Welcome to LookChem.com Sign In|Join Free

Cas Database

67-72-1

67-72-1

Identification

  • Product Name:Hexachloroethane

  • CAS Number: 67-72-1

  • EINECS:200-666-4

  • Molecular Weight:236.74

  • Molecular Formula: C2Cl6

  • HS Code:2942000000

  • Mol File:67-72-1.mol

Synonyms:Phenohep;Ethane,hexachloro- (8CI,9CI);1,1,1,2,2,2-Hexachloroethane;1,2-Dichloro-1,1,2,2-tetrachloroethane;Avlothane;Distokal;Distopan;Distopin;Egitol;Ethane hexachloride;Falkitol;Fasciolin;Fron 110;Hexachlorethane;Mottenhexe;NSC 9224;Perchloroethane;

Post Buying Request Now
Entrust LookChem procurement to find high-quality suppliers faster

Safety information and MSDS view more

  • Pictogram(s):HarmfulXn, DangerousN, ToxicT, FlammableF

  • Hazard Codes: Xn:Harmful;

  • Signal Word:Warning

  • Hazard Statement:H315 Causes skin irritationH319 Causes serious eye irritation H335 May cause respiratory irritation H351 Suspected of causing cancer H410 Very toxic to aquatic life with long lasting effects

  • First-aid measures: General adviceConsult a physician. Show this safety data sheet to the doctor in attendance.If inhaled Fresh air, rest. In case of skin contact Remove contaminated clothes. Rinse and then wash skin with water and soap. In case of eye contact Rinse with plenty of water for several minutes (remove contact lenses if easily possible). Refer for medical attention. If swallowed Rinse mouth. Refer for medical attention . Compound is a powerful narcotic and liver poison; may also cause changes in blood composition and neurological disturbances. Repeated exposure by inhalation can be fatal. Ingestion causes vomiting, diarrhea, severe mucosal injury, liver necrosis, cyanosis, unconsciousness, loss of reflexes, and death. Contact with eyes causes irritation and lachrymation. Can be absorbed through the skin and may produce severe skin lesions. (USCG, 1999) Immediate first aid: Ensure that adequate decontamination has been carried out. If patient is not breathing, start artificial respiration, preferably with a demand-valve resuscitator, bag-valve-mask device, or pocket mask, as trained. Perform CPR as necessary. Immediately flush contaminated eyes with gently flowing water. Do not induce vomiting. If vomiting occurs, lean patient forward or place on left side (head-down position, if possible) to maintain an open airway and prevent aspiration. Keep patient quiet and maintain normal body temperature. Obtain medical attention. /Military Smoke Agents/

  • Fire-fighting measures: Suitable extinguishing media If material involved in fire: Extinguish fire using agent suitable for type of surrounding fire. (Material itself does not burn or burns with difficulty.) Use water in flooding quantities as fog. Cool all affected containers with flooding quantities of water. Apply water from as far a distance as possible. Special Hazards of Combustion Products: Irritating hydrogen chloride vapor may form in fire. (USCG, 1999) Wear self-contained breathing apparatus for firefighting if necessary.

  • Accidental release measures: Use personal protective equipment. Avoid dust formation. Avoid breathing vapours, mist or gas. Ensure adequate ventilation. Evacuate personnel to safe areas. Avoid breathing dust. For personal protection see section 8. Personal protection: particulate filter respirator adapted to the airborne concentration of the substance. Do NOT let this chemical enter the environment. Sweep spilled substance into covered containers. Carefully collect remainder. Then store and dispose of according to local regulations. 1. Ventilate area of spill; 2. Collect spilled material in the most convenient and safe manner for reclamation or for disposal. ... Liquid containing hexachloroethane should be absorbed in vermiculite, dry sand, earth or a similar material.

  • Handling and storage: Avoid contact with skin and eyes. Avoid formation of dust and aerosols. Avoid exposure - obtain special instructions before use.Provide appropriate exhaust ventilation at places where dust is formed. For precautions see section 2.2. Separated from strong oxidants, alkali metals and food and feedstuffs. See Chemical Dangers. Store in an area without drain or sewer access. Provision to contain effluent from fire extinguishing....Hexachloroethane must be stored to avoid contact with hot iron, zinc, aluminum, and alkalis, since violent reactions occur. Store in tightly closed containers in a cool, well-ventilated area away from heat.

