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67-72-1

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67-72-1 Usage

General Description

Perchloroethane, also known as ethylidene dichloride, is a chemical compound that is extensively used as a solvent in various industrial processes such as in the manufacturing of cellulose acetate and synthetic fibers. It is a colorless liquid with a sweet odor, and it is highly flammable. Perchloroethane is a chlorinated solvent that has detrimental effects on human health and the environment. Its use has been significantly reduced due to its toxicity and its classification as a potential carcinogen. Exposure to perchloroethane can lead to damage to the central nervous system, liver, and kidneys, and it has been linked to an increased risk of cancer. As a result, efforts are being made to find safer alternative solvents for industrial applications.

Check Digit Verification of cas no

The CAS Registry Mumber 67-72-1 includes 5 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 2 digits, 6 and 7 respectively; the second part has 2 digits, 7 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 67-72:
(4*6)+(3*7)+(2*7)+(1*2)=61
61 % 10 = 1
So 67-72-1 is a valid CAS Registry Number.
InChI:InChI=1/C2Cl6/c3-1(4,5)2(6,7)8

67-72-1 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
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  • Detail
  • Alfa Aesar

  • (16972)  Hexachloroethane, 98%   

  • 67-72-1

  • 1kg

  • 927.0CNY

  • Detail
  • Supelco

  • (CRM40011)  Hexachloroethane solution  certified reference material, TraceCERT®, 5000 μg/mL in methanol, ampule of 1 mL

  • 67-72-1

  • CRM40011

  • 437.58CNY

  • Detail
  • Sigma-Aldrich

  • (31715)  Hexachloroethane  VETRANAL, analytical standard

  • 67-72-1

  • 31715-250MG

  • 506.61CNY

  • Detail
  • Supelco

  • (48511)  Hexachloroethane  analytical standard

  • 67-72-1

  • 000000000000048511

  • 533.52CNY

  • Detail
  • Aldrich

  • (185442)  Hexachloroethane  99%

  • 67-72-1

  • 185442-5G

  • 230.49CNY

  • Detail
  • Aldrich

  • (185442)  Hexachloroethane  99%

  • 67-72-1

  • 185442-100G

  • 315.90CNY

  • Detail
  • Aldrich

  • (185442)  Hexachloroethane  99%

  • 67-72-1

  • 185442-500G

  • 1,048.32CNY

  • Detail

67-72-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name hexachloroethane

1.2 Other means of identification

Product number -
Other names Ethane, hexachloro-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Volatile organic compounds
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:67-72-1 SDS

67-72-1Synthetic route

dimanganese decacarbonyl
10170-69-1

dimanganese decacarbonyl

A

pentacarbonylchloromanganese(I)
14100-30-2

pentacarbonylchloromanganese(I)

B

hexachloroethane
67-72-1

hexachloroethane

Conditions
ConditionsYield
With tetrachloromethane In tetrachloromethane byproducts: CCl3; Irradiation (UV/VIS); Irradiation λ >350 nm, CCl4, Ar atm.;; detected by IR spectra and GCA;;A n/a
B 100%
hexacarbonyl-bis(η5-methylcyclopentadienyl)dimolybdenum

hexacarbonyl-bis(η5-methylcyclopentadienyl)dimolybdenum

A

MoCl(CO)3(η5-C5H4CH3)

MoCl(CO)3(η5-C5H4CH3)

B

hexachloroethane
67-72-1

hexachloroethane

Conditions
ConditionsYield
With tetrachloromethane In tetrachloromethane Irradiation (UV/VIS); Irradiation λ >490 nm, CCl4, Ar atm.;; detected by IR spectra and GCA;;A n/a
B 100%
With tetrachloromethane In tetrachloromethane; acetone Irradiation (UV/VIS); Irradiation λ >490 nm, acetone:CCl4=3:1, Ar atm.;; detected by IR spectra and GCA;;A >99
B 70%
perchloro-1,3-butanediol

perchloro-1,3-butanediol

hexachloroethane
67-72-1

hexachloroethane

Conditions
ConditionsYield
With 2,2'-azobis(isobutyronitrile); chlorine at 130℃; under 11251.1 Torr; Reagent/catalyst; Temperature; Pressure;99%
C21H14N2O2

