7783-61-1Relevant articles and documents
Synthesis of Trifluorosilyl Organometallic Complexes from Trifluorosilyl Radicals and Metal Atoms
Bierschenk, T. R.,Guerra, M. A.,Juhlke, T. J.,Larson, S. B.,Lagow, R. J.
, p. 4855 - 4860 (1987)
Trifluorosilyl radicals generated in a radio frequency glow discharge of hexafluorodisilane were reacted with metal atoms to give the first homoleptic trifluorosilyl metal compounds.Bis(trifluorosilyl)tellurium, tris(trifluorosilyl)bismuth, tris(trifluorosilyl)antimony, and bis(trifluorosilyl)mercury were formed in moderate yields by cocondensation of tellurium, bismuth, antimony, and mercury with trifluorosilyl radicals (.SiF3) on a cryogenic surface.In a similar manner trifluorosilyl complexes containing additional ligands were also prepared.For example, we have successfully prepared bis(trifluorosilyl)tris(trimethylphosphine)nickel, (η6-toluene)bis(trifluorosilyl)nickel, bis(trifluorosilyl)bis(trimethylphosphine)palladium, bis(trifluorosilyl)cadmium-glyme, and bis(trifluorosilyl)zinc-2-pyridine.
Reaction of tetrafluorosilane with tris(2-hydroxyethyl)amine, tris(2-trimethylsiloxyethyl)amine and bis(2-trimethylsiloxyethyl)amine and its N-methyl derivative. 1,1-Difluoroquasisilatranes
Voronkov,Grebneva,Trofimova,Albanov,Chernov,Chipanina
, p. 1851 - 1853 (2006)
Reaction of tetrafluorosilane with tris(2-hydroxyethyl)- and tris(2-trimethylsiloxyethyl)amine results in formation of 1-fluorosilatrane and fluorosilatrane in 75 and 53% yield, respectively. Reaction of tetrafluorosilane with bis(2-trimethylsiloxyethyl)a
Preparation of high-purity silicon tetrafluoride by thermal dissociation of Na2SiF6
Bulanov,Pryakhin,Balabanov
, p. 1393 - 1395 (2003)
The possibility of preparing high-purity silicon tetrafluoride by the thermal dissociation of pure grade Na2SiF6 was studied. The impurity composition of the product was studied by IR and atomic emission spectroscopy and by mass spec
Integrated utilization of silicon tetrafluoride and zirconium dioxide
Guzeev,D'yachenko,Grishkov
, p. 1900 - 1903 (2003)
The reaction of silicon tetrafluoride with zirconium dioxide was studied. A technological scheme was suggested for utilization of silicon tetrafluoride and reprocessing of spent zirconium dioxide to obtain zircon and zirconium tetrafluoride.
Phase diagram for mullite-SiF4
Moyer
, p. 3253 - 3258 (1995)
At 1 atm of SiF4, mullite and SiF4 react below 660° ± 7°C to form AlF3 and SiO2. From 660° to 1056° ± 5°C, the product is fluorotopaz. Mullite is stable in the presence of 1 atm of SiF4 above 1056°C. The transition temperatures at other pressures of SiF4 can be calculated from log p(atm) = 11.587 - 10811/T(K) and log p(atm) = 9.9609 - 13238/T(K). The phase diagram shows only gas-solid equilibria, but there is evidence for a metastable melt from which acicular mullite and fluorotopaz grow.