  • Exposure controls/personal protection:Occupational Exposure limit valuesRecommended Exposure Limit: 10 Hr Time-Weighted Avg: 1 ppm (10 mg/cu m), skin.NIOSH considers hexachloroethane to be a potential occupational carcinogen.NIOSH considers ethylene dichloride; hexachloroethane; 1,1,2,2-tetrachloroethane; and 1,1,2-trichloroethane; to be potential occupational carcinogens. Additionally, NIOSH recommends that the other five chloroethane compounds: 1,1-dichloroethane; ethyl chloride; methyl chloroform; pentachloroethane; and 1,1,1,2-tetrachloroethane be treated in the workplace with caution because of their structural similarity to the four chloroethanes shown to be carcinogenic in animals.Biological limit values Handle in accordance with good industrial hygiene and safety practice. Wash hands before breaks and at the end of workday. Eye/face protection Safety glasses with side-shields conforming to EN166. Use equipment for eye protection tested and approved under appropriate government standards such as NIOSH (US) or EN 166(EU). Skin protection Wear impervious clothing. The type of protective equipment must be selected according to the concentration and amount of the dangerous substance at the specific workplace. Handle with gloves. Gloves must be inspected prior to use. Use proper glove removal technique(without touching glove's outer surface) to avoid skin contact with this product. Dispose of contaminated gloves after use in accordance with applicable laws and good laboratory practices. Wash and dry hands. The selected protective gloves have to satisfy the specifications of EU Directive 89/686/EEC and the standard EN 374 derived from it. Respiratory protection Wear dust mask when handling large quantities. Thermal hazards

Supplier and reference price

  • Manufacture/Brand
  • Product Description
  • Packaging
  • Price
  • Delivery
  • Purchase

Relevant articles and documentsAll total 101 Articles be found

-

Lorette

, p. 843 (1957)

-

Effect of ultrasound on the photolysis of carbon tetrachloride mediated by benzothiazole derivatives. 2-Sulfanylbenzothiazoles

Gaplovsky, Anton,Toma, Stefan,Luche, Jean-Louis,Jakubikova, Bibiana,Gaplovska, Katarina,Mracnova, Renata

, p. 652 - 656 (2002)

The photodecomposition of carbon tetrachloride was studied under sonication in the presence of N-(tert-butyl)-benzothiazole-2-sulfenamide (TBBS), N-(cyclohexyl)benzothiazole-2-sulfenamide (CBS), and 2-sulfanylbenzo-thiazole (MBT) as electron donors. By following the concentrations of Cl- and C2Cl6 as a function of time, it was shown that ultrasound decreases their rate of formation when TBBS and CBS were used, but it has no effect in the presence of MBT These observations were rationalized by a cavitation-induced destabilization of the contact ion pair (CIP) formed from exciplexes.

Reaction of Tetrathiafulvalene with Haloalkanes

Vessal, Behnam,Miller, John G.

, p. 2695 - 2698 (1982)

A kinetic study of the photochemical rection of TTF with haloalkanes has been made.The results are largely in agreement with a mechanism suggested by Scott and co-workers, but some additional findings of fundamental importance were obtained.An improved photosynthesis of TTFCl0.68 is reported.

Sonoluminescence and Sonochemical Reactions of Aqueous Carbon Tetrachloride Solutions

Chendke, P. K.,Fogler, H. S.

, p. 1362 - 1369 (1983)

The sonoluminescence intensity and its spectral distribution, and the sonochemical yields from saturated aqueous solutions of carbon tetrachloride, were measured simultaneously.The variation of these quantities with static pressure was also determined for

-

Miller

, p. 993 (1940)

-

Brook,A.G. et al.

, p. 133 - 135 (1971)

Interaction of trichloromethane and tetrachloromethane with nitrogen trifluoride

Mukhortov,Pashkevich,Blinov,Kambur,Kambur,Petrov,Kurapova

, p. 420 - 426 (2011)

Interaction of nitrogen trifluoride with trichloromethane and tetrachloromethane at temperatures in the range from 20 to 200°C and pressures of up to 6.0 MPa in the gas and liquid phases was studied.

Kirahonoki,K.,Takano,Y.