C21H14N2O2

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

p-chlorophenyl isocyanide
1885-81-0

p-chlorophenyl isocyanide

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 98%
D n/a
Cp(CO)2Re(CH3)2

Cp(CO)2Re(CH3)2

Bromotrichloromethane
75-62-7

Bromotrichloromethane

A

methyl bromide
74-83-9

methyl bromide

B

tricarbonylcyclopentadienylrhenium

tricarbonylcyclopentadienylrhenium

C

C5H5(CO)2Re(CH3)Br

C5H5(CO)2Re(CH3)Br

D

C5H5Re(CO)2(CH3)Cl

C5H5Re(CO)2(CH3)Cl

E

hexachloroethane
67-72-1

hexachloroethane

Conditions
ConditionsYield
With carbon monoxide In further solvent(s) Irradiation (UV/VIS); Irradiation of complex at 350-380 nm under 20 atm of CO in CBrCl3;;A 81-87
B 97%
C 78-85
D <4
E >65
tetrachloromethane
56-23-5

tetrachloromethane

N-acyloxyphthalimide
118334-80-8

N-acyloxyphthalimide

A

phthalimide
136918-14-4

phthalimide

B

hexachloroethane
67-72-1

hexachloroethane

C

1-(tert-butyl)-4-(3-chloropropyl)benzene

1-(tert-butyl)-4-(3-chloropropyl)benzene

D

CO2

CO2

Conditions
ConditionsYield
With 1,4-diaza-bicyclo[2.2.2]octane In water; tert-butyl alcohol for 3h; Product distribution; Quantum yield; Irradiation; ratio, without DABCO;A 95%
B 70%
C 74%
D n/a
(2,5,6-trimethylbenzyl)bis(dimethylglyoximato)pyridinecobalt(III)
77743-10-3

(2,5,6-trimethylbenzyl)bis(dimethylglyoximato)pyridinecobalt(III)

Bromotrichloromethane
75-62-7

Bromotrichloromethane

A

bromo Co(III)(dmgH)2py

bromo Co(III)(dmgH)2py

B

hexachloroethane
67-72-1

hexachloroethane

C

2-(Bromomethyl)-1,3,4-trimethylbenzene
54757-29-8

2-(Bromomethyl)-1,3,4-trimethylbenzene

D

1,2,4-Trimethyl-3-(2,2,2-trichloro-ethyl)-benzene

1,2,4-Trimethyl-3-(2,2,2-trichloro-ethyl)-benzene

Conditions
ConditionsYield
In chloroform Excess of CHCl3, 50°C for 5 h;; detected by NMR spectra and GLC;;A n/a
B n/a
C 5%
D 95%
tetrachloromethane
56-23-5

tetrachloromethane

1,4-diphenyl-2,3-benzo-7,7,8,8-tetramethyl-7,8-digermabicyclo<2,2,2>octadiene
84784-54-3

1,4-diphenyl-2,3-benzo-7,7,8,8-tetramethyl-7,8-digermabicyclo<2,2,2>octadiene

A

hexachloroethane
67-72-1

hexachloroethane

B

1,4-diphenylnaphthalene
796-30-5

1,4-diphenylnaphthalene

C

1,2-dichlorotetramethyldigermane
22702-77-8

1,2-dichlorotetramethyldigermane

D

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
In benzene Irradiation (UV/VIS); UV irradn. of a soln. of germanium compd. and CCl4 in C6H6 in a degassed sealed Pyrex tube for 3 h at room temp.; not isolated, detected by NMR, analyzed by GC and GC-MS;A 38%
B 95%
C 71%
D 27%
C24H22N2O3
115975-16-1

C24H22N2O3

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

N-(β-Chlor-isopropyl)benzamid
84967-87-3

N-(β-Chlor-isopropyl)benzamid

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 92%
D n/a
C26H19NO2
93845-09-1

C26H19NO2

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

benzophenone azine
983-79-9

benzophenone azine

D

4'-biphenyl chloride
2051-62-9

4'-biphenyl chloride

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C n/a
D 88%
C24H17NO2
115975-21-8

