopropyl group), and more specifically, the method comprises the steps of: preventing the oxidation of a silicon surface by pulverizing raw silicon material in a solvent environment without contact with the air so that the initial induction period of the direct synthesis of trialkoxysilane is dramatically reduced; and removing impurities from a reaction environment by continuously selecting a part of the solvent through a membrane filter provided in a reactor body.

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