, p. 2417 - 2425 (1969)

High-Pressure Studies of Radical-Solvent Molecule Interactions in the CCl3 and Bromine Combination Reactions of CCl3

Oum, Kawon,Luther, Klaus,Troe, Juergen

, p. 2690 - 2699 (2004)

The combination reactions CCl3 + CCl3 (+ M) → C2Cl6 (+ M) and CCl3 + Br (+ M) → CCl 3Br (+ M) (with rate constants of k1 and k2, respectively) were studied at temperatures of 250 and 300 K over the pressure range of 0.01-1000 bar. Helium, argon, xenon, N2, CO2, and SF6 were used as bath gases. CCl3 radicals were generated via the photolysis of CCl3Br at 248 nm, and their absorption was monitored at 223.5 nm. The limiting "high-pressure" rate constants within the energy-transfer mechanism were determined, independent of density and the choice of the bath gas, over the pressure range of 1-10 bar, to be k 1,∞(T) = (1.0 ± 0.2) × 10-11 (T/300 K)-0.17 cm3 molecule-1 s-1 and k2,∞(T) = (2.0 ± 0.2) × 10-11 (T/300 K)-0.13 cm3 molecule-1 s-1. In the helium, N, and argon bath gases, at pressures above ~40 bar, the reactions became increasingly faster when the pressure was further raised until they finally started to slow at densities where diffusion-controlled kinetics dominates. This is the first detailed report of such a peculiar density dependence of combination rate constants for larger radicals with five or eight atoms. Possible origins of these pressure effects, such as the influence of the radical-complex mechanism and the density dependence of electronic quenching, are discussed.

Reaction of carbon tetrachloride with the nanoscale particles of silver and copper in a liquid phase

Timoshenko, Vadim A.,Bogdanov, Alexey V.,Shabatina, Tatyana I.,Mysik, Alexey A.,Uimin, Mikhail A.,Ermakov, Anatoly E.,Sergeev, Gleb B.

, p. 322 - 323 (2008)

The nanoscale particles of silver and copper coated with amorphous carbon (Ag/C and Cu/C) react with liquid carbon tetrachloride at 25-30°C to selectively form hexachloroethane in 60% yield.

-

Kailan

, p. 537,549 (1917)

-

-

Gonikberg,Shulin

, p. 617,621;engl.Ausg.S.592,595 (1959)

-

-

Carlsson et al.

, p. 4726 (1966)

-

Spurny, Z.,Jonovsky, I.

, p. 624 - 625 (1961)

Kinetic Study of the Reactions CCl3 + O2 + M -> CCl3O2 + M from 1 to 760 Torr and from 233 to 333 K

Danis, F.,Caralp, F.,Rayez, T.,Lesclaux, R.

, p. 7300 - 7307 (1991)

The kinetics of reaction 1, CCl3 + O2 + M -> CCl3O2 + M, has been investigated in detail as a function of temperature and over a large pressure range.At low pressure, 0.8-12 Torr, the reaction was investigated by laser photolysis and time-resolved mass spectrometry, while at high pressure (760 Torr), flash photolysis with UV absorption spectrometry was employed.At the low pressure limit, the rate expression, k1(0) = (1.6 +/- 0.3) x 10-30(T/298)-(6.3+/-0.5) cm6 molecule-2 s-1 (M = N2), exhibits a quite strong negative temperature coefficient.The obtained strong collision rate expression, 7.0 x 10-30(T/298)-4.3 cm6 molecule-2 s-1, using either RRKM calculations or Troe's factorized expression, is unable to reproduce the experimental temperature dependence, unless an unreasonably strong temperature dependence is assigned to the collisional efficiency factor: βc = 0.23(T/298)-2.0 (M = N2).Similar results are obtained for other chlorofluoromethyl radicals.The falloff curves were constructed by using RRKM calculations obtained by adjusting βc and the transition-state model, in order to reproduce the experimental data.The rate expression at the high-pressure limit was derived from these calculations k1(infinite) = (3.2 +/- 0.7) x 10-12(T/298)-(1.2+/-0.4) cm3 molecule-1 s-1.All the parameters to be used in Troe's analytical expression for calculating the bimolecular rate constant at any pressure and temperature are given.The rate constant at the low-pressure limit k1(0) is more than an order of magnitude lower than for the CF3 radical.The RRKM calculations show that this arises from a large difference in the C-C bond dissociation energies in the corresponding peroxy radicals: 81.9 kJ mol-1 for CCl3O2 instead of ca. 145 kJ mol-1 for CF3O2.