C24H17NO2

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

2-chloronaphthalene
91-58-7

2-chloronaphthalene

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 87%
D n/a
tetrachloromethane
56-23-5

tetrachloromethane

tetraphenyltin(IV)
595-90-4

tetraphenyltin(IV)

dibenzoyl peroxide
94-36-0

dibenzoyl peroxide

A

hexachloroethane
67-72-1

hexachloroethane

B

tin(IV) chloride
7646-78-8

tin(IV) chloride

C

chlorobenzene
108-90-7

chlorobenzene

D

benzene-1,2-dicarboxylic acid
88-99-3

benzene-1,2-dicarboxylic acid

E

benzoic acid
65-85-0

benzoic acid

Conditions
ConditionsYield
50h boiling;A n/a
B 84.1%
C n/a
D n/a
E n/a
tetrachloromethane
56-23-5

tetrachloromethane

A

chloroform
67-66-3

chloroform

B

hexachloroethane
67-72-1

hexachloroethane

Conditions
ConditionsYield
With photoreduced H2W10O324- In acetonitrile at 60℃; for 24h; Product distribution; Mechanism; other halocarbons, other redox-active polyoxotungstate complexes; other temperature, also with irradiation; other solvents;A 82%
B 2%
With pentaerythritol tetracaproate; dibenzoyl peroxide at 99.9℃; Product distribution; Rate constant; effect of concentration of pentaerythritol tetracaproate; dependence of rate constant from the number of (CH2) fragments in the molecule of esters;
diphenylmethanone O-(4-phenylbutanoyl) oxime
115975-11-6

diphenylmethanone O-(4-phenylbutanoyl) oxime

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

phenylpropyl chloride
104-52-9

phenylpropyl chloride

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 82%
D n/a
diphenylmethanone O-(adamantane-1-carbonyl) oxime
107264-20-0

diphenylmethanone O-(adamantane-1-carbonyl) oxime

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

1-chloroadamantane
935-56-8

1-chloroadamantane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 82%
D n/a
C31H45NO2
120569-16-6

C31H45NO2

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

1-chloroheptadecane
62016-75-5

1-chloroheptadecane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 82%
D n/a
C19H14N2O2
30435-62-2

C19H14N2O2

A

3-Chloropyridine
626-60-8

3-Chloropyridine

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 82%
B n/a
C n/a
D n/a
C37H49NO3
120569-19-9

C37H49NO3

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

(3R,5S,8R,9S,10S,13R,14S,17R)-17-((R)-3-Chloro-1-methyl-propyl)-10,13-dimethyl-hexadecahydro-cyclopenta[a]phenanthren-3-ol
120577-31-3

(3R,5S,8R,9S,10S,13R,14S,17R)-17-((R)-3-Chloro-1-methyl-propyl)-10,13-dimethyl-hexadecahydro-cyclopenta[a]phenanthren-3-ol

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 81%
D n/a
Benzophenon-O-(p-chlorbenzoyl)-oxim
14688-34-7

Benzophenon-O-(p-chlorbenzoyl)-oxim

A

benzophenone
119-61-9

benzophenone

B

para-dichlorobenzene
106-46-7

para-dichlorobenzene

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B 80%
C n/a
D n/a
C24H17NO2
115975-20-7

C24H17NO2

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

benzophenone azine
983-79-9

benzophenone azine

D

1-Chloronaphthalene
90-13-1

1-Chloronaphthalene

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C n/a
D 80%
C23H16N2O2
115993-91-4

C23H16N2O2

A

4-chloroquinoline
611-35-8

4-chloroquinoline

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 80%
B n/a
C n/a
D n/a
C35H53NO2
120569-17-7

C35H53NO2

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

1-chloroheneicosane
66326-16-7

1-chloroheneicosane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 80%
D n/a
C19H14N2O2
93845-11-5

C19H14N2O2

A

2-chloropyridine
109-09-1

2-chloropyridine

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 80%
B n/a
C n/a
D n/a
acetyl-triphenylgermane
6430-25-7

acetyl-triphenylgermane

A

hexachloroethane
67-72-1

hexachloroethane

B

1,1,1-trichloroacetone
918-00-3

1,1,1-trichloroacetone

C

chlorotriphenylgermane
1626-24-0

chlorotriphenylgermane

D

acetyl chloride
75-36-5

acetyl chloride

Conditions
ConditionsYield
With tetrachloromethane In tetrachloromethane Irradiation (UV/VIS); Ph3GeCOMe photolyzed in CCl4;A 53%
B 10%
C 78%
D 74%
C23H16N2O2
120569-14-4

C23H16N2O2

A

4-chloroisoquinoline
1532-91-8

4-chloroisoquinoline

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 77%
B n/a
C n/a
D n/a
C19H14N2O2
93845-12-6

C19H14N2O2

A

4-Chloropyridine
626-61-9

4-Chloropyridine

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 77%
B n/a
C n/a
D n/a
C23H16N2O2
115975-18-3