IR spectroscopic and ab initio quantum-chemical study of the products of hydrolysis of silicon tetrafluoride at low water concentrations
Sennikov,Ikrin,Ignatov,Bagatur'yants,Klimov
, p. 93 - 97 (1999)
According to the results of IR spectroscopic study and quantum-chemical calculations, hydroxo derivatives SiF4-x(OH)x are formed in the course of hydrolysis of silicon tetrafluoride in the presence of small amount of water along with
Comparison of the interactions of XeF2 and F2 with Si(100)(2 ?? 1)
Holt,Hefty,Tate,Ceyer
, p. 8399 - 8406 (2002)
The interaction of low-energy XeF2 with Si(100)(2 ?? 1) has been studied and compared to that of F2. Helium atom diffraction, beam-surface scattering, and thermal desorption measurements are the major techniques used in this study. It is found that XeF2 dissociatively chemisorbs with high probability solely on the Si dangling bonds up to a coverage of about one monolayer (ML). Molecular fluorine has previously been observed to react similarly, saturating the dangling bonds at 1 ML coverage. The thermal desorption kinetics and products from the fluorinated layer produced by XeF2 exposure are identical to those produced by F2 exposure. The interactions of XeF2 and F2 are also strikingly similar with respect to the long-range order of the fluorinated Si up to about 1 ML coverage. The order is monitored by He diffraction. In both systems, the diffracted He beams exhibit a sharp decrease in intensity because of the disorder produced by the fluorination of random surface-unit cells as the coverage increases from 0 to about 0.3 ML. The intensity then increases until the fluorine overlayer has fully recovered its (2 ?? 1) periodicity at about 1 ML. This recovery corresponds to the decoration of each Si dangling bond with a fluorine atom. A critical observation of this study is that despite the large exothermicity of the dissociative chemisorption of XeF2 or F2 the order of the surface is not destroyed in either system. After saturation of the dangling bonds, F2 ceases to react with the surface whereas XeF2 continues to deposit fluorine by reacting with the Si-Si ?? dimer bonds and the Si-Si lattice bonds. The order is destroyed as a result of the continued fluorine deposition, and ultimately, etching occurs by the formation of volatile SiF4.
A silicon metal trap for the safe disposal of chlorine trifluoride
Czerepinski, Ralph G.,Margrave, John L.
, p. 875 - 876 (1963)
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Broeck, W. T. L. ten,Meulen, P. A. van der
, p. 3596 - 3600 (1931)
Distribution coefficients in the systems SiF4-Si 2OF6 and SiF4-SiOF2
Devyatykh,Pryakhin,Bulanov
, p. 413 - 415 (2001)
The liquid-vapor distribution coefficients in the SiF4-Si 2OF6and SiF4-SiOF2systems were determined between 183 and 250 K. The results were used to evaluate the enthalpies of Si2OF6/s
Bis(perchlorocatecholato)silane—A Neutral Silicon Lewis Super Acid
Maskey, Rezisha,Sch?dler, Marcel,Legler, Claudia,Greb, Lutz
supporting information, p. 1717 - 1720 (2018/01/27)
No neutral silicon Lewis super acids are known to date. We report on the synthesis of bis(perchlorocatecholato)silane and verify its Lewis super acidity by computation (DLPNO-CCSD(T)) and experiment (fluoride abstraction from SbF6?). The exceptional affinity towards donors is further demonstrated by, for example, the characterization of an unprecedented SiO4F2 dianion and applied in the first hydrodefluorination reaction catalyzed by a neutral silicon Lewis acid. Given the strength and convenient access to this new Lewis acid, versatile applications might be foreseen.
Synthesis of tris- and tetrakis(pentafluoroethyl)silanes
Steinhauer, Simon,Bader, Julia,Stammler, Hans-Georg,Ignat'Ev, Nikolai,Hoge, Berthold
supporting information, p. 5206 - 5209 (2014/05/20)
The synthesis and complete characterization of functional, highly Lewis acidic tris(pentafluoroethyl)silanes as well as tetrakis(perfluoroalkyl)silanes Si(C2F5)4 and Si(C2F 5)3CF3 by direct fluorination is described. The reaction of SiCl4 with LiC2F5 invariably affords (pentafluoroethyl)fluorosilicates. To avoid silicate formation by fluoride transfer from LiC2F5 the Lewis acidity of the silane has to be decreased by electron-donating substituents, such as dialkylamino groups. The easily accessible Si(C2F5) 3NEt2 is a valuable precursor for a series of tris(pentafluoroethyl)silanes. Special eFfects: functional and highly Lewis acidic tris(pentafluoroethyl)silanes as well as the tetrakis(perfluoroalkyl) silanes Si(C2F5)4 and Si(C2F 5)3CF3 are prepared. The two tetrakis species were formed in the direct fluorination of tris-(pentafluoroethyl)ethyl- and methylsilane. Si(C2F5)4 was characterized by X-ray crystallography (see figure).