Tomkinson,Pritchard

, p. 1579 (1966)

Photocatalysis of chloroform decomposition by hexachloroosmate(IV)

Pena, Laura A.,Hoggard, Patrick E.

, p. 467 - 470 (2010)

Hexachloroosmate(IV) effectively catalyzes the photodecomposition of chloroform in aerated solutions. The decomposition products are consistent with a mechanism in which excited state OsCl62- reduces chloroform, rather than one involving photodissociation of chlorine atoms. Trace amounts of ethanol or water in the chloroform lead to photosubstitution to form OsCl5(EtOH)- or OsCl5(H2O) -, neither of which is photocatalytically active.

-

Bengough,Thomson

, p. 1928 (1961)

-

Synthesis of Decorated Carbon Structures with Encapsulated Components by Low-Voltage Electric Discharge Treatment

Bodrikov, I. V.,Pryakhina, V. I.,Titov, D. Yu.,Titov, E. Yu.,Vorotyntsev, A. V.

, p. 60 - 69 (2022/03/17)

Abstract: Polycondensation of complexes of chloromethanes with triphenylphosphine by the action of low-voltage electric discharges in the liquid phase gives nanosized solid products. The elemental composition involving the generation of element distribution maps (scanning electron microscopy–energy dispersive X?ray spectroscopy mapping) and the component composition (by direct evolved gas analysis–mass spectrometry) of the solid products have been studied. The elemental and component compositions of the result-ing structures vary widely depending on the chlorine content in the substrate and on the amount of triphenylphosphine taken. Thermal desorption analysis revealed abnormal behavior of HCl and benzene present in the solid products. In thermal desorption spectra, these components appear at an uncharacteristically high temperature. The observed anomaly in the behavior of HCl is due to HCl binding into a complex of the solid anion HCI-2 with triphenyl(chloromethyl)phosphonium chloride, which requires a relatively high temperature (up to 800 K) to decompose. The abnormal behavior of benzene is associated with its encapsulated state in nanostructures. The appearance of benzene begins at 650 K and continues up to temperatures above 1300?K.

Revisiting Alkane Hydroxylation with m-CPBA (m-Chloroperbenzoic Acid) Catalyzed by Nickel(II) Complexes

Itoh, Mayu,Itoh, Shinobu,Kubo, Minoru,Morimoto, Yuma,Shinke, Tomoya,Sugimoto, Hideki,Wada, Takuma,Yanagisawa, Sachiko

, p. 14730 - 14737 (2021/09/29)

Mechanistic studies are performed on the alkane hydroxylation with m-CPBA (m-chloroperbenzoic acid) catalyzed by nickel(II) complexes, NiII(L). In the oxidation of cycloalkanes, NiII(TPA) acts as an efficient catalyst with a high yield and a high alcohol selectivity. In the oxidation of adamantane, the tertiary carbon is predominantly oxidized. The reaction rate shows first-order dependence on [substrate] and [NiII(L)] but is independent on [m-CPBA]; vobs=k2[substrate][NiII(L)]. The reaction exhibited a relatively large kinetic deuterium isotope effect (KIE) of 6.7, demonstrating that the hydrogen atom abstraction is involved in the rate-limiting step of the catalytic cycle. Furthermore, NiII(L) supported by related tetradentate ligands exhibit apparently different catalytic activity, suggesting contribution of the NiII(L) in the catalytic cycle. Based on the kinetic analysis and the significant effects of O2 and CCl4 on the product distribution pattern, possible contributions of (L)NiII?O. and the aroyloxyl radical as the reactive oxidants are discussed.

Destruction of chemical warfare agent simulants by air and moisture stable metal NHC complexes

Weetman, Catherine,Notman, Stuart,Arnold, Polly L.

supporting information, p. 2568 - 2574 (2018/02/28)

The cooperative effect of both NHC and metal centre has been found to destroy chemical warfare agent (CWA) simulants. Choice of both the metal and NHC is key to these transformations as simple, monodentate N-heterocyclic carbenes in combination with silver or vanadium can promote stoichiometric destruction, whilst bidentate, aryloxide-tethered NHC complexes of silver and alkali metals promote breakdown under mild heating. Iron-NHC complexes generated in situ are competent catalysts for the destruction of each of the three targetted CWA simulants.