C23H16N2O2

A

2-Chloroquinoline
612-62-4

2-Chloroquinoline

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 76%
B n/a
C n/a
D n/a
C26H24N2O3
107264-22-2

C26H24N2O3

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

(4-chloropiperidin-1-yl)(phenyl)methanone
90670-04-5

(4-chloropiperidin-1-yl)(phenyl)methanone

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 76%
D n/a
C22H15N3O2
120569-15-5

C22H15N3O2

A

2-chloroquinoxaline
1448-87-9

2-chloroquinoxaline

B

benzophenone
119-61-9

benzophenone

C

hexachloroethane
67-72-1

hexachloroethane

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A 74%
B n/a
C n/a
D n/a
C27H25NO3
107264-24-4

C27H25NO3

A

benzophenone
119-61-9

benzophenone

B

hexachloroethane
67-72-1

hexachloroethane

C

(2-chloro-cyclohexyl)-phenyl ketone
107774-09-4

(2-chloro-cyclohexyl)-phenyl ketone

D

benzophenone azine
983-79-9

benzophenone azine

Conditions
ConditionsYield
With tetrachloromethane Ambient temperature; Irradiation; Yields of byproduct given;A n/a
B n/a
C 74%
D n/a
4-(1-Phenyl-1-hydrazinocarbonyl-methylene)piperidine-1-carboxylic acid tert-butyl ester
676491-10-4

4-(1-Phenyl-1-hydrazinocarbonyl-methylene)piperidine-1-carboxylic acid tert-butyl ester

hexachloroethane
67-72-1

hexachloroethane

2,2-dimethylpropanoic anhydride
1538-75-6

2,2-dimethylpropanoic anhydride

4-[1-Phenyl-1-(5-tert-butyl-1,3,4-oxadiazol-2-yl)-methylene]-piperidine-1-carboxylic acid tert-butyl ester

4-[1-Phenyl-1-(5-tert-butyl-1,3,4-oxadiazol-2-yl)-methylene]-piperidine-1-carboxylic acid tert-butyl ester

Conditions
ConditionsYield
With IPr2NEt; triphenylphosphine In acetonitrile100%
hexachloroethane
67-72-1

hexachloroethane

C5(CH3)5Ru(C5H4CH2C4H7NCH2OCH3)

C5(CH3)5Ru(C5H4CH2C4H7NCH2OCH3)

(Sp)-Cp*Ru[1-Cl-2-(CH2NC4H7CH2OCH3)C5H3]

(Sp)-Cp*Ru[1-Cl-2-(CH2NC4H7CH2OCH3)C5H3]

Conditions
ConditionsYield
With LisBu In diethyl ether; cyclohexane (inert atm.); Ru complex in Et2O cooled to -78°C, treated with LisBu in cyclohexane (1:1.70) at -78°C within 20-30 s, stirred at -78°C for 3.5 h, treated with suspn. of ligand in Et2O, warmed to room temp. within 2.5 h, stirred for; evapd.(vac.), extd.(pentane), filtered (kieselghur), freed of volatiles,elem. anal.;100%
hexachloroethane
67-72-1

hexachloroethane

carbon dioxide
124-38-9

carbon dioxide

Conditions
ConditionsYield
With Oxone; II(H2O)2(Me2SO)4>(BF4)2; Hexadecyltrimethylammonium hydrogen sulfate In water at 20℃; Product distribution; other chloro- and bromoolefins;99%
tetrahydrofuran
109-99-9

tetrahydrofuran

samarium
7440-19-9

samarium

hexachloroethane
67-72-1

hexachloroethane

SmCl3(tetrahydrofuran)2

SmCl3(tetrahydrofuran)2

Conditions
ConditionsYield
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 30 h; pptn. on pentane addn., decantation, washing (pentane), drying (room temp., dry box); elem. anal.;99%
hexachloroethane
67-72-1

hexachloroethane

Co(C5H4B(N(CH3)2)2)2
214750-14-8

Co(C5H4B(N(CH3)2)2)2

Co(C5H4B(N(CH3)2)2)2(1+)*Cl(1-)=[Co(C5H4B(N(CH3)2)2)2]Cl
214750-16-0

Co(C5H4B(N(CH3)2)2)2(1+)*Cl(1-)=[Co(C5H4B(N(CH3)2)2)2]Cl

Conditions
ConditionsYield
In toluene N2-atmosphere; stirring (4 h); filtering, drying (vac.), crystn. (CH2Cl2 / hexane = 1 : 1); elem. anal.;99%
hexachloroethane
67-72-1

hexachloroethane

5-(trimethylsilyl)-methyl-2,2′-bipyridine
219944-90-8

5-(trimethylsilyl)-methyl-2,2′-bipyridine

5-chloromethyl-2,2'-bipyridine
219944-93-1

5-chloromethyl-2,2'-bipyridine

Conditions
ConditionsYield
With cesium fluoride In acetonitrile at 60℃; for 4h;98%
W(O)(neopentylidene)(PEt3)2Cl2

W(O)(neopentylidene)(PEt3)2Cl2

hexachloroethane
67-72-1

hexachloroethane

trimethylphosphane
594-09-2

trimethylphosphane

W(CC(CH3)3)Cl3(P(CH3)3)3
78251-18-0

W(CC(CH3)3)Cl3(P(CH3)3)3

Conditions
ConditionsYield
In tetrahydrofuran; diethyl ether byproducts: PEt3HCl, Et3PO; under N2 for 12 h, filtration, adding of PMe3; react. time 10 min; filtration; elem. anal.;98%
W(O)(neopentylidene)(PEt3)2Cl2

W(O)(neopentylidene)(PEt3)2Cl2

hexachloroethane
67-72-1

hexachloroethane

W(6+)*CC(CH3)3(3-)*3Cl(1-)*OP(C2H5)3 = [W(CC(CH3)3)Cl3(PO(C2H5)3)]
78251-21-5

W(6+)*CC(CH3)3(3-)*3Cl(1-)*OP(C2H5)3 = [W(CC(CH3)3)Cl3(PO(C2H5)3)]

Conditions
ConditionsYield
In tetrahydrofuran byproducts: PEt3HCl; under N2 for 10 h; filtration, pptn. of PEt3HCl with pentane, filtration, evapn.;98%
hexachloroethane
67-72-1

hexachloroethane

Co(C5H4B(N(C2H5)2)2)2
214750-15-9

Co(C5H4B(N(C2H5)2)2)2

Co(C5H4B(N(C2H5)2)2)2(1+)*Cl(1-)=[Co(C5H4B(N(C2H5)2)2)2]Cl
214750-17-1

Co(C5H4B(N(C2H5)2)2)2(1+)*Cl(1-)=[Co(C5H4B(N(C2H5)2)2)2]Cl

Conditions
ConditionsYield
In toluene N2-atmosphere; stirring (4 h); filtering, drying (vac.), crystn. (CH2Cl2 / hexane = 1 : 1); elem. anal.;98%
furan
110-00-9

furan

hexachloroethane
67-72-1

hexachloroethane

2-chlorofuran
3187-94-8

2-chlorofuran

Conditions
ConditionsYield
With n-butyllithium; sodium hydrogencarbonate In diethyl ether; water97.6%
hexachloroethane
67-72-1

hexachloroethane

1,1,2-Trichloro-1,2,2-trifluoroethane
76-13-1

1,1,2-Trichloro-1,2,2-trifluoroethane

Conditions
ConditionsYield
With aluminum(III) fluoride; hydrogen fluoride at 120℃; under 11251.1 Torr; for 10h; Reagent/catalyst; Temperature; Autoclave;97.06%
With CFC-112a; antimonypentachloride; fluorine at 32℃; unter vermindertem Druck;
With antimonypentachloride; antimony(III) fluoride at 48℃;
hexachloroethane
67-72-1

hexachloroethane

1,1,2,2-tetrachloroethylene
127-18-4

1,1,2,2-tetrachloroethylene

Conditions
ConditionsYield
In tetrachloromethane at 300℃; for 0.000555556h; Temperature; Flow reactor; Pyrolysis;97%
at 600℃;
With pyrographite at 700℃;
tetrahydrofuran
109-99-9

tetrahydrofuran

holmium

holmium

hexachloroethane
67-72-1

hexachloroethane

HoCl3(tetrahydrofuran)2.5

HoCl3(tetrahydrofuran)2.5

Conditions
ConditionsYield
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 6 h; solvent evapn. (vac.), pentane addn., filtration, washing (pentane), drying (vac., 70 - 80°C, 10 - 15 min); elem. anal.;97%
tetrahydrofuran
109-99-9

tetrahydrofuran

hexachloroethane
67-72-1

hexachloroethane

ytterbium

ytterbium

YbCl3(tetrahydrofuran)3
14782-79-7, 152006-21-8

YbCl3(tetrahydrofuran)3

Conditions
ConditionsYield
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 45 h; pptn. on pentane addn., decantation, washing (pentane), drying (room temp., dry box); elem. anal.;96%
tetrahydrofuran
109-99-9