Photocatalytic Conversion of a FeCl3–CCl4–ROH System

Makhmutov

, p. 695 - 700 (2018/03/08)

The photocatalytic transformations of carbon tetrachloride and aliphatic primary alcohols in the presence of iron trichloride and a molar ratio of components FeCl3: CCl4: ROH = 1: 300: 2550 were studied. CCl4 is transformed into chloroform and hexachloroethane after exposure to a mercury lamp (250 W) to the FeCl3–CCl4–ROH system at 20°C, whereas the primary ROH alcohols are selectively oxidized into acetals (1,1-dialkoxyalkanes). The maximum conversion of CCl4 reaches 80%. The kinetics and mechanism of the photocatalytic conversion of the FeCl3–CCl4–ROH system are considered.

PROCESS FOR THE PRODUCTION OF CHLORINATED METHANES

-

Paragraph 0062; 0063; 064, (2017/04/11)

The present invention provides processes for the production of chlorinated methanes via the direct chlorination of methane. The processes include a dehydrochlorination and/or chlorination step that converts up to 100% of the higher chlorinated alkanes in a process stream from the methane chlorination reaction into more highly chlorinated alkanes. These more highly chlorinated alkanes can be easily removed from the process stream. The use of a cost effective feedstream of crude methane is thus rendered possible, without additional capital expenditure for the sophisticated separation equipment required to separate ethane and other hydrocarbon components from the methane feed.

Process route upstream and downstream products

Process route

tetrachloromethane
56-23-5

tetrachloromethane

bis(4-methoxybenzoyl) peroxide
849-83-2

bis(4-methoxybenzoyl) peroxide

hexachloroethane
67-72-1

hexachloroethane

4-chloromethoxybenzene
623-12-1

4-chloromethoxybenzene

carbon dioxide
124-38-9,18923-20-1

carbon dioxide

p-chlorophenoxymethyl chloride
21151-56-4

p-chlorophenoxymethyl chloride

4-methoxybenzoic acid
100-09-4

4-methoxybenzoic acid

Conditions
Conditions Yield
for 14.7h; Quantum yield; Mechanism; Ambient temperature; Irradiation;
C<sub>23</sub>H<sub>16</sub>N<sub>2</sub>O<sub>2</sub>
115993-91-4

C23H16N2O2

4-chloroquinoline
611-35-8

4-chloroquinoline

benzophenone
119-61-9

benzophenone

hexachloroethane
67-72-1

hexachloroethane

benzophenone azine
983-79-9

benzophenone azine

Conditions
Conditions Yield
With tetrachloromethane; Yields of byproduct given; Ambient temperature; Irradiation;
80%
chloroform
67-66-3,8013-54-5

chloroform

hexachloroethane
67-72-1

hexachloroethane

benzyl bromide
100-39-0

benzyl bromide

Conditions
Conditions Yield
With 2,2'-azobis(isobutyronitrile); Bromotrichloromethane; at 80 ℃; for 8h; Product distribution; Mechanism; reaction in the presence of ethylene oxide;
tetrachloromethane
56-23-5

tetrachloromethane

decane
124-18-5

decane

dichloromethane
75-09-2

dichloromethane

chloroform
67-66-3,8013-54-5

chloroform

decyl chloride
1002-69-3

decyl chloride

hexachloroethane
67-72-1

hexachloroethane

Conditions
Conditions Yield
With di-μ-chlorobis[bis(dimethylformamide)chlorocopper(II)]; at 159.9 ℃; Product distribution; effect of additives (ionol, O2), other catalysts; kinetic curves;
tetrachloromethane
56-23-5

tetrachloromethane

zirconium(II) hydride

zirconium(II) hydride

zirconium chloride
13762-26-0

zirconium chloride

hexachloroethane
67-72-1

hexachloroethane

zirconium(IV) chloride
10026-11-6

zirconium(IV) chloride

pyrographite
7440-44-0

pyrographite

Conditions
Conditions Yield
In neat (no solvent); reaction of ZnH2 with CCl4 at 20-250°C; below the b.p. of CCl4 formation of ZrCl2 and C2Cl6, above the b.p. formation of ZrCl4 and C;;
pentacarbonyl(methoxyphenylmethylene)tungsten<sup>(0)</sup>
37823-96-4

pentacarbonyl(methoxyphenylmethylene)tungsten(0)