tetrahydrofuran

terbium

terbium

hexachloroethane
67-72-1

hexachloroethane

TbCl3(tetrahydrofuran)2.5

TbCl3(tetrahydrofuran)2.5

Conditions
ConditionsYield
In tetrahydrofuran byproducts: C2Cl4; Sonication; inert atmosphere; mass ratio metal : C2Cl6 = 1 : 3, 12 h; solvent evapn. (vac.), pentane addn., filtration, washing (pentane), drying (vac., 70 - 80°C, 10 - 15 min); elem. anal.;96%
hexachloroethane
67-72-1

hexachloroethane

Rh((P(C6H5)2CH2)4N2)(1+)*BF4(1-)=[Rh((P(C6H5)2CH2)4N2)]BF4
1261240-33-8

Rh((P(C6H5)2CH2)4N2)(1+)*BF4(1-)=[Rh((P(C6H5)2CH2)4N2)]BF4

RhCl2((P(C6H5)2CH2)4N2)(1+)*BF4(1-)=[RhCl2((P(C6H5)2CH2)4N2)]BF4
1261240-39-4

RhCl2((P(C6H5)2CH2)4N2)(1+)*BF4(1-)=[RhCl2((P(C6H5)2CH2)4N2)]BF4

Conditions
ConditionsYield
In dichloromethane under N2 or Ar; C2Cl6 added to soln. of rhodium complex in CH2Cl2, mixt. stirred at room temp. for 3 h; evapn. under vac., residue washed with hexanes; elem. anal.;96%
hexachloroethane
67-72-1

hexachloroethane

bis(N,N-dimethylamino)chlorophosphine
3348-44-5

bis(N,N-dimethylamino)chlorophosphine

A

N,N-dimethylaminodichlorophosphane
683-85-2

N,N-dimethylaminodichlorophosphane

B

chlorotris(dimethylamino)phosphonium chloride
5574-93-6

chlorotris(dimethylamino)phosphonium chloride

Conditions
ConditionsYield
In diethyl ether for 480h;A 90%
B 95%
hexachloroethane
67-72-1

hexachloroethane

6’-[(trimethylsilyl)methyl]-2’,2-bipyridine
219944-91-9

6’-[(trimethylsilyl)methyl]-2’,2-bipyridine

6-(chloromethyl)-2,2’-bipyridine
82740-65-6

6-(chloromethyl)-2,2’-bipyridine

Conditions
ConditionsYield
With cesium fluoride In acetonitrile at 60℃; for 4h;95%
hexachloroethane
67-72-1

hexachloroethane

η6-(4-triisopropylsiloxymethyl-1-methoxymethoxybenzene)tricarbonylchromium(0)
302320-86-1

η6-(4-triisopropylsiloxymethyl-1-methoxymethoxybenzene)tricarbonylchromium(0)

(+)-(S)-η6-(2-chloro-4-triisopropylsiloxymethyl-1-methoxymethoxybenzene)tricarbonylchromium(0)
410083-62-4, 409359-96-2, 410083-63-5

(+)-(S)-η6-(2-chloro-4-triisopropylsiloxymethyl-1-methoxymethoxybenzene)tricarbonylchromium(0)

Conditions
ConditionsYield
With (-)-sparteine; n-butyllithium In diethyl ether N2; soln. of Cr-contg. compd. (4.3 mmol) in ether at -78°C was added to soln. of (-)-sparteine (3 equiv.) and n-BuLi (1.1 equiv.) in ether at the same temp.; stirring for 1 h and quenching with C2Cl6 (8.6 mmol); warming to -10°C overnight; treatment with water; the org. layer was washed twice with water and once with brine, dried (MgSO4) and concd. under reduced pressure; flash column chromy. (Sorbisil C-60; eluant: 10% ether-hexane);95%
hexachloroethane
67-72-1

hexachloroethane

C29H36ClIrP2S2

C29H36ClIrP2S2

C29H36Cl3IrP2S2

C29H36Cl3IrP2S2

Conditions
ConditionsYield
In dichloromethane at 50℃; for 1h; Solvent;95%
hexachloroethane
67-72-1

hexachloroethane

4-(trimethylsilyl)-methyl-2,2'-bipyridine
219944-89-5

4-(trimethylsilyl)-methyl-2,2'-bipyridine

4-chloromethyl-2,2'-bipyridine
219944-92-0

4-chloromethyl-2,2'-bipyridine

Conditions
ConditionsYield
With cesium fluoride In acetonitrile at 60℃; for 4h;94%
bis[N,N-bistrimethylsilylamido]bis(tetrahydrofuran)ytterbium(II)
154671-38-2

bis[N,N-bistrimethylsilylamido]bis(tetrahydrofuran)ytterbium(II)

hexachloroethane
67-72-1

hexachloroethane

Yb[bis(trimethylsilyl)amide]2Cl(tetrahydrofuran)2

Yb[bis(trimethylsilyl)amide]2Cl(tetrahydrofuran)2

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 18h; Inert atmosphere; Glovebox;93%

67-72-1Relevant articles and documents

-

Lorette

, p. 843 (1957)

-

Reaction of Tetrathiafulvalene with Haloalkanes

Vessal, Behnam,Miller, John G.

, p. 2695 - 2698 (1982)

A kinetic study of the photochemical rection of TTF with haloalkanes has been made.The results are largely in agreement with a mechanism suggested by Scott and co-workers, but some additional findings of fundamental importance were obtained.An improved photosynthesis of TTFCl0.68 is reported.

-

Miller

, p. 993 (1940)

-

Interaction of trichloromethane and tetrachloromethane with nitrogen trifluoride

Mukhortov,Pashkevich,Blinov,Kambur,Kambur,Petrov,Kurapova

, p. 420 - 426 (2011)

Interaction of nitrogen trifluoride with trichloromethane and tetrachloromethane at temperatures in the range from 20 to 200°C and pressures of up to 6.0 MPa in the gas and liquid phases was studied.

High-Pressure Studies of Radical-Solvent Molecule Interactions in the CCl3 and Bromine Combination Reactions of CCl3

Oum, Kawon,Luther, Klaus,Troe, Juergen

, p. 2690 - 2699 (2004)

The combination reactions CCl3 + CCl3 (+ M) → C2Cl6 (+ M) and CCl3 + Br (+ M) → CCl 3Br (+ M) (with rate constants of k1 and k2, respectively) were studied at temperatures of 250 and 300 K over the pressure range of 0.01-1000 bar. Helium, argon, xenon, N2, CO2, and SF6 were used as bath gases. CCl3 radicals were generated via the photolysis of CCl3Br at 248 nm, and their absorption was monitored at 223.5 nm. The limiting "high-pressure" rate constants within the energy-transfer mechanism were determined, independent of density and the choice of the bath gas, over the pressure range of 1-10 bar, to be k 1,∞(T) = (1.0 ± 0.2) × 10-11 (T/300 K)-0.17 cm3 molecule-1 s-1 and k2,∞(T) = (2.0 ± 0.2) × 10-11 (T/300 K)-0.13 cm3 molecule-1 s-1. In the helium, N, and argon bath gases, at pressures above ~40 bar, the reactions became increasingly faster when the pressure was further raised until they finally started to slow at densities where diffusion-controlled kinetics dominates. This is the first detailed report of such a peculiar density dependence of combination rate constants for larger radicals with five or eight atoms. Possible origins of these pressure effects, such as the influence of the radical-complex mechanism and the density dependence of electronic quenching, are discussed.

-

Kailan

, p. 537,549 (1917)

-

-

Carlsson et al.

, p. 4726 (1966)

-

Kinetic Study of the Reactions CCl3 + O2 + M -> CCl3O2 + M from 1 to 760 Torr and from 233 to 333 K

Danis, F.,Caralp, F.,Rayez, T.,Lesclaux, R.

, p. 7300 - 7307 (1991)