benzoic acid methyl ester
93-58-3,5705-52-2,80226-58-0

benzoic acid methyl ester

tungsten(IV) oxychloride
22550-09-0

tungsten(IV) oxychloride

hexachloroethane
67-72-1

hexachloroethane

carbon monoxide
201230-82-2

carbon monoxide

tungsten(VI) chloride
13283-01-7

tungsten(VI) chloride

Conditions
Conditions Yield
In tetrachloromethane; byproducts: HCl, Cl2; further products; N2; stirred; gas-chromy., MAS; elem. anal.;
70%
28%
4.1%
[Co(CH<sub>2</sub>Ph)(dimethylglyoximate<sup>(1-)</sup>)2(pyridine)]

[Co(CH2Ph)(dimethylglyoximate(1-))2(pyridine)]

Bromotrichloromethane
75-62-7

Bromotrichloromethane

bromo Co(III)(dmgH)2py

bromo Co(III)(dmgH)2py

hexachloroethane
67-72-1

hexachloroethane

2,2,2-trichloroethylbenzene
3883-13-4

2,2,2-trichloroethylbenzene

benzyl bromide
100-39-0

benzyl bromide

Conditions
Conditions Yield
In chloroform; Excess of CHCl3, 70°C for 2 h;; detected by NMR spectra and GLC;;
53%
47%
tetrachloromethane
56-23-5

tetrachloromethane

di-tert-butyl peroxide
110-05-4

di-tert-butyl peroxide

chloroform
67-66-3,8013-54-5

chloroform

hexachloroethane
67-72-1

hexachloroethane

benzyl chloride
100-44-7

benzyl chloride

<i>tert</i>-butyl alcohol
75-65-0

tert-butyl alcohol

Conditions
Conditions Yield
Product distribution; Irradiation;
1,2-dichloro-ethane
107-06-2,52399-93-6

1,2-dichloro-ethane

diphenylmercury(II)
587-85-9,1337-09-3

diphenylmercury(II)

hexachloroethane
67-72-1

hexachloroethane

phenylmercury(II) chloride
100-56-1

phenylmercury(II) chloride

Conditions
Conditions Yield
mit ultraviolettem Licht;
tetrachloromethane
56-23-5

tetrachloromethane

diphenylmercury(II)
587-85-9,1337-09-3

diphenylmercury(II)

hexachloroethane
67-72-1

hexachloroethane

chlorobenzene
108-90-7

chlorobenzene

phenylmercury(II) chloride
100-56-1

phenylmercury(II) chloride

Conditions
Conditions Yield
UV-Licht.Irradiation;

Global suppliers and manufacturers

Global( 54) Suppliers
  • Company Name
  • Business Type
  • Contact Tel
  • Emails
  • Main Products
  • Country
  • Simagchem Corporation
  • Business Type:Manufacturers
  • Contact Tel:+86-592-2680277
  • Emails:sale@simagchem.com
  • Main Products:110
  • Country:China (Mainland)
  • Kono Chem Co.,Ltd
  • Business Type:Other
  • Contact Tel:86-29-86107037-8015
  • Emails:info@konochemical.com
  • Main Products:82
  • Country:China (Mainland)
  • Amadis Chemical Co., Ltd.
  • Business Type:Lab/Research institutions
  • Contact Tel:86-571-89925085
  • Emails:sales@amadischem.com
  • Main Products:29
  • Country:China (Mainland)
  • Chemwill Asia Co., Ltd.
  • Business Type:Manufacturers
  • Contact Tel:021-51086038
  • Emails:sales@chemwill.com
  • Main Products:56
  • Country:China (Mainland)
  • GIHI CHEMICALS CO.,LIMITED
  • Business Type:Lab/Research institutions
  • Contact Tel:571-86217390
  • Emails:info@gihichem.com
  • Main Products:66
  • Country:China (Mainland)
  • Aecochem Corp.
  • Business Type:Manufacturers
  • Contact Tel:+86-592 599 8717
  • Emails:sales@aecochemical.com
  • Main Products:70
  • Country:China (Mainland)
close
Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 67-72-1
close
Remarks: The blank with*must be completed
  • ©2008 LookChem.com,License:ICP NO.:Zhejiang16009103 complaints:service@lookchem.com
  • [Hangzhou]86-571-87562588,87562561,87562573 Our Legal adviser: Lawyer