The kinetics of reaction 1, CCl3 + O2 + M -> CCl3O2 + M, has been investigated in detail as a function of temperature and over a large pressure range.At low pressure, 0.8-12 Torr, the reaction was investigated by laser photolysis and time-resolved mass spectrometry, while at high pressure (760 Torr), flash photolysis with UV absorption spectrometry was employed.At the low pressure limit, the rate expression, k1(0) = (1.6 +/- 0.3) x 10-30(T/298)-(6.3+/-0.5) cm6 molecule-2 s-1 (M = N2), exhibits a quite strong negative temperature coefficient.The obtained strong collision rate expression, 7.0 x 10-30(T/298)-4.3 cm6 molecule-2 s-1, using either RRKM calculations or Troe's factorized expression, is unable to reproduce the experimental temperature dependence, unless an unreasonably strong temperature dependence is assigned to the collisional efficiency factor: βc = 0.23(T/298)-2.0 (M = N2).Similar results are obtained for other chlorofluoromethyl radicals.The falloff curves were constructed by using RRKM calculations obtained by adjusting βc and the transition-state model, in order to reproduce the experimental data.The rate expression at the high-pressure limit was derived from these calculations k1(infinite) = (3.2 +/- 0.7) x 10-12(T/298)-(1.2+/-0.4) cm3 molecule-1 s-1.All the parameters to be used in Troe's analytical expression for calculating the bimolecular rate constant at any pressure and temperature are given.The rate constant at the low-pressure limit k1(0) is more than an order of magnitude lower than for the CF3 radical.The RRKM calculations show that this arises from a large difference in the C-C bond dissociation energies in the corresponding peroxy radicals: 81.9 kJ mol-1 for CCl3O2 instead of ca. 145 kJ mol-1 for CF3O2.

Photocatalysis of chloroform decomposition by hexachloroosmate(IV)

Pena, Laura A.,Hoggard, Patrick E.

, p. 467 - 470 (2010)

Hexachloroosmate(IV) effectively catalyzes the photodecomposition of chloroform in aerated solutions. The decomposition products are consistent with a mechanism in which excited state OsCl62- reduces chloroform, rather than one involving photodissociation of chlorine atoms. Trace amounts of ethanol or water in the chloroform lead to photosubstitution to form OsCl5(EtOH)- or OsCl5(H2O) -, neither of which is photocatalytically active.

Synthesis of Decorated Carbon Structures with Encapsulated Components by Low-Voltage Electric Discharge Treatment

Bodrikov, I. V.,Pryakhina, V. I.,Titov, D. Yu.,Titov, E. Yu.,Vorotyntsev, A. V.

, p. 60 - 69 (2022/03/17)

Abstract: Polycondensation of complexes of chloromethanes with triphenylphosphine by the action of low-voltage electric discharges in the liquid phase gives nanosized solid products. The elemental composition involving the generation of element distribution maps (scanning electron microscopy–energy dispersive X?ray spectroscopy mapping) and the component composition (by direct evolved gas analysis–mass spectrometry) of the solid products have been studied. The elemental and component compositions of the result-ing structures vary widely depending on the chlorine content in the substrate and on the amount of triphenylphosphine taken. Thermal desorption analysis revealed abnormal behavior of HCl and benzene present in the solid products. In thermal desorption spectra, these components appear at an uncharacteristically high temperature. The observed anomaly in the behavior of HCl is due to HCl binding into a complex of the solid anion HCI-2 with triphenyl(chloromethyl)phosphonium chloride, which requires a relatively high temperature (up to 800 K) to decompose. The abnormal behavior of benzene is associated with its encapsulated state in nanostructures. The appearance of benzene begins at 650 K and continues up to temperatures above 1300?K.

Destruction of chemical warfare agent simulants by air and moisture stable metal NHC complexes

Weetman, Catherine,Notman, Stuart,Arnold, Polly L.

supporting information, p. 2568 - 2574 (2018/02/28)

The cooperative effect of both NHC and metal centre has been found to destroy chemical warfare agent (CWA) simulants. Choice of both the metal and NHC is key to these transformations as simple, monodentate N-heterocyclic carbenes in combination with silver or vanadium can promote stoichiometric destruction, whilst bidentate, aryloxide-tethered NHC complexes of silver and alkali metals promote breakdown under mild heating. Iron-NHC complexes generated in situ are competent catalysts for the destruction of each of the three targetted CWA simulants.

Photocatalytic Conversion of a FeCl3–CCl4–ROH System

Makhmutov

, p. 695 - 700 (2018/03/08)

The photocatalytic transformations of carbon tetrachloride and aliphatic primary alcohols in the presence of iron trichloride and a molar ratio of components FeCl3: CCl4: ROH = 1: 300: 2550 were studied. CCl4 is transformed into chloroform and hexachloroethane after exposure to a mercury lamp (250 W) to the FeCl3–CCl4–ROH system at 20°C, whereas the primary ROH alcohols are selectively oxidized into acetals (1,1-dialkoxyalkanes). The maximum conversion of CCl4 reaches 80%. The kinetics and mechanism of the photocatalytic conversion of the FeCl3–CCl4–ROH system are considered.

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